IP Library Granted Patent US 8,168,542
Granted Patent B2
US 8,168,542 · App. 11/968,771 · Granted May 1, 2012

Methods of forming tubular objects

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Quick Facts
Patent No.
US 8,168,542
App. No.
11/968,771
Granted
May 1, 2012
Kind
B2
Abstract

A tubular object is fabricated by a method comprising the steps of providing a first layer, forming a second layer on the first layer, and then patterning the second layer to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature.

Claims (34)

1. A method of forming a tubular object, the method comprising the steps of:

providing a first layer;

forming a second layer on the first layer;

patterning the second layer to form a raised feature with one or more sidewalls;

processing the first layer such that material of the first layer is deposited on the one or more sidewalls of the raised feature, wherein a layer of material deposited on the one or more sidewalls of the raised feature forms a tubular object that surrounds the raised feature; and

removing the raised feature from within the surrounding tubular object so that at least a portion of the tubular object becomes freestanding.

2. The method of claim 1 , wherein the first layer comprises tantalum silicon nitride.

3. The method of claim 1 , wherein the step of forming the second layer comprises depositing a photoresist.

4. The method of claim 3 , wherein the photoresist comprises methoxy-propanol acetate.

5. The method of claim 3 , wherein the photoresist comprises a photoresist adapted for electron beam lithography.

6. The method of claim 3 , wherein the photoresist comprises a photoresist adapted for optical lithography.

7. The method of claim 1 , wherein the step of patterning the second layer comprises electron-beam lithography.

8. The method of claim 1 , wherein the step of patterning the second layer comprises optical lithography.

9. The method of claim 1 , wherein the step of patterning the second layer comprises patterning the second layer such that the one or more sidewalls of the raised feature are tapered.

10. The method of claim 1 , wherein the step of processing the first layer comprises etching the first layer.

11. The method of claim 1 , wherein the step of processing the first layer comprises dry etching the first layer.

12. The method of claim 1 , wherein the step of processing the first layer comprises dry etching the first layer with a halogen-containing reactant.

13. The method of claim 1 , wherein the method comprises semiconductor processing techniques.

14. A tubular object formed by a method comprising the steps of:

providing a first layer;

foaming a second layer on the first layer;

patterning the second layer to form a raised feature with one or more sidewalls;

processing the first layer such that material of the first layer is deposited on the one or more sidewalls of the raised feature, wherein a layer of material deposited on the one or more sidewalls of the raised feature forms a tubular object that surrounds the raised feature; and

removing the raised feature from within the surrounding tubular object so that at least a portion of the tubular object becomes freestanding.

15. The tubular object of claim 14 , wherein the first layer comprises tantalum silicon nitride.

16. The tubular object of claim 14 , wherein the step of forming the second layer comprises depositing a photoresist.

17. The tubular object of claim 14 , wherein the step of patterning the second layer comprises lithography.

18. The tubular object of claim 14 , wherein the step of processing the first layer comprises etching the first layer.

19. An apparatus comprising a tubular object, the tubular object formed by a method comprising the steps of:

providing a first layer;

forming a second layer on the first layer;

patterning the second layer to form a raised feature with one or more sidewalls;

processing the first layer such that material of the first layer is deposited on the one or more sidewalls of the raised feature, wherein a layer of material deposited on the one or more sidewalls of the raised feature forms a tubular object that surrounds the raised feature; and

removing the raised feature from within the surrounding tubular object so that at least a portion of the tubular object becomes freestanding.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 20, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES INC.
Reel/Frame 054636/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 27, 2019
From: GLOBALFOUNDRIES INC.
To: ALSEPHINA INNOVATIONS INC.
Reel/Frame 049612/0211 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 5, 2015
From: GLOBALFOUNDRIES U.S. 2 LLC; GLOBALFOUNDRIES U.S. INC.
To: GLOBALFOUNDRIES INC.
Reel/Frame 036779/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2015
From: INTERNATIONAL BUSINESS MACHINES CORPORATION
To: GLOBALFOUNDRIES U.S. 2 LLC
Reel/Frame 036550/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2008
From: CHEN, KUAN-NENG; ARNOLD, JOHN CHRISTOPHER; RUIZ, NIRANJANA
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 020311/0818 →