IP Library Granted Patent US 7,663,909
Granted Patent B2
US 7,663,909 · App. 11/483,873 · Granted Feb 16, 2010

Integrated circuit having a phase change memory cell including a narrow active region width

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Quick Facts
Patent No.
US 7,663,909
App. No.
11/483,873
Granted
Feb 16, 2010
Kind
B2
Abstract

A memory cell includes a first electrode and an opposing second electrode, and a memory stack between the first and second electrodes. The memory stack includes a first layer of thermal isolation material contacting the first electrode, a second layer of thermal isolation material contacting the second electrode, and a phase change material between the first layer of thermal isolation material and the second layer of thermal isolation material. In this regard, the phase change material defines an active region width that is less than a width of either of the first layer of thermal isolation material and the second layer of thermal isolation material.

Claims (8)

1. An integrated circuit including a memory cell comprising:

a first electrode and an opposing second electrode; and

a memory stack comprising a first layer of thermal isolation material in contact with the first electrode, a second layer of thermal isolation material in contact with the second electrode, and a phase change material between the first and second layers of thermal isolation material, the phase change material comprising a material different from the first and second layers of thermal isolation material;

wherein the phase change material defines an active region width that is less than a width of either of the first layer of thermal isolation material and the second layer of thermal isolation material.

2. The integrated circuit of claim 1 , wherein the phase change material defines an etch rate at a given reactive etch chemistry that is greater than an etch rate of either of the first and second layers of thermal isolation material at the given reactive etch chemistry.

3. The integrated circuit of claim 1 , wherein the active region width is between 5-50 nm.

4. The integrated circuit of claim 1 , wherein the first layer of thermal isolation material and the second layer of thermal isolation material comprise substantially the same material.

5. The integrated circuit of claim 1 , wherein the phase change material defines an electrical resistivity that is greater than an electrical resistivity of either of the first layer of thermal isolation material and the second layer of thermal isolation material.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 30, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 037171/0719 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 037147/0487 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2011
From: QIMONDA NORTH AMERICA CORP
To: QIMONDA AG
Reel/Frame 026138/0613 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 24, 2006
From: PHILIPP, JAN BORIS; HAPP, THOMAS
To: QIMONDA NORTH AMERICA CORP.
Reel/Frame 017983/0864 →