Photoresist composition and method of manufacturing array substrate using the same
View Patent ↗A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
1. A method of manufacturing an array substrate, comprising:
forming a gate line and a gate electrode on a base substrate;
forming a gate insulation layer, an active layer, and a data metal layer on the base substrate formed the gate line and the gate electrode;
forming a photoresist film using a photoresist composition comprising a binder resin, a photo acid generator, an acryl resin represented by Chemical Formula 1, and a solvent, the photoresist film formed on the data metal layer;
forming a first photoresist pattern by patterning the photoresist film, the first photoresist pattern comprising a source electrode/line portion having a first thickness, a drain electrode portion having the first thickness, and a channel forming portion having a second thickness;
forming a data line and a channel portion by etching the data metal layer and the active layer using the first photoresist pattern as a mask;
forming a second photoresist pattern by removing the channel forming portion of the first photoresist pattern, the second photoresist pattern exposing a portion of the data metal layer;
forming a source electrode and a drain electrode by etching the data metal layer using the second photoresist pattern as a mask; and
forming an ohmic contact pattern by etching the active layer using the second photoresist pattern as a mask,
wherein R 1 , R 2 , R 3 , R 4 , and R 5 each represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, and a, b, d, and e each represent a value in a range of about 0.01 to about 0.99, and the sum of a, b, d, and e is 1.
2. The method of claim 1 , wherein a is about 0.5 to about 0.6, b is about 0.25 to about 0.35, d is about 0.05 to about 0.15, and e is about 0.01 to about 0.1.
3. The method of claim 2 , wherein the acryl resin is represented by Chemical Formula 2,
4. The method of claim 1 , further comprising a hydroxyl phenol derivative represented by Chemical Formula 3,
wherein R 6 , R 7 , and R 8 each represent an alkyl group having 1-3 carbon atoms.
5. The method of claim 4 , wherein R 6 , R 7 , and R 8 each represent a methyl group.
6. The method of claim 1 , wherein a weight average molecular weight of the acryl resin is about 5,000 to about 30,000.