IP Library Granted Patent US 8,274,145
Granted Patent B2
US 8,274,145 · App. 11/773,951 · Granted Sep 25, 2012

Semiconductor package system with patterned mask over thermal relief

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Quick Facts
Patent No.
US 8,274,145
App. No.
11/773,951
Granted
Sep 25, 2012
Kind
B2
Abstract

A semiconductor package system including: providing a substrate having a thermal relief thereon; depositing a mask on the substrate and the thermal relief, the mask deposited on the thermal relief and having a regular pattern to partially cover the thermal relief; and die attaching a semiconductor die over the thermal relief.

Claims (32)

1. A method for manufacturing a semiconductor package system comprising:

providing a substrate having thermal relief pads thereon;

depositing a mask on the substrate and the thermal relief pads;

processing the mask with a pattern of holes, the substrate and only one of the thermal relief pads partially exposed from one of the holes; and

mounting a semiconductor die over the thermal relief pads, the thermal relief pads directly under and within planar extents of the semiconductor die.

2. The method as claimed in claim 1 wherein processing the mask exposes the thermal relief pads in a mesh pattern.

3. The method as claimed in claim 1 wherein processing the mask exposes the thermal relief pads in a row and column of squares pattern.

4. The method as claims in claim 1 wherein processing the mask exposes the thermal relief pads in a cross hair pattern.

5. The method as claimed in claim 1 wherein processing the mask exposes the thermal relief pads in a pattern exposing the substrate substantially evenly around the thermal relief pads.

6. A method for manufacturing a semiconductor package system comprising:

providing a substrate having thermal relief pads thereon;

depositing a solder mask on the substrate and the thermal relief pads;

processing the solder mask with a pattern of holes, the substrate and only one of the thermal relief pads partially exposed from one of the holes; and

mounting a semiconductor die over the thermal relief pads, the thermal relief pads directly under and within planar extents of the semiconductor die.

7. The method as claimed in claim 6 wherein processing the solder mask exposes the thermal relief pads in a mesh pattern exposing a portion of the thermal relief pads and the substrate.

8. The method as claimed in claim 6 wherein processing the solder mask exposes the thermal relief pads in a row and column of squares pattern at an angle to an edge of the substrate.

9. The method as claims in claim 6 wherein processing the solder mask exposes the thermal relief pads in a cross hair pattern centered on the thermal relief pads.

10. The method as claimed in claim 6 wherein processing the solder mask exposes the thermal relief pads in a pattern exposing the substrate substantially evenly around the thermal relief pads with the solder mask crossing the center of the thermal relief pads.

11. A semiconductor package system comprising:

a substrate having thermal relief pads thereon;

a mask on the substrate and the thermal relief pads, the mask having a pattern of holes, the substrate and only one of the thermal relief pads partially exposed from one of the holes; and

a semiconductor die over the thermal relief pads, the thermal relief pads directly under and within planar extents of the semiconductor die.

12. The system as claimed in claim 11 wherein the mask exposes the thermal relief pads in a mesh pattern.

13. The system as claimed in claim 11 wherein processing the mask exposes the thermal relief pads in a row and column of squares pattern.

14. The system as claims in claim 11 wherein the mask exposes the thermal relief pads in a cross hair pattern.

15. The system as claimed in claim 11 wherein the mask exposes the thermal relief pads in a pattern exposing the substrate substantially evenly around the thermal relief pads.

16. The system as claimed in claim 11 wherein:

the mask is a solder mask.

17. The system as claimed in claim 16 wherein the solder mask exposes the thermal relief pads in a mesh pattern exposing a portion of the thermal relief pads and the substrate.

18. The system as claimed in claim 16 wherein the solder mask exposes the thermal relief pads in a row and column of squares pattern at an angle to an edge of the substrate.

19. The system as claims in claim 16 wherein the solder mask exposes the thermal relief pads in a cross hair pattern centered on the thermal relief pads.

20. The system as claimed in claim 16 wherein the solder mask exposes the thermal relief pads in a pattern exposing the substrate substantially evenly around the thermal relief pads with the solder mask crossing the center of the thermal relief pads.

Assignments (5)
CORRECTIVE ASSIGNMENT TO CORRECT THE THE ASSIGNEE'S NAME PREVIOUSLY RECORDED AT REEL: 038378 FRAME: 0252. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Aug 31, 2023
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTD.
Reel/Frame 065236/0784 →
RELEASE OF SECURITY INTEREST Recorded Jun 8, 2020
From: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
To: STATS CHIPPAC, INC.; STATS CHIPPAC PTE. LTD. FORMERLY KNOWN AS STATS CHIPPAC LTD.
Reel/Frame 052864/0057 →
CHANGE OF NAME Recorded Apr 7, 2016
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTE.
Reel/Frame 038378/0252 →
SECURITY INTEREST Recorded Aug 6, 2015
From: STATS CHIPPAC, INC.; STATS CHIPPAC LTD.
To: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
Reel/Frame 036288/0748 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2007
From: ALABIN, LEOCADIO M.; GATBONTON, LIBRADO; ONG, CHIU HSIEH; TEH, BENG YEE; DIMAANO, ANTONIO B., JR.
To: STATS CHIPPAC LTD.
Reel/Frame 019533/0313 →