Semiconductor device and method of forming prefabricated heat spreader frame with embedded semiconductor die
View Patent ↗A semiconductor device is made by mounting a prefabricated heat spreader frame over a temporary substrate. The heat spreader frame includes vertical bodies over a flat plate. A semiconductor die is mounted to the heat spreader frame for thermal dissipation. An encapsulant is deposited around the vertical bodies and semiconductor die while leaving contact pads on the semiconductor die exposed. The encapsulant can be deposited using a wafer level direct/top gate molding process or wafer level film assist molding process. An interconnect structure is formed over the semiconductor die. The interconnect structure includes a first conductive layer formed over the semiconductor die, an insulating layer formed over the first conductive layer, and a second conductive layer formed over the first conductive layer and insulating layer. The temporary substrate is removed, dicing tape is applied to the heat spreader frame, and the semiconductor die is singulated.
1. A method of manufacturing a semiconductor device, comprising:
providing a prefabricated heat spreader frame including a flat plate with a plurality of bodies extending from the flat plate to form a plurality of die mounting sites on the flat plate;
disposing a plurality of semiconductor die over the die mounting sites on the flat plate in the prefabricated heat spreader frame for thermal dissipation;
providing a chase mold including a center plate;
placing the prefabricated heat spreader frame and semiconductor die in the chase mold;
depositing an encapsulant from the center plate of the chase mold over the semiconductor die and prefabricated heat spreader frame while leaving contact pads on the semiconductor die devoid of the encapsulant;
forming an interconnect structure over the semiconductor die; and
singulating the bodies of the prefabricated heat spreader frame to separate the semiconductor die.
2. The method of claim 1 , wherein forming the interconnect structure includes:
forming a first conductive layer over the semiconductor die;
forming an insulating layer over the first conductive layer; and
forming a second conductive layer over the first conductive layer.
3. The method of claim 2 , wherein forming the interconnect structure further includes forming a bump over the second conductive layer.
4. A method of manufacturing a semiconductor device, comprising:
providing a prefabricated heat spreader frame including a plurality of die mounting sites;
disposing a plurality of semiconductor die over the die mounting sites in the prefabricated heat spreader frame;
placing the prefabricated heat spreader frame and semiconductor die in a chase mold;
depositing an encapsulant over the semiconductor die and prefabricated heat spreader frame while in the chase mold to leave contact pads on the semiconductor die devoid of the encapsulant; and
forming an interconnect structure over the semiconductor die.
5. The method of claim 4 , wherein the prefabricated heat spreader frame includes vertical bodies over a flat plate.
6. The method of claim 4 , further including depositing the encapsulant using a wafer level direct/top gate molding process.
7. The method of claim 4 , further including depositing the encapsulant using a wafer level film assist molding process.
8. The method of claim 4 , wherein forming the interconnect structure includes:
forming a first conductive layer over the semiconductor die;
forming an insulating layer over the first conductive layer; and
forming a second conductive layer over the first conductive layer.
9. A method of manufacturing a semiconductor device, comprising:
providing a wafer-shaped carrier;
mounting a wafer-shaped heat spreader frame including a plurality of die mounting sites over the wafer-shaped carrier;
disposing a plurality of semiconductor die over the die mounting sites of the wafer-shaped heat spreader frame; and
depositing an encapsulant over the semiconductor die and wafer-shaped heat spreader frame while leaving contact pads on the semiconductor die devoid of the encapsulant.
10. The method of claim 9 , wherein the wafer-shaped heat spreader frame includes vertical bodies over a flat plate.
11. The method of claim 9 , further including depositing the encapsulant using a wafer level direct/top gate molding process.
12. The method of claim 9 , further including depositing the encapsulant using a wafer level film assist molding process.
13. The method of claim 9 , further including:
removing the wafer-shaped carrier; and
applying dicing tape to the wafer-shaped heat spreader frame.
14. The method of claim 9 , wherein forming the interconnect structure includes:
forming a first conductive layer over the semiconductor die;
forming an insulating layer over the first conductive layer; and
forming a second conductive layer over the first conductive layer.
15. A semiconductor device, comprising:
a prefabricated heat spreader frame including a plurality of die mounting sites;
a plurality of semiconductor die disposed over the die mounting sites in the prefabricated heat spreader frame;
a chase mold for housing the semiconductor and prefabricated heat spreader frame;
an encapsulant deposited over the semiconductor die and prefabricated heat spreader frame while in the chase mold to leave contact pads on the semiconductor die devoid of the encapsulant; and
an interconnect structure formed over the semiconductor die.
16. The semiconductor device of claim 15 , wherein the prefabricated heat spreader frame includes vertical bodies over a flat plate.
17. The semiconductor device of claim 15 , wherein the interconnect structure includes:
a first conductive layer formed over the semiconductor die;
an insulating layer formed over the first conductive layer; and
a second conductive layer formed over the first conductive layer.
18. A method of manufacturing a semiconductor device, comprising:
providing a prefabricated heat spreader frame including a plurality of die mounting sites;
mounting a plurality of semiconductor die to the die mounting sites in the prefabricated heat spreader frame;
placing the prefabricated heat spreader frame and semiconductor die in a chase mold; and
depositing an encapsulant over the semiconductor die and prefabricated heat spreader frame while in the chase mold.
19. The method of claim 18 , wherein the prefabricated heat spreader frame includes vertical bodies over a flat plate.
20. The method of claim 18 , further including depositing the encapsulant using a wafer level direct/top gate molding process.
21. The method of claim 18 , further including depositing the encapsulant using a wafer level film assist molding process.
22. The method of claim 18 , wherein forming the interconnect structure includes:
forming a first conductive layer over the semiconductor die;
forming an insulating layer over the first conductive layer; and
forming a second conductive layer over the first conductive layer.
23. The method of claim 18 , further including forming an interconnect structure over the semiconductor die.
24. The method of claim 18 , further including singulating the prefabricated heat spreader frame to separate the semiconductor die.
25. The method of claim 4 , further including singulating the prefabricated heat spreader frame to separate the semiconductor die.
26. The method of claim 9 , further including forming an interconnect structure over the semiconductor die.
27. The method of claim 9 , further including singulating the prefabricated heat spreader frame to separate the semiconductor die.