Double-gate semiconductor devices having gates with different work functions and methods of manufacture thereof
View Patent ↗A double-gate FinFET and methods for its manufacture are provided. The FinFET includes first and second gates ( 72, 74 ) adjacent respective sides of the fin ( 20 ), with at least a portion of the first gate facing the fin being formed of polycrystalline silicon, and at least a portion of the second gate facing the fin being formed of a metal silicide compound. The different compositions of the two gates provide different respective work functions to reduce short channel effects.
1. A semiconductor device including:
a fin of semiconductor material on an insulating substrate;
a first gate separated from a first side of the fin by a gate dielectric layer, with at least a portion of the first gate facing the fin being formed of polycrystalline silicon, the polycrystalline silicon extending over the first side of the fin;
wherein a localised oxide layer is over a portion of the polycrystalline silicon; and
a second gate separated by a gate dielectric layer from a second side of the fin which is opposite to the first side, characterised in that the second gate is opposite the first gate and at least a portion of the second gate facing the fin comprises a fully silicided metal silicide region.
2. A device of claim 1 wherein at least a portion of the first gate and/or the second gate near to the fin is doped with dopant atoms.
3. A device of claim 2 wherein the dopant atoms comprise arsenic atoms.
4. A device of claim 1 wherein a layer of a metal silicide compound is formed over the polycrystalline silicon portion of the first gate.
5. A method of manufacturing a semiconductor device the method comprising:
providing an insulating substrate having a top surface;
forming a fin of semiconductor material on the top surface of the insulating substrate, the fin having first and second opposite sides;
depositing a layer of polycrystalline silicon;
forming a localised oxide layer over a portion of the polycrystalline silicon layer which extends over the first side of the fin;
depositing a metal layer; and
annealing such that a fully silicided metal silicide region is formed where the metal layer is in contact with the underlying polycrystalline silicon layer overlying the second side of the fin.
6. The method as recited in claim 5 , wherein forming a localised oxide layer comprises:
projecting ions towards the substrate, at a non-perpendicular angle relative to its top surface, such that a greater number of ions are implanted in a portion of the polycrystalline silicon layer overlying the second side of the fin than a portion overlying the first side thereof;
oxidising the outer surface of the polycrystalline silicon layer, the greater number of implanted ions present in said portion of the polycrystalline silicon layer overlying the second side of the fin resulting in a thinner oxide layer being formed thereover relative to the oxide layer over said portion of the polycrystalline silicon layer overlying the first side of the fin; and
etching away oxide material isotropically to leave said localised layer.
7. The method as recited in claim 5 , wherein forming a localised oxide layer comprises:
forming a layer of oxide material over the polycrystalline silicon layer
projecting ions towards the substrate, at a non-perpendicular angle relative to its top surface, such that a greater number of ions are implanted in a portion of the oxide layer overlying the second side of the fin than a portion overlying the first side thereof;
etching away oxide material to leave said localised layer, the greater number of implanted ions present in said portion of the oxide layer overlying the second side of the fin causing it to etch away more quickly than that portion of the oxide layer overlying the first side of the fin.
8. The method as recited in claim 6 , wherein the projected ions comprise nitrogen.
9. The method as recited in claim 5 , wherein the metal layer is formed of nickel or platinum.
10. The method as recited in claim 5 further including removing material in the polycrystalline silicon layer overlying the top of the fin to separate the portions on either side of the gate.
11. The method as recited in claim 5 , further including after annealing such that a fully silicided metal silicide region is formed,
removing metal silicide material overlying the top of the fin to form the first and second separate gates on respective sides of the fin.
12. The method as recited in claim 10 , wherein the material is removed by CMP.