Patterned strained semiconductor substrate and device
View Patent ↗A method that includes forming a pattern of strained material and relaxed material on a substrate; forming a strained device in the strained material; and forming a non-strained device in the relaxed material is disclosed. In one embodiment, the strained material is silicon (Si) in either a tensile or compressive state, and the relaxed material is Si in a normal state. A buffer layer of silicon germanium (SiGe), silicon carbon (SiC), or similar material is formed on the substrate and has a lattice constant/structure mis-match with the substrate. A relaxed layer of SiGe, SiC, or similar material is formed on the buffer layer and places the strained material in the tensile or compressive state. In another embodiment, carbon-doped silicon or germanium-doped silicon is used to form the strained material. The structure includes a multi-layered substrate having strained and non-strained materials patterned thereon.
1. An electrical device, comprising:
a pattern of strained material and relaxed material formed on a substrate;
a first device formed in the strained material;
a second device formed in the relaxed material; and
a second strained material formed proximate the strained material and the relaxed material,
wherein the strained material is in a compressive state and the second strained material is in a tensile state;
the second strained material is different from the strained material;
at least one of the strained material and the second strained material has a same thickness as the relaxed material;
the strained material contacts the relaxed material at a first junction;
the strained material contacts the second strained material at a second junction;
the substrate comprises a substrate material having an upper surface;
the strained material comprises a germanium-doped silicon layer formed over and contacting the upper surface at a first location;
the second strained material comprises a carbon-doped layer formed over and contacting the upper surface at a second location; and
the relaxed material is formed over and contacting the upper surface at a third location.