Capping layer formation onto a dual damescene interconnect
View Patent ↗A process for the formation of a capping layer on a conducting interconnect for a semiconductor device is provided, the process comprising the steps of: (a) providing one or more conductors in a dielectric layer, and (b) depositing a capping layer on an upper surface of at least some of the one or more conductors, characterized in that the process further includes: (c) the step of, prior to depositing the capping layer, reacting the dielectric layer with an organic compound in a liquid phase, the said organic compound having the following general formula: (I) where X is a functional group, R is an organic group or a organosiloxane group, Y1 is either a functional group or an organic group or organosiloxane group, and Y2 is either a functional group or an organic group or organosiloxane group, and where the functional group(s) is/are independently selected from the following: NH2, a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, OH, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof.
1. A process for the formation of a capping layer on a conducting interconnect for a semiconductor device, the process comprising the steps of:
providing one or more conductors in a dielectric layer; and
depositing a capping layer on an upper surface of at least some of the one or more conductors, characterised in that the process further includes:
the step of, prior to depositing the capping layer, reacting the dielectric layer with an organic compound in a liquid phase, the said organic compound having the following general formula:
wherein X is a functional group, R is an organosiloxane group, Y 1 is a functional group or an organic group or organosiloxane group, and Y 2 is a functional group or an organic group or organosiloxane group and wherein the functional group (s) is/are independently selected from the following: a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof; and
wherein at least one of the organic groups contains one or more branching points.
2. A process as claimed in claim 1 , wherein, prior to the step of reacting the dielectric layer with the organic compound, the process furthers comprises the step of polishing the upper surface of the one or more conductors so that said surface is substantially co-planar with the upper surface of the dielectric.
3. A process as claimed in claim 2 , wherein the step of polishing the upper surface of the one or more conductors comprises chemical mechanical polishing (CMP).
4. A process as claimed in claim 1 , wherein the one or more conductors comprises Cu or an alloy thereof or Ag or an alloy thereof.
5. A process as claimed in claim 1 , wherein the dielectric layer comprises an oxide of silicon or a carbonated oxide of silicon.
6. A process as claimed in claim 5 , wherein the dielectric layer comprises silicon dioxide or carbonated silicon dioxide.
7. A process as claimed in claim 1 , wherein the dielectric layer is a porous layer.
8. A process as claimed in claim 1 , wherein the capping layer comprises an alloy.
9. A process as claimed in claim 1 , wherein the capping layer is deposited by electroless deposition.
10. A process as claimed in claim 1 , wherein R and optionally one or both of Y 1 and Y 2 is/are independently selected from the following organic and organosiloxane groups: a organosiloxane oligomer, or organosiloxane polymer, C1-C25 alkyl, C2 to C25 alkenyl, C2 to C25 alkynyl, aryl, aryl substituted with one or more of C1-C25 alkyl, C2-C25 alkenyl and/or C2-C25 alkynyl.
11. A process as claimed in claim 1 , wherein R is an organosiloxane oligomer or organosiloxane polymer, wherein the organic compound including the organosiloxane oligomer or organosiloxane polymer has the general formula:
wherein n is a positive integer, and wherein Y 1 is a functional group or an organic group, Y 2 is a functional group or an organic group, Y 3 is a functional group or an organic group, Y 4 is a functional group or an organic group, and Y 5 is a functional group or an organic group, and wherein the functional group (s) is/are independently selected from: a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof.
12. A process as claimed in claim 11 , wherein n is in the range of 1 to 20.
13. A process as claimed in claim 12 , wherein n is in the range of 1 to 5.
14. A process as claimed in claim 1 , wherein at least one of the organic groups contains at least two branching points.
15. A process as claimed in claim 1 , wherein the compound having Formula I is hydrolyzed prior to reaction with dielectric surface.
16. A process as claimed in claim 1 , wherein the step of reacting the dielectric surface with the organic compound is carried out in a solvent comprising an organic solvent.
17. A process claimed in claim 1 , wherein the step of reacting the dielectric surface with the organic compound is carried out in a solvent comprising water.
