Insulation structure for high temperature conditions and manufacturing method thereof

1. A method for manufacturing an insulation structure for high temperature conditions comprising:

preparing a substrate having a conductive pattern formed on at least one surface thereof for electrical connection of a device;

depositing a metal selected from a group consisting of Al, Ti and Mg on the substrate with the conductive pattern formed thereon by PVD to form a metal deposition layer;

oxidizing the metal deposition layer by anodization to form a metal oxide layer;

applying a photosensitive film to the metal oxide layer, and exposing and developing the photosensitive film to form a plurality of photosensitive film patterns and exposing the metal oxide layer between the plurality of the photosensitive film patterns; and

removing the metal oxide layer exposed between the plurality of the photosensitive film patterns by etching a surface of the substrate using the photosensitive film pattern as a mask, wherein

a metal oxide layer pattern is formed on the entirety of, or in part of, the conductive pattern, such that an electrical device may be disposed on a portion in which the conductive pattern is partially exposed.

2. The method according to claim 1 , wherein the PVD is sputtering or evaporation.

3. The method according to claim 1 , further comprising attaching an upper substrate onto the metal oxide layer pattern.

4. The method according to claim 3 , wherein the upper substrate and the metal oxide layer pattern are bonded together by Au/Sn eutectic bonding.

5. The method according to claim 3 , wherein the device comprises a light emitting diode, and the upper substrate comprises a reflecting plate.