Semiconductor device and manufacturing method of the same
View Patent ↗The invention is directed to a semiconductor device having a penetrating electrode and a manufacturing method thereof in which reliability and a yield of the semiconductor device are enhanced. A semiconductor substrate is etched to form a via hole from a back surface of the semiconductor substrate to a pad electrode. This etching is performed under an etching condition such that an opening diameter of the via hole at its bottom is larger than a width of the pad electrode. Next, a second insulation film is formed on the back surface of the semiconductor substrate including in the via hole 16 , exposing the pad electrode at the bottom of the via hole. Next, a penetrating electrode and a wiring layer are formed, being electrically connected with the pad electrode exposed at the bottom of the via hole 16 . Furthermore, a protection layer and a conductive terminal are formed. Finally, the semiconductor substrate is cut and separated in semiconductor dies by dicing.
1. A method of manufacturing a semiconductor device, comprising:
providing a semiconductor substrate comprising a first insulation film disposed on a front surface thereof and a pad electrode disposed on the first insulation film;
etching the semiconductor substrate from a back surface thereof to form a via hole to expose the first insulation film located above the pad electrode; and
etching the exposed first insulation film to expose at least part of the pad electrode,
wherein the etching of the semiconductor substrate is performed so that a diameter of the via hole at the front surface is larger than a width of the pad electrode.
2. The method of claim 1 , further comprising forming a second insulation film on the back surface of the semiconductor substrate and in the via hole, exposing part of the pad electrode by etching the second insulation film, forming a penetrating electrode electrically connected to the pad electrode in the via hole and a wiring layer electrically connected to the penetrating electrode and extending onto the second insulation film on the back surface of the semiconductor substrate, forming a protection layer on the back surface of the semiconductor substrate so as to cover at least part of the wiring layer, and cutting the semiconductor substrate to produce a semiconductor die.
3. The method of claim 2 , further comprising forming a conductive terminal on the wiring layer not covered by the protection layer.
4. The method of claim 1 , wherein the etching of the semiconductor substrate is performed so that the diameter of the via hole at the front surface is made larger than a diameter of the via hole at a middle portion thereof by over-etching the semiconductor substrate.
5. A method of manufacturing a semiconductor device, comprising:
providing a semiconductor substrate comprising an insulation film disposed on a front surface thereof and a pad electrode disposed on the insulation film;
etching the semiconductor substrate from a back surface thereof to form a via hole to expose the insulation film located above the pad electrode; and
etching the exposed insulation film to expose at least part of the pad electrode,
wherein the etching of the semiconductor substrate is performed so that at least part of a rim portion of the via hole at the front surface extends beyond an area of the front surface covered by the pad electrode.
6. A method of manufacturing a semiconductor device, comprising:
providing a semiconductor substrate comprising a first insulation film disposed on a front surface thereof and a metal layer disposed on the first insulation film;
etching the semiconductor substrate from a back surface thereof to form a via hole to expose the first insulation film located above the metal layer; and
etching the exposed first insulation film to expose at least part of the metal layer,
wherein the etching of the semiconductor substrate is performed so that a diameter of the via hole at the front surface is larger than a width of the metal layer.