IP Library Granted Patent US 8,293,092
Granted Patent B2
US 8,293,092 · App. 11/912,591 · Granted Oct 23, 2012

Alkaline electroplating bath having a filtration membrane

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Quick Facts
Patent No.
US 8,293,092
App. No.
11/912,591
Granted
Oct 23, 2012
Kind
B2
Abstract

There is described an alkaline electroplating bath for depositing zinc alloys on substrates having an anode and a cathode, wherein the anode region and the cathode region are separated from each other by a filtration membrane.

Claims (26)

1. Alkaline electroplating bath for depositing zinc alloys on substrates having an anode and a cathode, wherein the anode region and the cathode region are separated from each other by a filtration membrane,

wherein the filtration membrane consists of polysulfone,

and wherein the size of the pores of the filtration membrane is in the range of 0.0001 to 1.0 μm.

2. Alkaline electroplating bath according to claim 1 , wherein the size of the pores of the filtration membrane is in the range of 0.1 to 0.3 μm.

3. A process for the deposition of zinc alloys on substrates, wherein the substrate is introduced as the cathode in an alkaline electroplating bath according to claim 2 and the substrate is electroplated with the zinc alloy.

4. Alkaline electroplating bath according to claim 1 , wherein the filtration membrane is configured as a flat membrane.

5. A process for the deposition of zinc alloys on substrates, wherein the substrate is introduced as the cathode in an alkaline electroplating bath according to claim 4 and the substrate is electroplated with the zinc alloy.

6. Alkaline electroplating bath according to claim 1 , wherein the anolyte in the anode region has the same composition as the catholyte in the cathode region.

7. A process for the deposition of zinc alloys on substrates, wherein the substrate is introduced as the cathode in an alkaline electroplating bath according to claim 6 and the substrate is electroplated with the zinc alloy.

8. A process for the deposition of zinc alloys on substrates, wherein the substrate is introduced as the cathode in an alkaline electroplating bath according to claim 1 and the substrate is electroplated with the zinc alloy.

9. A process according to claim 8 , wherein the electrolyte used is a solution comprising the following components:

80-250 g/l NaOH or KOH

5-20 g/l zinc in the form of the soluble zinc salt

0.02-10 g/l of the alloy metal Ni, Fe, Co, Sn in the form of the soluble metal salts

2-200 g/l complexing agent selected from polyalkenylamines, alkanolamines polyhydroxycarboxylates

0.1-5 g/l aromatic or heteroaromatic brightening agents.

10. A process according to claim 8 , wherein the plating is carried out at a temperature of 10 to 60° C.

11. A process according to claim 8 , wherein the bath is operated at a current density of 0.25 to 10 A/dm 2 .

12. A process according to claim 8 , wherein the bath is operated at a current density of 1 to 3 A/dm 2 .

13. A process according to claim 8 , wherein the plating is carried out at a temperature of 20 to 30° C.

14. A process for separating an alkaline electroplating bath having an anode and a cathode into an anode region and a cathode region, for increasing the lifetime of the bath, for preventing the anodic decomposition of organic components of the bath and for obtaining layers of constant high quality, comprising placing a filtration membrane between the anode and the cathode,

wherein the filtration membrane consists of polysulfone,

and wherein the size of the pores of the filtration membrane is in the range of 0.0001 to 1.0 μm.

15. A method for preventing anodic decomposition of organic components of an alkaline electroplating bath having an anode and a cathode and for obtaining layers of constant high quality, the method comprising separating the anode and cathode with a filtration membrane to form an electroplating bath having an anode region and a cathode region,

wherein the filtration membrane consists of polysulfone,

and wherein the size of the pores of the filtration membrane is in the range of 0.0001 to 1.0 μm.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2008
From: ARZT, KARLHEINZ; GEISSLER, JENS-ERIC
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 020546/0579 →