Adhesion promotion in printed circuit boards

1. An adhesion promotion composition for enhancing adhesion between a copper conducting layer and a dielectric material during manufacture of a printed circuit board, the adhesion promotion composition comprising a corrosion inhibitor, an inorganic acid, an oxidizing agent, chloride ion in a concentration between 20 ppm and 100 ppm, and a polyhydric alcohol or an ether thereof, which polyhydric alcohol or ether thereof is effective to increase copper-loading in the composition, wherein the adhesion promotion composition is initially substantially free of transition metals having a tendency to destabilize the oxidizing agent.

2. The adhesion promotion composition of claim 1 wherein the polyhydric alcohol is a dihydric alcohol or an ether thereof selected from the group consisting of diethylene glycol methyl ether; triethylene glycol monomethyl ether; 1,2-ethylene glycol; propane-1,2-diol; butane-1,2-diol; propane-1,3-diol; butane-1,3-diol; butane-1,4-diol; hexane-1,4-diol; butene diol; hexene diol; butyne diol; diethylene glycol; triethylene glycol; dipropylene glycol; tetrahydrofurfuryl alcohol; and combinations thereof.

3. The adhesion promotion composition of claim 2 wherein the polyhydric alcohol constitutes between about 0.5 wt % and about 20 wt % of the composition.

4. The adhesion promotion composition of claim 1 wherein the polyhydric alcohol is a trihydric alcohol.

5. The adhesion promotion composition of claim 4 wherein the polyhydric alcohol constitutes between about 0.5 wt % and about 20 wt % of the composition.

6. The adhesion promotion composition of claim 1 wherein the polyhydric alcohol is triethylene glycol.

7. The adhesion promotion composition of claim 1 wherein the polyhydric alcohol is triethylene glycol and constitutes between about 0.5 wt % and about 20 wt % of the composition.

8. The adhesion promotion composition of claim 1 wherein the composition has a copper-loading capacity of at least about 30 grams copper per liter composition.

9. The adhesion promotion composition of claim 1 wherein less than about 0.1 volume % of Cu-containing sludge is formed at 120 hours under ambient conditions when the composition is loaded with between 40 and 50 g/liter Cu ions.

10. The adhesion promotion composition of claim 1 further comprising an anionic surfactant.

11. The adhesion promotion composition of claim 1 further comprising an anionic surfactant selected from among polymeric, oligomeric, and monomeric alcohol derivatives.

12. The adhesion promotion composition of claim 1 further comprising an anionic surfactant selected from among alcohol sulfates, sulfonates, and ethoxylates.

13. The adhesion promotion composition of claim 1 further comprising dodecylbenzene sulfonic acid (DDBSA) as an anionic surfactant.

14. The adhesion promotion composition of claim 1 further comprising a nonionic surfactant.

15. The adhesion promotion composition of claim 14 wherein the nonionic surfactant is an ethoxylated alcohol derivative.

16. The adhesion promotion composition of claim 15 wherein the nonionic surfactant is polyoxyethylene nonylphenol.

17. The adhesion promotion composition of claim 1 wherein the inorganic acid constitutes at least about 30 wt % of the composition.

18. The adhesion promotion composition of claim 1 wherein the inorganic acid is a mixture of sulfuric acid and nitric acid and constitutes at least about 30 wt % of the composition.

19. The composition of claim 1 comprising the chloride ion in a concentration between about 60 and about 65 ppm.

20. The composition of claim 1 comprising

a benzotriazole compound in a concentration between 0.5 and 10 wt % as the corrosion inhibitor;

the inorganic acid;

hydrogen peroxide in a concentration between about 0.5 and about 4 wt % as the oxidizing agent;

said chloride ion in said concentration between 20 ppm and 100 ppm; and

triethylene glycol in a concentration between about 0.8 wt % and about 10 wt % as said polyhydric alcohol or ether thereof.

21. An adhesion promotion composition for enhancing adhesion between a copper conducting layer and a dielectric material during manufacture of a printed circuit board, the adhesion promotion composition comprising a corrosion inhibitor, an inorganic acid, an oxidizing agent, chloride ion in a concentration between 20 ppm and 100 ppm, an alcohol which is effective to increase copper-loading in the composition wherein the alcohol is dihydric or trihydric, and an anionic surfactant, wherein the adhesion promotion composition is initially substantially free of transition metals having a tendency to destabilize the oxidizing agent.

22. The adhesion promotion composition of claim 21 wherein the alcohol is selected from among dihydric alcohols.

23. The adhesion promotion composition of claim 21 wherein the alcohol is selected from among dihydric alcohols and constitutes between about 0.5 wt % and about 20 wt % of the composition.

24. The adhesion promotion composition of claim 21 wherein the alcohol is triethylene glycol.

25. The adhesion promotion composition of claim 21 wherein the alcohol is triethylene glycol and constitutes between about 0.5 wt % and about 20 wt % of the composition.

26. The adhesion promotion composition of claim 21 wherein the alcohol is selected from among trihydric alcohols.

27. The adhesion promotion composition of claim 21 wherein the alcohol is selected from among trihydric alcohols and constitutes between about 0.5 wt % and about 20 wt % of the composition.

28. The adhesion promotion composition of claim 21 wherein the composition has a copper-loading capacity of at least about 30 grams copper per liter composition.

29. The adhesion promotion composition of claim 21 wherein less than about 0.1 volume % of Cu-containing sludge is formed at 120 hours under ambient conditions when the composition is loaded with between 40 and 50 g/liter Cu ions.

30. The adhesion promotion composition of claim 21 further comprising an anionic surfactant selected from among polymeric, oligomeric, and monomeric alcohol derivatives.

31. The adhesion promotion composition of claim 21 further comprising an anionic surfactant selected from among alcohol sulfates, sulfonates, and ethoxylates.

32. The adhesion promotion composition of claim 21 further comprising dodecylbenzene sulfonic acid (DDBSA) as an anionic surfactant.

33. The adhesion promotion composition of claim 21 further comprising a nonionic surfactant.

34. The adhesion promotion composition of claim 33 wherein the nonionic surfactant is an ethoxylated alcohol derivative.

35. The adhesion promotion composition of claim 34 wherein the nonionic surfactant is polyoxyethylene nonylphenol.

36. The adhesion promotion composition of claim 21 wherein the inorganic acid constitutes at least about 30 wt % of the composition.

37. The adhesion promotion composition of claim 21 wherein the inorganic acid is a mixture of sulfuric acid and nitric acid and constitutes at least about 30 wt % of the composition.

38. An adhesion promotion composition for enhancing adhesion between a copper conducting layer and a dielectric material during manufacture of a printed circuit board, the adhesion promotion composition comprising a corrosion inhibitor, an inorganic acid, an oxidizing agent, chloride ion in a concentration between 20 ppm and 100 ppm, and a polyhydric alcohol or an ether thereof, which polyhydric alcohol or ether thereof is effective to increase copper-loading in the composition, wherein the inorganic acid is a mixture of sulfuric acid and nitric acid and constitutes between about 22 and about 28 wt % of the composition.

39. An adhesion promotion composition for enhancing adhesion between a copper conducting layer and a dielectric material during manufacture of a printed circuit board, the adhesion promotion composition comprising a corrosion inhibitor, an inorganic acid, an oxidizing agent, chloride ion in a concentration between 20 ppm and 100 ppm, and a polyhydric alcohol or an ether thereof, which polyhydric alcohol or ether thereof is effective to increase copper-loading in the composition, wherein the inorganic acid is a mixture of sulfuric acid and nitric acid and constitutes at least about 30 wt % of the composition.