IP Library Granted Patent US 7,898,746
Granted Patent B2
US 7,898,746 · App. 12/167,741 · Granted Mar 1, 2011

Extended depth-of-field lenses and methods for their design, optimization and manufacturing

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Quick Facts
Patent No.
US 7,898,746
App. No.
12/167,741
Granted
Mar 1, 2011
Kind
B2
Abstract

For rotationally symmetric aspheric lenses, one can establish lens design and layout based upon the phase delay function exp[−iφ(ρ)]. An embodiment of the invention is a method for calculating a corresponding variation in focal length denoted by f(ρ). According to an aspect, one can also assert a shape for the focal length f(ρ) and thereafter calculate a phase delay function in order to synthesize a novel lens. New EDoF lens designs are obtained by selection of an inner and outer focal length connected by a simple curve that can be approximate by a polynomial. From the selected f(ρ), one can synthesize a finished EDoF lens design and fabricate the lens. Another aspect of this invention is directed to a method to tailor prior-art EDoF lenses so that their performance over some range is improved.

Claims (165)

1. A method for making an aspheric lens, comprising:

a) selecting a radially varying focal length value f(ρ) for the lens, where ρis the lens radius; and

determining a corresponding radially varying phase delay function φ(ρ); and

relating f(ρ) and φ(ρ) via the expression

φ

(

ρ

)

=

0

ρ

-

k

ρ

[

f

2

(

ρ

1

)

+

ρ

1

2

]

1

/

2

ρ

1

,

where ρ 1 is the variable of integration running from zero to ρ and k is a constant.

2. The method of claim 1 , further comprising fabricating the lens.

3. The method of claim 1 , further comprising modifying a performance metric of the lens as a function of f(ρ).

4. The method of claim 3 , further comprising modifying a Strehl ratio of the lens.

5. The method of claim 3 , further comprising modifying a Point Spread Function of the lens.

6. The method of claim 1 , further comprising modifying a depth-of-field value of the lens as a function of f(ρ).

7. The method of claim 1 , further comprising determining an extended depth-of-field of the lens by selecting an inner object distance s 1 and an outer object distance s 2 .

8. The method of claim 1 , further comprising determining a polynomial representation of f(ρ) and obtaining a curve of f versus ρ over a desired range of ρ.

9. The method of claim 8 , further comprising modifying a portion of the curve to provide improved lens performance over a desired object distance sub-range and determining a corresponding modified polynomial representation of f(ρ).

10. The method of claim 9 , further comprising modifying a portion of the curve to provide improved lens performance over a desired object distance sub-range and determining a corresponding modified polynomial representation of f(ρ) mod .

11. The method of claim 10 , further comprising determining a modified phase delay function φ(ρ) mod of the lens from the modified focal length f(ρ) mod .

12. The method of claim 11 , wherein

φ

(

ρ

)

mod

=

0

ρ

-

k

ρ

[

f

2

(

ρ

1

)

mod

+

ρ

1

2

]

1

/

2

ρ

1

,

where ρ 1 is the variable of integration running from zero to ρ.

13. The method of claim 1 , comprising making a rotationally symmetric, aspheric lens having an extended depth of field.

14. A method for optimizing the design of a rotationally symmetric, aspheric, extended depth of field (EDoF) lens specified by a known phase delay function φ L (ρ), where ρ is the lens radius, comprising:

determining a value of the radially-varying focal length f L (ρ) of the lens from the known phase delay function φ L (ρ), wherein said lens has a given range of focal lengths over the range of ρ;

determining a new value of a radially-varying focal length f new (ρ) of the lens that is different than f L (ρ), wherein f new (ρ) incorporates the given range of focal lengths over a range of ρ new , where ρ new is less than ρ; and

determining a new value of a phase delay function φ new (ρ new ).

15. The method of claim 14 , wherein the value of f new (ρ) is constant over a range between about 0.8ρ≦ρ new <ρ.

16. The method of claim 14 , further comprising expressing f new (ρ) as a curve that can be approximated by an n th -order polynomial, where 1≦n ≦6 including non-integer values.

