IP Library Granted Patent US 7,466,190
Granted Patent B2
US 7,466,190 · App. 11/492,687 · Granted Dec 16, 2008

Charge pump with four-well transistors

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Quick Facts
Patent No.
US 7,466,190
App. No.
11/492,687
Granted
Dec 16, 2008
Kind
B2
Abstract

In one embodiment, a (negative-voltage) charge pump with one or more stages that receives a (high) input voltage and generates a higher-magnitude (negative) output voltage. Each stage has two capacitors for storing charges and two branches that alternate to transmit a higher-magnitude output voltage at every clock half cycle. Each branch has a PMOS transistor and a NMOS transistor. To reduce the effects of back body from the substrate, two transistors are constructed with three wells and two with four wells, where the number of wells per device is dependent upon the substrate type used.

Claims (46)

1. An integrated circuit having a charge pump with one or more stages connected in series, the charge pump having an input node for receiving a charge pump input signal and an output node for presenting a charge pump output signal, at least one stage comprising:

a first branch having a first p-type transistor connected in series with a first n-type transistor at a first node and a first capacitor connected to the first node; and

a second branch having a second p-type transistor connected in series with a second n-type transistor at a second node and a second capacitor connected to the second node, wherein:

the gates of the transistors in the first branch are connected to the second node;

the gates of the transistors in the second branch are connected to the first node;

at least one of the transistors is a four-well device;

the first and second p-type transistors are four-well devices;

the first and second n-type transistors are three-well devices;

each four-well p-type transistor comprises:

an n-type first well formed in a p-type substrate;

a p-type second well formed in the n-type first well;

an n-type third well formed in the p-type second well; and

p-type source and drain regions formed in the n-type third well, wherein:

the n-type third well is tied to the p-type source region; and

the n-type first well and the p-type second well are tied to the p-type substrate;

each three-well n-type transistor comprises:

an n-type first well formed in the p-type substrate;

a p-type second well formed in the n-type first well; and

n-type source and drain regions formed in the p-type second well, wherein:

the p-type second well is floated; and

the n-type first well is tied to the p-type substrate.

2. A method for operating a charge pump with one or more stages connected in series, at least one stage having:

a first branch having a first p-type transistor connected in series with a first n-type transistor at a first node and a first capacitor connected to the first node; and

a second branch having a second p-type transistor connected in series with a second n-type transistor at a second node and a second capacitor connected to the second node, wherein:

the gates of the transistors in the first branch are connected to the second node;

the gates of the transistors in the second branch are connected to the first node; and

at least one of the transistors is a four-well device, the method comprising:

applying an input voltage to an input node of a first stage of the charge pump;

applying, for each stage, a first clock signal to the side of the first capacitor not connected to the first node; and

applying, for each stage, a second clock signal to the side of the second capacitor not connected to the second node, wherein:

the first clock signal is a phase-shifted version of the second clock signal;

the first and second p-type transistors are four-well devices;

the first and second n-type transistors are three-well devices;

each four-well p-type transistor comprises;

an n-type first well formed in a p-type substrate;

a p-type second well formed in the n-type first well;

an n-type third well formed in the p-type second well; and

p-type source and drain regions formed in the n-type third well, wherein:

the n-type third well is tied to the p-type source region; and

the n-type first well and the p-type second well are tied to the p-type substrate;

each three-well n-type transistor comprises:

an n-type first well formed in the p-type substrate;

a p-type second well formed in the n-type first well; and

n-type source and drain regions formed in the p-type second well, wherein:

the p-type second well is floated; and

the n-type first well is tied to the p-type substrate.

Assignments (4)
SECURITY INTEREST Recorded May 21, 2019
From: LATTICE SEMICONDUCTOR CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 049980/0786 →
RELEASE OF SECURITY INTEREST Recorded May 21, 2019
From: JEFFERIES FINANCE LLC
To: LATTICE SEMICONDUCTOR CORPORATION; SILICON IMAGE, INC.; SIBEAM, INC.; DVDO, INC.
Reel/Frame 049827/0326 →
SECURITY INTEREST Recorded Mar 18, 2015
From: LATTICE SEMICONDUCTOR CORPORATION; SIBEAM, INC.; SILICON IMAGE, INC.; DVDO, INC.
To: JEFFERIES FINANCE LLC
Reel/Frame 035223/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2006
From: LALL, RAVINDAR M.; AGAM, MOSHE; HABIB, KAZI
To: LATTICE SEMICONDUCTOR CORPORATION
Reel/Frame 018221/0089 →