Light-emitting devices having an antireflective layer that has a graded index of refraction and methods of forming the same
View Patent ↗A light-emitting device includes a substrate that is at least partially transparent to optical radiation and has a first index of refraction. A diode region is disposed on a first surface of the substrate and is configured to emit light responsive to a voltage applied thereto. An encapsulation layer is disposed on a second surface of the substrate and has a second index of refraction. An antireflective layer is disposed between a second surface of the substrate and the encapsulation layer. The antireflective layer has a graded index of refraction having values in a range between about the first index of refraction at a first surface of the antireflective layer and about the second index of refraction at a second surface of the antireflective layer. The encapsulation layer may also be omitted and the antireflective layer may separate the substrate, which has a first index of refraction, from air, which has a second index of refraction. Non “flip-chip” embodiments are also disclosed.
1. A light-emitting device, comprising:
a light extraction layer; and
an antireflective layer on the light extraction layer that has a graded index of refraction having values in a range associated with a first index of refraction at a first surface of the antireflective layer and associated with a second index of refraction corresponding to an index of refraction of a medium at a second surface of the antireflective layer;
wherein the medium at the second surface is an encapsulant material.
2. The light-emitting device of claim 1 , wherein the light extraction layer is an at least partially transparent ohmic contact.
3. The light-emitting device of claim 1 , wherein the light extraction layer comprises platinum.
4. The light-emitting device of claim 1 , wherein the light-emitting device is a gallium nitride light-emitting device.
5. The light-emitting device of claim 1 , wherein the graded index of refraction is represented as a function f(x), where x represents a thickness of the antireflective layer beginning at the first surface of the antireflective layer and ending at the second surface of the antireflective layer.
6. The light-emitting device of claim 5 , wherein f(x) is linear.