IP Library Assignment 048355/0656
Patent Assignment
Reel/Frame 048355/0656

Change of Name

Recorded: 2019-02-15 Pages: 5
Assignor
ENTHONE INC.
Executed: 2016-06-27
Assignee
MACDERMID ENTHONE INC.
245 FREIGHT STREET, WATERBURY, CONNECTICUT, 06702
Covered Properties (79)
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Process for the Extended Use of Electrolytes
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Water Soluble Brighteners for Zinc and Zinc Alloy Electrolytes
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Process for Metallizing a Plastic Surface
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Electroplating Composition Bath
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Copper Bath Composition for Electroless and/or Electrolytic Filling of Vias and Trenches for Integrated Circuit Fabrication
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Method for the Deposition of a Chromium Alloy
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Copper Electrodeposition in Microelectronics
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Copper Electrodeposition in Microelectronics
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Copper Electrodeposition in Microelectronics
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Adhesion Promotion in Printed Circuit Boards
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Process and Electrolytes for Deposition of Metal Layers
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Silver Plating in Electronics Manufacture
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Cobalt and Nickel Electroless Plating in Microelectronic Devices
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Maintenance of Metallization Baths
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Method for Treating Laser-Structured Plastic Surfaces
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Metallic Surface Enhancement
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Metallic Surface Enhancement
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Tin-Silver Solder Bumping in Electronics Manufacture
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Composite Coatings for Whisker Reduction
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Composite Coatings for Whisker Reduction
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Insoluble Anode
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Manufacture of Electroless Cobalt Deposition Compositions for Microelectronics Applications
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Anti-Tarnish Coatings
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Anti-Tarnish Coatings
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Deposition of Conductive Polymer and Metallization of Non-Conductive Substrates
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Organic Solderability Preservative Comprising High Boiling Temperature Alcohol
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Method for Supplying a Plating Composition with Deposition Metal Ion During a Plating Operation
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Method for Etching Non-Conductive Substrate Surfaces
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Publication: US US20070099425A1
Copper Deposition for Filling Features in Manufacture of Microelectronic Devices
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Method for Removing Impurities from a Metal Deposition Process Solution
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Publication: US US20070122324A1
Direct Metallization of Electrically Non-Conductive Polyimide Substrate Surfaces
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Publication: US US20070298170A1
Electrolyte Composition and Method for the Deposition of a Zinc-Nickel Alloy Layer on a Cast Iron Or Steel Substrate
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Self Assembled Molecules on Immersion Silver Coatings
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Self Assembled Molecules on Immersion Silver Coatings
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Copper Metallization of Through Silicon Via
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Cyanide-Free Electrolyte Composition, and Method for the Deposition of Silver or Silver Alloy Layers on Substrates
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Publication: US US20100044239A1
Cyanide-Free Electrolyte Composition and Method for the Deposition of Silver or Silver Alloy Layers on Substrates
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Publication: US US20160122890A1
Surface Preparation Process for Damascene Copper Deposition
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Publication: US US20100075496A1
Method and Composition for Electrodeposition of Copper in Microelectronics with Dipyridyl-Based Levelers
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Publication: US US20100126872A1
Method and Composition for Electrodeposition of Copper in Microelectronics with Dipyridyl-Based Levelers
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Publication: US US20130241060A1
Method and Composition for Electrodeposition of Copper in Microelectronics with Dipyridyl-Based Levelers
Patent: 9,613,858 →
Application: 14/325,601 →
Publication: US US20140322912A1
Electrolyte and Process for Depositing a Matt Metal Layer
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Application: 12/168,680 →
Publication: US US20080302668A1
Cyanide Free Electrolyte Composition for the Galvanic Deposition of a Copper Layer
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Publication: US US20110180415A1
Immersion Tin Silver Plating in Electronics Manufacture
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Publication: US US20110097597A1
Chromium-Free Pickle for Plastic Surfaces
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Publication: US US20110140035A1
Method for the Post-Treatment of Metal Layers
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Publication: US US20110272284A1
Galvanic Bath and Process for Depositing Zinc-Based Layers
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Method for the Deposition of a Metal Layer Comprising a Beta-Amino Acid
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Beta-Amino Acid Comprising Plating Formulation
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Process for Filling Vias in the Microelectronics
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Method for Direct Metallization of Non-Conductive Substrates
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Adhesion Promotion in Printed Circuit Boards
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Printed Circuit Board Manufacture
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Process for Electroless Copper Deposition on Laser-Direct Structured Substrates
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Copper Deposition in Wafer Level Packaging of Integrated Circuits
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Copper Electrodeposition in Microelectronics
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Copper Plating for Solar Panels
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Leveler Compositions for Use in Copper Deposition in Manufacture of Microelectronics
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Chemical Compounds Made of Intrisically Conductive Polymers and Metals
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Related Assignments (7)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name Mar 17, 2016
From: ENTHONE-OMI, INC.
To: ENTHONE INC.
Reel/Frame 038129/0512 →
Patent Security Agreement Apr 15, 2016
From: ENTHONE INC.
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 038439/0777 →
Assignment of Assignor's Interest Oct 12, 2016
From: PANECCASIO, VINCENT, JR.; HURTUBISE, RICHARD; LIN, XUAN; FIGURA, PAUL
To: ENTHONE INC.
Reel/Frame 039997/0309 →
Change of Name Jul 5, 2018
From: ENTHONE, INC.
To: MACDERMID ENTHONE INC.
Reel/Frame 046492/0046 →
Release of Security Interest Feb 4, 2019
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: MACDERMID ENTHONE INC. (F/K/A ENTHONE INC.)
Reel/Frame 048233/0141 →
Security Interest Feb 5, 2019
From: MACDERMID ENTHONE INC. (F/K/A ENTHONE INC.)
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 048261/0110 →
Assignment of Security Interest in Patent Collateral Nov 17, 2022
From: BARCLAYS BANK PLC
To: CITIBANK, N.A.
Reel/Frame 061956/0643 →