Crystalline chromium deposit
A crystalline chromium deposit having a lattice parameter of 2.8895+/−0.0025 Å, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.
1. A crystalline chromium deposit having a lattice parameter of 2.8895+/−0.0025 Å, further comprising carbon, nitrogen and sulfur in the chromium deposit.
2. The crystalline chromium deposit of claim 1 wherein the chromium deposit is electrodeposited from a trivalent chromium bath.
3. The crystalline chromium deposit of claim 1 wherein the chromium deposit comprises from about 1 wt. % to about 10 wt. % sulfur, from about 0.1 wt. % to about 5 wt. % nitrogen, and from about 0.1 wt. % to about 10 wt. % carbon.
4. The crystalline chromium deposit of claim 1 wherein the chromium deposit comprises from about 1 wt. % to about 10 wt. % sulfur.
5. The crystalline chromium of claim 1 wherein the chromium deposit comprises from about 0.1 to about 5 wt % nitrogen.
6. The crystalline chromium of claim 1 wherein the chromium deposit comprises an amount of carbon less than that amount which renders the chromium deposit amorphous.
7. The crystalline chromium deposit of claim 1 wherein the chromium deposit comprises from about 1.7 wt. % to about 4 wt. % sulfur, from about 0.1 wt. % to about 3 wt. % nitrogen, and from about 0.1 wt. % to about 10 wt. % carbon.
8. The crystalline chromium deposit of claim 1 wherein the chromium deposit is substantially free of macrocracking.
9. The crystalline chromium deposit of claim 1 wherein the chromium deposit has a {111} preferred orientation.
10. An article comprising a crystalline chromium deposit, wherein the crystalline chromium deposit has a lattice parameter of 2.8895+/−0.0025 Å and further comprises carbon, nitrogen and sulfur.
11. The article of claim 10 wherein the chromium deposit has a {111} preferred orientation.
12. The article of claim 10 wherein the chromium deposit comprises from about 1 wt. % to about 10 wt. % sulfur, from about 0.1 wt. % to about 5 wt. % nitrogen, and from about 0.1 wt. % to about 10 wt. % carbon.
13. The article of claim 10 wherein the chromium deposit is a functional or decorative chromium deposit.
14. The article of claim 10 wherein the chromium deposit comprises from about 1 wt. % to about 10 wt. % sulfur.
15. The article of claim 10 wherein the chromium deposit comprises from about 0.1 to about 5 wt % nitrogen.
16. The article of claim 10 wherein the chromium deposit comprises an amount of carbon less than that amount which renders the chromium deposit amorphous.
17. The article of claim 10 wherein the chromium deposit comprises from about 1.7 wt. % to about 4 wt. % sulfur, from about 0.1 wt. % to about 3 wt. % nitrogen, and from about 0.1 wt. % to about 10 wt. % carbon.
18. The article of claim 10 wherein the chromium deposit is substantially free of macrocracking.
19. The crystalline chromium deposit of claim 1 wherein the chromium deposit is a functional or decorative chromium deposit.