18. A process as claimed in claim 1 , wherein the step or reacting the dielectric surface with the organic compound is carried out in a solution comprising an acid and/or a surfactant.
19. A conducting interconnect for a semiconductor device obtainable by a process as defined in claim 1 .
20. A process as claimed in claim 1 , wherein Y 1 is a functional group.
21. A process as claimed in claim 20 , wherein the functional groups are independently selected from: a secondary amine, a tertiary amine, and salts thereof.
22. A process for the formation of a capping layer on a conducting interconnect for a semiconductor device, the process comprising the steps of: providing one or more conductors in a dielectric layer, the one or more conductors comprising Cu or an alloy thereof, the dielectric layer comprising Si or an oxide or carbonated oxide thereof, and depositing a capping layer on an upper surface of the one or more conductors, characterized in that, prior to depositing the capping layer, the process further includes the step of reacting an upper surface of the dielectric layer with an organic compound including a reactive organofunctional organosiloxane oligomer, said organic compound having the following general formula: wherein X is a functional group, R is an organosiloxane group, Y1 is a functional group or an organic group or organosiloxane group, and Y2 is a functional group or an organic group or organosiloxane group and wherein the functional group (s) is/are independently selected from the following: a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof.
23. A process as claimed in claim 22 , wherein the reactive organofunctional organosiloxane oligomer is provided in the presence of water.
24. A conducting interconnect for a semiconductor device, comprising:
(i) a dielectric layer having one or more conductors provided in an upper surface thereof, said upper surface being functionalized by reacting the dielectric surface with an organic compound in a liquid phase, the said organic compound having the following general formula:
wherein X is a functional group, R is an organosiloxane group Y 1 is either a functional group or an organic group or organosiloxane group, and Y 2 is either a functional group or an organic group or organosiloxane group, and wherein the functional group (s) is/are independently selected from: a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof, and wherein at least one of the organic groups contains one or more branching points; and
(ii) a capping layer provided on an upper surface of at least some of the one or more conductors.
25. A conducting interconnect as claimed in claim 24 , wherein the organic compound is a reactive organofunctional siloxane oligomer.
26. A conducting interconnect as claimed in claim 24 , wherein the one or more conductors comprises Cu or an alloy thereof or Ag or an alloy thereof.
27. A conducting interconnect as claimed in claim 24 , wherein the dielectric layer comprises an oxide of silicon or a carbonated oxide of silicon.
28. A conducting interconnect as claimed in claim 27 , wherein the dielectric layer comprises silicon dioxide or carbonated silicon dioxide.
29. A conducting interconnect as claimed in claim 24 , wherein the dielectric layer is a porous layer.
30. A conducting interconnect as claimed in claim 24 , wherein the capping layer comprises an alloy.
31. A conducting interconnect as claimed in claim 30 , wherein the capping layer comprises a ternary alloy composition.
32. A conducting interconnect as claimed in claim 31 , wherein the ternary alloy composition comprises one or more of Co, Ni, Mo, B, P and Sn.
33. A conducting interconnect as claimed in claim 24 , wherein the capping layer is an electroless deposited capping layer.
34. A semiconductor device comprising a conducting interconnect as defined in claim 25 .
35. A conducting interconnect as claimed in claim 24 , wherein Y 1 is a functional group, and wherein the functional groups are independently selected from: a secondary amine, a tertiary amine, and salts thereof.
36. Use of an organic compound to functionalize a dielectric layer having one or more conductors on a surface thereof, wherein said use comprises reacting the organic compound with the dielectric layer prior to deposition of a capping layer on an upper surface of at least some of the one or more conductors, and wherein said organic compound has the following general formula:
wherein X is a functional group, R is an organosiloxane group, Y 1 is either a functional group, and Y 2 is either a functional group or an organic group or organosiloxane group, and wherein the functional groups are independently selected from: NH 2 , a secondary amine, a tertiary amine, acetamide, trifluoroacetamide, imidazole, urea, OH, an alkyoxy, acryloxy, acetate, SH, an alkylthiol, sulfonate, methanosulfonate, and cyanide, and salts thereof; and
wherein at least one of the organic groups contains one or more branching points.