Method and apparatus for angular high density plasma chemical vapor deposition
View Patent ↗A high-density plasma chemical vapor deposition tool and the method for use of the tool is disclosed. The chemical vapor deposition tool allows for angular adjustment of the pedestal that holds the substrate being manufactured. Electromagnets serve as an “electron filter” that allows for angular deposition of material onto the substrate. Methods for fabrication of trench structures and asymmetrical spacers in a semiconductor manufacturing process are also disclosed. The angular deposition saves process steps, thereby reducing time, complexity, and cost of manufacture, while improving overall product yield.
1. A chemical vapor deposition apparatus, comprising:
a chamber, said chamber comprised of a base section;
a dome, wherein the dome is disposed on the chamber, and wherein said dome is comprised of an upper portion and a lower portion;
an induction coil; said induction coil disposed around the upper portion of said dome, wherein the portion of the dome with said coil disposed around it is the upper portion of the dome and the portion of the dome below the upper portion of the dome is the lower portion of the dome;
a column located within said chamber;
a pedestal disposed on said column, wherein said pedestal is configured and disposed to adjustably tilt on said column, and wherein the pedestal is disposed in the chamber, below the induction coil;
a plurality of gas injectors, said plurality of gas injectors configured and disposed to inject gas in the upper portion of the dome within said chamber;
a plurality of electromagnets disposed only around the lower portion of said dome, said plurality of electromagnets configured and disposed to perform electron filtering within said chamber, wherein each gas injector of the plurality of gas injectors extends above the plurality of electromagnets, whereby electrons contained within the lower portion of the dome are filtered away, thereby preventing formation of a sheath;
a first frequency source, said first frequency source connected to said induction coil; and
a second frequency source, said second frequency source connected to said pedestal;
wherein the first frequency source is configured and disposed to create a magnetic flux in the chamber at an angle to the pedestal, thereby facilitating an angular deposition and, wherein the pedestal is connected to a plurality of linkage rods, wherein each linkage rod is configured and disposed to move independently in a vertical direction, thereby providing an adjustable tilt of the pedestal in order to create an asymmetrical deposition.
2. The apparatus of claim 1 , wherein the plurality of linkage rods is two linkage rods.