17. The method of claim 16 , wherein the curve is a parabola.

18. The method of claim 16 , further comprising hyper-optimizing the optimized design, comprising:

generating a plurality of curves based on at least two different values of n;

determining a value of a lens performance metric over a desired range of object distances for each of the curves;

selecting the values of the lens performance metrics for two of the curves;

selecting a better range of performance metric values for a corresponding range of object distances over a radial portion ρ 1 of a first one of the two curves and selecting a better range of performance metric values for a corresponding range of different object distances over a radial portion ρ 2 of a second one of the two curves;

generating a new curve f new-hyper (ρ) that includes the radial portions of the first and the second curves and, which, smoothly connects the first curve at ρ 1 to the second curve at ρ 2 ;

determining a polynomial expression for the new, hyper-optimized function f new-hyper (ρ); and

directly determining a hyper-optimized phase delay function φ hyper (ρ) as a function of the lens radius ρ.

19. The method of claim 18 , wherein

φ

hyper

(

ρ

)

=

0

ρ

-

k

ρ

[

f

new

-

hyper

(

ρ

1

)

+

ρ

1

2

]

1

/

2

ρ

1

,

where ρ 1 is the variable of integration running from zero to ρ.

20. A method for designing an aspheric lens that includes a diffraction limited lens and a phase mask, having an extended depth of field (EDoF), comprising:

determining a phase delay function φ P (ρ) of the diffraction limited lens, where ρis the lens radius;

determining a total phase delay function φ L (ρ) of the EDoF lens;

determining a phase delay function φ E (ρ) of the phase mask to provide a desired EDoF, where φ L (ρ)=φ P (ρ)+φ E (ρ);

determining a radially-varying focal length function f L (ρ) of the EDoF lens from the function φ L (ρ);

determining a value of a lens performance metric for the EDoF lens;

modifying f L (ρ) so as to tailor the design to improve the performance metric; and

determining a tailored phase delay function φ T (ρ).

21. The method of claim 20 , further comprising recalculating the value of the lens performance metric for the tailored EDoF lens.

22. The method of claim 21 , further comprising modifying the tailored f (ρ) value to further tailor the lens performance.

23. The method of claim 22 , further comprising recalculating the value of the lens performance metric for the furthered tailored EDoF lens.

24. The method of claim 20 , wherein determining f L (ρ) comprises determining a polynomial representation of f L (ρ) and obtaining a curve of f L versus ρ for a desired range of ρ.

25. The method of claim 24 , further comprising modifying a portion of the curve to provide improved lens performance over a desired object distance sub-range and determining a corresponding modified polynomial representation of f L (ρ) .

26. The method of claim 25 , further comprising determining a modified phase delay function φ L (ρ) of the lens from the modified focal length f L (ρ).

27. The method of claim 24 , wherein the step of modifying f L (ρ) so as to tailor the design to improve the performance metric comprises decreasing the slope of the curve of f L (ρ) corresponding to values of ρ over which improved performance is desired.

Assignments (7)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620, FRAME 0087 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064070/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 5859768 AND TO RECITE COLLATERAL AGENT ROLE OF RECEIVING PARTY IN THE SECURITY INTEREST PREVIOUSLY RECORDED ON REEL 038620 FRAME 0087. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Aug 25, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 039853/0001 →
SECURITY INTEREST Recorded Apr 15, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 038620/0087 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2014
From: APTINA IMAGING CORPORATION
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 034037/0711 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2009
From: MICRON TECHNOLOGY, INC.
To: APTINA IMAGING CORPORATION
Reel/Frame 023340/0599 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2008
From: MICRON TECHNOLOGY, INC.
To: APTINA IMAGING CORPORATION
Reel/Frame 022028/0296 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 23, 2008
From: GEORGE, NICHOLAS; CHEN, XI
To: MICRON TECHNOLOGY, INC.
Reel/Frame 021278/0793 →