Semiconductor wafer polishing apparatus and method of polishing
View Patent ↗A wafer polishing apparatus has a base and a turntable having a polishing pad thereon and mounted on the base for rotation of the turntable and polishing pad relative to the base about an axis perpendicular to the turntable and polishing pad. The polishing pad includes a work surface engageable with a front surface of a wafer for polishing the front surface of the wafer. A drive mechanism is mounted on the base for imparting rotational motion about an axis substantially parallel to the axis of the turntable. A polishing head is connected to the drive mechanism for driving rotation of the polishing head. The polishing head has a pressure plate adapted to hold the wafer for engaging the front surface of the wafer with the work surface of the polishing pad. The pressure plate has a generally planar position and is selectively movable from the planar position to a convex position and to a concave position.
1. A wafer polishing apparatus comprising:
a base;
a turntable having a polishing pad thereon and mounted on the base for rotation of the turntable and polishing pad relative to the base about an axis perpendicular to the turntable and polishing pad, the polishing pad including a work surface engageable with a front surface of a wafer for polishing the front surface of the wafer;
a drive mechanism mounted on the base for imparting rotational motion about an axis substantially parallel to the axis of the turntable; and
a polishing head connected to the drive mechanism for driving rotation of the polishing head, the polishing head having a pressure plate adapted to hold the wafer for engaging the front surface of the wafer with the work surface of the polishing pad, the pressure plate comprising a support plate and an annular wall extending from the support plate, the support plate having a generally planar position and being selectively movable from the planar position to a convex position and to a concave position, wherein the support plate is deflectable at its center by about 50 micrometers, the annular wall has a thickness between 2 millimeters (0.079 inches) and about 3 millimeters (0.118 inches) and defining a hinge about which the support plate can deflect from the planar position to one of the convex and concave positions, the annular wall flexing outward in relation to the upwards deflection of the support plate to the concave position, the annular wall flexing inward in relation to the downwards deflection of the support plate to the convex position.
2. The wafer polishing apparatus as set forth in claim 1 further comprising a first pressure source for applying a positive pressure to the support plate to cause the support plate to move from the planar position to the convex position and for pulling a vacuum to cause the support plate to move from the planar position to the concave position.
3. The wafer polishing apparatus as set forth in claim 2 wherein the support plate and the annular wall defining at least in part a first interior chamber.
4. The wafer polishing apparatus as set forth in claim 3 further comprising a retaining plate, the retaining plate, support plate and the annular wall defining the first interior chamber.
5. The wafer polishing apparatus as set forth in claim 1 wherein the pressure plate includes a plurality of passages extending through the pressure plate.
6. The wafer polishing apparatus set forth in claim 5 further comprising a second pressure source for applying a pressure to the passages extending through the pressure plate.
7. The wafer polishing apparatus set forth in claim 6 further comprising a baffle plate mounted on the pressure plate, the baffle plate and pressure plate cooperatively defining a second interior chamber.
8. The wafer polishing apparatus as set forth in claim 1 wherein the pressure plate is made of stainless steel.
9. A method of polishing a semiconductor wafer comprising the steps of:
quantifying the flatness of a front surface of the semiconductor wafer;
placing the semiconductor wafer in contact with a polishing head of a wafer polishing apparatus, the polishing head having a pressure plate and a support plate, the wafer being placed in direct contact with the support plate, and an annular wall extending from the support plate;
positioning the wafer held by the polishing head so that a front surface of the wafer engages a work surface of the polishing pad;
urging the front surface of the wafer against the polishing pad;
deflecting the support plate from a generally planar position to one of a convex position and a concave position based on the flatness of the front surface of the wafer, wherein deflection of the support plate from one of the convex and concave positions flexes the annular wall, wherein the support plate is deflectable at its center by about 50 millimeters and the annular wall has a thickness between 2 millimeters (0.079 inches) and about 3 millimeters (0.118 inches) and;
driving rotation of a polishing pad on a turntable of the polishing apparatus about a first axis;
driving rotation of the polishing head generally about a second axis non-coincident with the first axis to thereby polish the front surface of the wafer;
disengaging the wafer from the turntable; and
removing the wafer from the polishing head.
10. A method as set forth in claim 9 wherein the step of deflecting the support plate comprises deflecting the support plate from its generally planar position to its convex position for polishing a wafer having a generally dome shaped front surface.
11. A method as set forth in claim 10 further comprising pressurizing a first interior chamber of the polishing head for deflecting the support plate.
12. A method as set forth in claim 9 wherein the step of deflecting the support plate comprises deflecting the support plate from its generally planar position to its concave position for polishing a wafer having a generally dish shaped front surface.
13. A method as set forth in claim 12 further comprising applying a vacuum to a first interior chamber of the polishing head for deflecting the support plate.
14. A method as set forth in claim 9 wherein the step for placing the semiconductor wafer placed in direct contact with the support plate comprises applying a vacuum through support plate to a back surface of the wafer.
15. A method as set forth in claim 9 further comprising oscillating the front surface of the wafer with respect to the work surface of the polishing pad.
16. A method of polishing a batch of semiconductor wafer comprising the steps of:
placing one of the semiconductor wafers from the batch in contact with a polishing head of a wafer polishing apparatus, the polishing head having a pressure plate, a support plate and an annular wall extending from the support plate, the wafer being placed in direct contact with the support plate;
positioning the wafer held by the polishing head so that a front surface of the wafer engages a work surface of the polishing pad, the work surface having wear;
deflecting the support plate from a generally planar position to one of a convex position and a concave position based on the amount of wear in the work surface of the polishing pad, wherein deflection of the support plate from one of the convex and concave positions flexes the annular wall, wherein the support plate is deflectable at its center by about 50 millimeters and the annular wall has a thickness between 2 millimeters (0.079 inches) and about 3 millimeters (0.118 inches) and;
urging the front surface of the wafer against the polishing pad;
driving rotation of a polishing pad on a turntable of the polishing apparatus about a first axis;
driving rotation of the polishing head generally about a second axis non-coincident with the first axis to thereby polish the front surface of the wafer;
disengaging the wafer from the turntable; and
removing the wafer from the polishing head.
17. A method as set forth in claim 16 further comprising quantifying the flatness of the front surface of the wafer.