IP Library Granted Patent US 7,459,347
Granted Patent B2
US 7,459,347 · App. 12/213,779 · Granted Dec 2, 2008

Manufacturing method of a semiconductor device

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Quick Facts
Patent No.
US 7,459,347
App. No.
12/213,779
Granted
Dec 2, 2008
Kind
B2
Abstract

A non-leaded resin-sealed semiconductor device is manufactured by the steps of providing a conductive flat substrate (metal plate) of copper plate or the like, fixing semiconductor elements respectively to predetermined positions on the principal surface of the substrate by an insulating adhesive, electrically connecting electrodes on the surfaces of the semiconductor elements with predetermined partition parts of the substrate separate from the semiconductor elements by conductive wires, forming an insulating resin layer on the principal surface of the substrate to cover the semiconductor elements and wires, selectively removing the substrate from the rear of said substrate to form electrically independent partition parts whereof at least some are external electrode terminals, and selectively removing said resin layer to fragment the device into regions containing the semiconductor elements and the plural partition parts around the semiconductor elements. Thus, there is provided a compact non-leaded semiconductor device having a large number of electrode terminals.

Claims (12)

1. A method of manufacturing a semiconductor device comprising the steps of:

providing a metal substrate comprising a front surface, a rear surface opposite to the front surface, a chip fixing partition part on the front surface thereof, a depression formed into the rear surface thereof, grooves formed over the front surface, and partition parts surrounded by the grooves, the grooves being formed around the chip fixing partition part, a dimension of each of the partition parts being smaller than a dimension of the chip fixing partition part, and a bottom surface of the depression is substantially the same size as the chip fixing partition part which corresponds to the bottom surface of the depression across the metal substrate;

forming a notch as a direction identifying part on one side of the chip fixing partition part;

providing a semiconductor chip comprising a front surface, a rear surface, electrodes formed on the front surface thereof;

fixing the semiconductor chip over the chip fixing partition part on the front surface of the metal substrate;

electrically connecting the electrodes of the semiconductor chip with the partition parts of the metal substrate by conductive wires, respectively;

forming a resin body which seals the semiconductor chip, the conductive wires, each of the grooves, and the partition parts of the metal substrate;

after the resin body forming step, etching the rear surface of the metal substrate so that the partition parts are separated from each other and a part of the resin body formed in the each of the grooves is protruded from a level of the etched rear surface of each of the partition parts, a height of each of the partition parts being lower than a height of the resin body formed in the grooves; and

after the etching step, forming a solder plating film on the etched rear surface of each of the partition parts by a print-plating method, the solder plating film being thicker than a height of the part of the resin body protruded from the level of the etched rear surface of each of the partition parts.

2. A method of manufacturing a semiconductor device according to claim 1 , wherein the metal substrate providing step, the rear surface of the metal substrate, which is opposite to the front surface having the grooves and the partition parts formed thereon, has no grooves formed thereon.

3. A method of manufacturing a semiconductor device according to claim 1 , wherein the front surface of the partition parts has a square shape.

4. A method of manufacturing a semiconductor device according to claim 1 , wherein each dimension of said each partition part is smaller than a corresponding dimension of the chip fixing partition part.

Assignments (8)
CHANGE OF ADDRESS Recorded Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
CHANGE OF NAME Recorded May 12, 2017
From: RENESAS SEMICONDUCTOR KYUSHU YAMAGUCHI CO., LTD.
To: RENESAS SEMICONDUCTOR PACKAGE & TEST SOLUTIONS CO., LTD.
Reel/Frame 042484/0880 →
MERGER Recorded May 12, 2017
From: HITACHI YONEZAWA ELECTRONICS CO., LTD.
To: NORTHERN JAPAN SEMICONDUCTOR TECHNOLOGIES, INC.
Reel/Frame 042595/0189 →
MERGER Recorded May 12, 2017
From: RENESAS NORTHERN JAPAN SEMICONDUCTOR, INC.
To: RENESAS SEMICONDUCTOR KYUSHU YAMAGUCHI CO., LTD.
Reel/Frame 042609/0807 →
CHANGE OF NAME Recorded May 12, 2017
From: NORTHERN JAPAN SEMICONDUCTOR TECHNOLOGIES, INC.
To: RENESAS NORTHERN JAPAN SEMICONDUCTOR, INC.
Reel/Frame 042458/0022 →
MERGER Recorded Jul 7, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024662/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2008
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 021420/0974 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 24, 2008
From: SHIMANUKI, YOSHIHIKO; SUZUKI, MASAYUKI
To: HITACHI, LTD.; HITACHI YONEZAWA ELECTRONICS CO. LTD.
Reel/Frame 021187/0784 →