Method for treating vapor deposition apparatus, method for depositing thin film, vapor deposition apparatus and computer program product for achieving thereof

1 . A method for treating a vapor deposition apparatus after conducting a deposition of a thin film of a material-on a substrate in a chamber of a vapor deposition apparatus, comprising:

depositing a film of an amorphous material to cover an accumulated material that is deposited onto an interior wall of said chamber in said deposition of said thin film.

2 . The method for treating a vapor deposition apparatus according to claim 1 , wherein a source material of said amorphous film is a source material of said material of the thin film deposited on said substrate.

3 . A method for depositing a thin film by employing a vapor deposition apparatus, comprising:

treating the vapor deposition apparatus via said method of treating the vapor deposition apparatus as set forth in claim 1; and

depositing the thin film on another substrate in the chamber of said vapor deposition apparatus, after treating said vapor deposition apparatus.

4 . The method for depositing the thin film according to claim 3 , wherein said thin film is deposited via an atomic layer deposition process in said depositing the thin film.

5 . The method for depositing the thin film according to claim 3 , further comprising:

figuring out a relationship between a number of deposition cycles of said thin film and an uniformity in the film thickness of said deposited thin film;

comparing a number of deposition cycles of said thin film on the substrate within said chamber with a predetermined number of deposition cycles to determine whether the number of the deposition cycles of said thin film on the substrate within said chamber is not larger than said predetermined number of the deposition cycles, said predetermined number being obtained from said relationship between the number of deposition cycles of said thin film and the uniformity in the film thickness of said deposited thin film;

treating said vapor deposition apparatus by depositing said amorphous film to cover said accumulated material that is adhered onto the interior wall of said chamber, by employing said method of treating the vapor deposition apparatus, if it is determined that the number of deposition cycles of said thin film on the substrate within said chamber is larger than the predetermined value; and

depositing the thin film on another substrate in said chamber of said vapor deposition apparatus, after treating said vapor deposition apparatus.

6 . A vapor deposition apparatus for depositing a thin film on a substrate, comprising:

a chamber capable of being supplied with a vaporized source material of the thin film to deposit the thin film on said substrate;

a temperature control unit for controlling a temperature in said chamber;

a storage unit that is capable of storing a relationship between a number of the deposition cycles of said thin film and an uniformity in the film thickness of said deposited thin film;

a counting unit for counting the number of the deposition cycles of said thin film in said chamber; and

a determining unit for comparing the number of the deposition cycles counted by said counting unit with a predetermined number of deposition cycles to determine whether the number of the deposition cycles of said thin film counted by said counting unit is not larger than said predetermined number of the deposition cycles, predetermined number being obtained from said relationship between the number of the deposition cycles of said thin film and the uniformity in the thickness of the thin film, and said relationship being stored in said storage unit,

wherein, if said determining unit determines that the counted number of the deposition cycles is larger than the predetermined number of the deposition cycles, said temperature control unit provides a control of the temperature in said chamber, and an amorphous film is deposited to cover the accumulated material that is adhered onto the interior wall of said chamber.

7 . A computer program product embodied on a computer that is capable of controlling a treatment process in a chamber of a vapor deposition apparatus, comprising:

acquiring a relationship between a number of the deposition cycles of a thin film and an uniformity in the film thickness of the deposited thin film;

acquiring a number of the deposition cycles of the thin film on a substrate conducted in said chamber;

comparing the acquired number of the deposition cycles of said thin film with a predetermined number of deposition cycles to determine whether said acquired number of the deposition cycles of the thin film is not larger than said predetermined number of the deposition cycles, said predetermined number of deposition cycles being obtained from the relationship between the number of the deposition cycles said thin film and the uniformity in the film thickness of the deposited thin film; and

outputting a control signal for controlling a temperature in said chamber to a temperature control unit that is capable of conducting a temperature control in said chamber for depositing an amorphous film that covers an accumulated material adhered onto the interior wall of said chamber, if it is determined that the acquired number of the deposition cycles of said thin film is larger than said predetermined number of the deposition cycles.