IP Library Granted Patent US 8,251,777
Granted Patent B2
US 8,251,777 · App. 12/069,495 · Granted Aug 28, 2012

Polishing slurry for aluminum and aluminum alloys

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Quick Facts
Patent No.
US 8,251,777
App. No.
12/069,495
Granted
Aug 28, 2012
Kind
B2
Abstract

The invention is directed to a method of polishing a surface of an object that includes aluminum. The method includes the step of contacting the surface of the object with a soft polishing pad and a polishing composition. The polishing composition includes abrasive particles, an agent that oxidizes aluminum, and a liquid carrier to polish the surface of the object. The polishing composition includes the abrasive particles suspended in the liquid carrier, and is applied at a pH above about 7.

Claims (21)

1. A method of polishing a surface of an object comprising aluminum, which method comprises the steps of:

(i) providing the object;

(ii) providing a polishing pad having a having a Shore A hardness value of 20-80;

(iii) providing a polishing composition having a pH greater than about 7, comprising;

(a) an abrasive,

(b) an agent that oxidizes aluminum, and

(c) a liquid carrier;

(iv) contacting a surface of the object with the polishing pad and the polishing composition, and

(v) polishing the surface of the object to achieve a mirror surface, wherein the mirror surface has 30 angstroms or less rms surface roughness.

2. The method of claim 1 , wherein the abrasive is selected from the group consisting of silica, ceria, and zirconia.

3. The method of claim 1 , wherein the agent that oxidizes aluminum is selected from the group consisting of a persulfate, a peroxide, potassium hydrogen peroxymonosulfate, peracetic acid, and potassium peracetate.

4. The method of claim 3 , wherein the agent that oxidizes aluminum is a persulfate.

5. The method of claim 2 , wherein the abrasive is silica.

6. The method of claim 1 , wherein the abrasive is present in the polishing composition in the amount of about 1 wt % to about 20 wt % based on the total weight of the polishing composition.

7. The method of claim 1 , wherein the abrasive is present in the polishing composition in an amount about 3 wt. % to about 10 wt. % based on the total weight of the polishing composition.

8. The method of claim 4 , wherein the persulfate is ammonium persulfate.

9. The method of claim 1 , further comprising the step of pre-polishing the surface of the object prior to contacting the surface of the object with the polishing pad and the polishing composition.

10. The method of claim 1 , wherein the object comprising aluminum is an aluminum alloy.

11. The method of claim 1 wherein the pH of the polishing composition is between about 8 to about 10.

12. The method of claim 1 , wherein the agent that oxidizes aluminum is present in a concentration about 0.05 wt. % to about 5 wt. %, based on the weight of the polishing composition.

13. The method of claim 1 , wherein the agent that oxidizes aluminum is present in a concentration about 0.1 wt. % to about 2 wt. %, based on the weight of the polishing composition.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Jul 6, 2022
From: JPMORGAN CHASE BANK, N.A.
To: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; KMG-BERNUTH, INC.; MPOWER SPECIALTY CHEMICALS LLC; SEALWELD (USA), INC.; INTERNATIONAL TEST SOLUTIONS, LLC; CMC MATERIALS, INC.
Reel/Frame 060592/0260 →
RELEASE OF SECURITY INTEREST Recorded Nov 16, 2018
From: BANK OF AMERICA, N.A.
To: CABOT MICROELECTRONICS CORPORATION
Reel/Frame 047587/0119 →
SECURITY AGREEMENT Recorded Nov 16, 2018
From: CABOT MICROELECTRONICS CORPORATION; QED TECHNOLOGIES INTERNATIONAL, INC.; FLOWCHEM LLC; KMG ELECTRONIC CHEMICALS, INC.; MPOWER SPECIALTY CHEMICALS LLC
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 047588/0263 →
NOTICE OF SECURITY INTEREST IN PATENTS Recorded Feb 16, 2012
From: CABOT MICROELECTRONICS CORPORATION
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 027727/0275 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 18, 2008
From: MOEGGENBORG, KEVIN; CLARK, JOHN; GILLILAND, JEFFREY; LESIAK, STANLEY; WILSON, SUSAN; BRUSIC, VLASTA
To: CABOT MICROELECTRONICS CORPORATION
Reel/Frame 021113/0828 →