IP Library Granted Patent US 8,062,486
Granted Patent B2
US 8,062,486 · App. 12/297,320 · Granted Nov 22, 2011

Lithium-containing transition metal oxide target, process for producing the same and lithium ion thin film secondary battery

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Quick Facts
Patent No.
US 8,062,486
App. No.
12/297,320
Granted
Nov 22, 2011
Kind
B2
Abstract

Proposed are a lithium-containing transition metal oxide target formed from a sintered compact of lithium-containing transition metal oxides showing a hexagonal crystalline system in which the sintered compact has a relative density of 90% or higher and an average grain size of 1 μm or greater and 50 μm or less, and a lithium-containing transition metal oxide target formed from a sintered compact of lithium-containing transition metal oxides showing a hexagonal crystalline system in which the intensity ratio of the (003) face, (101) face and (104) face based on X-ray diffraction using CuKα ray satisfies the following conditions: (1) Peak intensity ratio of the (101) face in relation to the (003) face is 0.4 or higher and 1.1 or lower; and (2) Peak ratio of the (101) face in relation to the (104) face is 1.0 or higher. In addition to this lithium-containing transition metal oxide target optimal for forming a thin film positive electrode for use in a thin film battery such as a three-dimensional battery and a solid state battery, also proposed are its production method and a lithium ion thin film secondary battery. In particular, the present invention aims to propose a positive electrode target capable of obtaining a thin film with superior homogeneity.

Claims (14)

1. A lithium-containing transition metal oxide sputtering target for forming a thin film positive electrode of a lithium ion thin film secondary battery, formed from a sintered compact of lithium-containing transition metal oxides showing a hexagonal crystalline system, wherein the sintered compact has a relative density of 90% or higher and an average grain size of 1 μm or greater and 50 μm or less.

2. A lithium-containing transition metal oxide sputtering target for forming a thin film positive electrode of a lithium ion thin film secondary battery according to claim 1 , wherein an intensity ratio of a (003) face, (101) face and (104) face based on X-ray diffraction using CuK a ray satisfies the following conditions: (1) Peak ratio of the (101) face in relation to the (003) face is 0.4 or higher and 1.1 or lower; and (2) Peak ratio of the (101) face in relation to the (104) face is 1.0 or higher.

3. The lithium-containing transition metal oxide target according to claim 2 , wherein the transition metal is at least one selected from Ni, Co, and Mn.

4. The production method of a lithium ion thin film secondary battery, wherein a lithium-containing transition metal oxide is used as the cathode active material by sputtering the lithium-containing transition metal oxide target according to claim 2 .

5. The lithium-containing transition metal oxide target according to claim 1 , wherein the transition metal is at least one selected from Ni, Co, and Mn.

6. The production method of a lithium ion thin film secondary battery, wherein a lithium-containing transition metal oxide is used as the cathode active material by sputtering the lithium-containing transition metal oxide target according to claim 1 .

7. The lithium-containing transition metal oxide target according to claim 1 , wherein the transition metal is Ni.

8. The lithium-containing transition metal oxide target according to claim 1 , wherein the target contains at least two different transition metals selected from the group consisting of Ni, Co and Mn.

9. The lithium-containing transition metal oxide target according to claim 1 , wherein the target contains three different transition metals including Ni, Co and Mn.

10. A production method of a lithium-containing transition metal oxide sputtering target for forming a thin film positive electrode of a lithium ion thin film secondary battery, comprising the steps of using lithium-containing transition metal salt as a precursor in which the molar ratio of Li/transition metal is 1.1 or more and 1.3 or less, oxidizing this to create lithium-containing transition metal oxides showing a hexagonal crystalline system, and pressing and sintering the lithium-containing transition metal oxides to obtain a sintered compact having a relative density of 90% or higher and an average grain size of 1 μm or greater and 50 μm or less.

11. The production method of a lithium-containing transition metal oxide sputtering target according to claim 10 , wherein the lithium-containing transition metal oxide sputtering target for forming a thin film positive electrode of a lithium ion thin film secondary battery, is formed from the sintered compact of lithium-containing transition metal oxides showing the hexagonal crystalline system, and wherein an intensity ratio of a (003) face, (101) face and (104) face based on X-ray diffraction using CuK a ray satisfies the following conditions: (1) Peak ratio of the (101) face in relation to the (003) face is 0.4 or higher and 1.1 or lower; and (2) Peak ratio of the (101) face in relation to the (104) face is 1.0 or higher.

12. The production method of a lithium-containing transition metal oxide target according to claim 11 , wherein the transition metal is at least one selected from Ni, Co, and Mn.

13. The production method of a lithium ion thin film secondary battery, wherein a lithium-containing transition metal oxide is used as the cathode active material by sputtering the lithium-containing transition metal oxide target according to claim 10 .

14. The production method of a lithium-containing transition metal oxide target according to claim 10 , wherein the transition metal is at least one selected from Ni, Co, and Mn.

Assignments (5)
CHANGE OF ADDRESS Recorded Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →
CHANGE OF ADDRESS Recorded Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
CHANGE OF NAME Recorded Oct 12, 2010
From: NIPPON MINING HOLDINGS, INC.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 025123/0358 →
MERGER Recorded Oct 8, 2010
From: NIPPON MINING & METALS CO., LTD.
To: NIPPON MINING HOLDINGS, INC.
Reel/Frame 025115/0062 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 16, 2008
From: NAGASE, RYUICHI; KAJIYA, YOSHIO
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 021697/0331 →