Field-effect transistor structures with gate electrodes with a metal layer
View Patent ↗Provided is an integrated circuit including a transistor with a gate electrode. The gate electrode includes a polysilicon layer in contact with a gate dielectric layer separating the gate electrode and a semiconductor substrate that comprises an active region of the transistor. The gate electrode includes sidewall structures extending along lower portions of opposing sidewalls of the polysilicon layer, the lower portion being oriented to the semiconductor substrate. The gate electrode also includes a barrier layer. A first section of the barrier layer extends along an upper portion of the sidewall of the polysilicon layer, the upper portion being adjacent to the lower portion and facing away from the semiconductor substrate.
1. An integrated circuit including a transistor that comprises a gate electrode, the gate electrode comprising:
a polysilicon layer in contact with a gate dielectric layer separating the gate electrode and a semiconductor substrate that comprises an active region of the transistor;
sidewall structures extending along lower portions of opposing sidewalls of the polysilicon layer, the lower portion being oriented to the semiconductor substrate; and
a barrier layer, wherein a first section of the barrier layer extends along an upper portion of the sidewall of the polysilicon layer, the upper portion being adjacent to the lower portion and facing away from the semiconductor substrate.
2. The integrated circuit of claim 1 , wherein the barrier layer contains a metal.
3. The integrated circuit of claim 1 , wherein the barrier layer comprises titanium.
4. The integrated circuit of claim 1 , wherein the barrier layer comprises a second section that extends along an upper portion of a second sidewall of the polysilicon layer, wherein the second section faces the first section at the polysilicon layer.
5. The integrated circuit of claim 1 , wherein the barrier layer comprises a third section covering an upper surface of the polysilicon layer.
6. The integrated circuit of claim 5 , the gate electrode further comprising:
a metal layer disposed on the barrier layer.
7. The integrated circuit of claim 6 , wherein the metal layer comprises tungsten.
8. The integrated circuit of claim 6 , wherein the barrier layer comprises further sections extending along the sidewalls of the metal layer.
9. The integrated circuit of claim 6 , further comprising:
a connection line including:
an interconnect barrier layer that is disposed on and in contact with the metal layer; and
an interconnect metal layer disposed on the interconnect barrier layer.
10. The integrated circuit of claim 9 , wherein the interconnect barrier layer comprises a metal.
11. The integrated circuit of claim 10 , wherein the interconnect barrier layer comprises titanium.
12. The integrated circuit of claim 10 , wherein the interconnect metal layer comprises tungsten.
13. The integrated circuit of claim 1 , wherein the sidewall structures are thermally grown silicon oxide structures.
14. The integrated circuit of claim 1 , further comprising:
a contact structure disposed in contact with a source/drain region of a transistor formed in the semiconductor substrate, the contact structure comprising:
a contact barrier layer in contact with the source/drain region; and
a contact metal layer disposed on and in contact with the contact barrier layer; and
a connection line comprising:
an interconnect barrier layer that is disposed on and in contact with the contact metal layer and
an interconnect metal layer disposed on the interconnect barrier layer.
15. An intermediate structure comprising:
a polysilicon structure in contact with a gate dielectric layer separating the polysilicon structure and a semiconductor substrate;
sidewall structures extending along a lower portion of opposing sidewalls of the polysilicon layer, the lower portion being oriented to the semiconductor substrate;
a contact structure disposed in contact with the semiconductor substrate, the contact structure comprising:
a contact barrier layer in contact with a contact area of the semiconductor substrate;
a contact metal layer disposed on and in contact with the contact barrier layer; and
a dielectric cap disposed on and in contact with the contact metal layer and facing the contact area.
16. The intermediate structure of claim 15 , further comprising:
a dielectric spacer separating the contact structure and one of the sidewall structures.
17. The intermediate structure of claim 15 , wherein the sidewall structures are thermally grown silicon oxide structures.
18. A semiconductor component comprising:
a semiconductor substrate;
a gate dielectric layer adjacent the semiconductor substrate;
a polysilicon layer in contact with the gate dielectric layer, the polysilicon layer having opposing sidewalls with lower portions oriented to the semiconductor substrate and upper portions facing away from the semiconductor substrate;
sidewall structures extending along the lower portions of the opposing sidewalls of the polysilicon layer; and
a barrier layer having at least a first section extending along the upper portion of one of the opposing sidewalls of the polysilicon layer.
19. The semiconductor component of claim 18 configured a gate electrode of a transistor.
20. The integrated circuit of claim 18 , wherein the barrier layer further comprises a second section that extends along the upper portion of the other of the opposing sidewalls of the polysilicon layer, wherein the second section faces the first section at the polysilicon layer.