Precursor compositions for ALD/CVD of group II ruthenate thin films
View Patent ↗Precursor compositions useful for atomic layer deposition (ALD) and chemical vapor deposition (CVD) of strontium ruthenium oxide (SrRuO 3 ) thin films, e.g., in the manufacture of microelectronic devices, as well as processes of making and using such precursors, and precursor supply systems containing such precursor compositions in packaged form. Cyclopentadienyl compounds of varied type are described, including cyclopentadienyl as well as non cyclopentadienyl ligands coordinated to ruthenium, strontium or barium central atoms. The precursors of the invention are useful for forming contacts for microelectronic memory device structures, and in a specific aspect for selectively coating copper metallization without deposition on associated dielectric, under deposition conditions in a forming gas ambient.
1. A composition, comprising a compound or complex comprising a ruthenium compound containing at least one cyclopentadienyl ligand, and at least one further ligand selected from among guanidinate and beta-diketiminate ligands.
2. A composition comprising a compound or complex comprising a mixed ligand monomeric Cp complex of ruthenium, calcium strontium or barium, selected from among:
ruthenium beta-diketiminate compounds of the formula
wherein each of R 1 , R 2 , R 3 , R 4 and R 5 can be the same as or different from the others, and each is independently selected from among hydrogen, C 1 -C 12 alkyl, C 1 -C 12 alkylamino, C 3 -C 8 cycloalkyl, C 6 -C 12 aryl, C 5 -C 12 heteroaryl, C 1 -C 12 alkoxy, C 3 -C 6 alkylsilyl, C 2 -C 12 alkenyl, R 1 R 2 NNR 3 , wherein R 1 , R 2 and R 3 may be the same as or different from one another and each is independently selected from hydrogen and C 1 -C 6 alkyl, and pendant ligands including functional group(s) providing further coordination to the ruthenium central atom, and selected from among aminoalkyl, alkoxyalkyl, aryloxyalkyl, imidoalkyl, and acetylalkyl, and wherein each of R 6 , R 7 , and R 8 can be the same as or different from the others, and is independently selected from hydrogen, C 1 -C 6 alkyl, C 6 -C 10 aryl, C 1 -C 6 alkylamine, silyl and substituted silyl.
3. A composition comprising a compound or complex comprising a mixed ligand monomeric Cp complex of ruthenium, calcium, strontium or barium, selected from among:
ruthenium beta-diketoiminate compounds of the formula
wherein each of R 1 , R 2 , R 3 , R 4 and R 5 can be the same as or different from the others, and each is independently selected from among hydrogen, C 1 -C 12 alkyl, C 1 -C 12 alkylamino, C 3 -C 8 cycloalkyl, C 6 -C 12 aryl, C 5 -C 12 heteroaryl, C 1 -C 12 alkoxy, C 3 -C 6 alkylsilyl, C 2 -C 12 alkenyl, R 1 R 2 NNR 3 , wherein R 1 , R 2 and R 3 may be the same as or different from one another and each is independently selected from hydrogen and C 1 -C 6 alkyl, and pendant ligands including functional group(s) providing further coordination to the ruthenium central atom, and selected from among aminoalkyl, alkoxyalkyl, aryloxyalkyl, imidoalkyl, and acetylalkyl, and wherein each of R 6 , R 7 , and R 8 can be the same as or different from the others, and is independently selected from C 1 -C 6 alkyl, C 6 -C 10 aryl, C 1 -C 6 alkylamine, silyl and substituted silyl.
4. A composition comprising a compound or complex comprising a mixed ligand monomeric Cp complex of ruthenium, calcium, strontium or barium, selected from among:
ruthenium guanidinate compounds of the formula:
wherein each of R 1 , R 2 , R 3 , R 4 and R 5 can be the same as or different from the others, and each is independently selected from among hydrogen, C 1 -C 12 alkyl, C 1 -C 12 alkylamino, C 3 -C 8 cycloalkyl, C 6 -C 12 aryl, C 5 -C 12 heteroaryl, C 1 -C 12 alkoxy, C 3 -C 6 alkylsilyl, C 2 -C 12 alkenyl, R 1 R 2 NNR 3 , wherein R 1 , R 2 and R 3 may be the same as or different from one another and each is independently selected from hydrogen and C 1 -C 6 alkyl, and pendant ligands including functional group(s) providing further coordination to the ruthenium central atom, and selected from among aminoalkyl, alkoxyalkyl, aryloxyalkyl, imidoalkyl, and acetylalkyl, and wherein each of R 6 , R 7 , R 8 and R 9 can be the same as or different from the others, and is independently selected from hydrogen, C 1 -C 5 alkyl, C 6 -C 10 aryl, C 3 -C 9 cycloalkyl, silyl and substituted silyl.