Semiconductor device and method of mounting die with TSV in cavity of substrate for electrical interconnect of Fi-PoP
View Patent ↗A semiconductor device has a substrate with a cavity formed through first and second surfaces of the substrate. A conductive TSV is formed through a first semiconductor die, which is mounted in the cavity. The first semiconductor die may extend above the cavity. An encapsulant is deposited over the substrate and a first surface of the first semiconductor die. A portion of the encapsulant is removed from the first surface of the first semiconductor die to expose the conductive TSV. A second semiconductor die is mounted to the first surface of the first semiconductor die. The second semiconductor die is electrically connected to the conductive TSV. An interposer is disposed between the first semiconductor die and second semiconductor die. A third semiconductor die is mounted over a second surface of the first semiconductor die. A heat sink is formed over a surface of the third semiconductor die.
1. A method of manufacturing a semiconductor device, comprising:
providing a substrate;
forming a first cavity through the substrate;
forming a via through a first semiconductor die;
filling the via with conductive material to form a conductive via;
mounting the first semiconductor die in the first cavity;
depositing an encapsulant over the substrate and a first surface of the first semiconductor die;
removing a portion of the encapsulant to create a second cavity within the encapsulant and to expose the first surface of the first semiconductor die;
mounting a second semiconductor die to the first surface of the first semiconductor die with an active surface of the second semiconductor die disposed within the second cavity to reduce a height of the semiconductor device, the second semiconductor die being electrically connected to the conductive via; and
mounting a third semiconductor die over a second surface of the first semiconductor die opposite the first surface of the first semiconductor die such that the third semiconductor die is electrically connected to the second semiconductor die through the conductive via in the first semiconductor die.
2. The method of claim 1 , further including:
forming a first conductive layer on the substrate; and
forming a bond wire between the first conductive layer and conductive via.
3. The method of claim 1 , further including disposing an interposer between the first semiconductor die and second semiconductor die.
4. The method of claim 1 , further including disposing a fourth semiconductor die having conductive vias between the first semiconductor die and second semiconductor die.
5. The method of claim 1 , wherein the first semiconductor die extends above the first cavity.
6. The method of claim 1 , further including forming a heat sink over a surface of the third semiconductor die opposite the first semiconductor die.
7. A method of manufacturing a semiconductor device, comprising:
providing a substrate;
forming a first cavity through the substrate;
providing a first semiconductor component;
forming a conductive through silicon via (TSV) through the first semiconductor component;
mounting the first semiconductor component in the first cavity;
depositing an encapsulant over the substrate and a first surface of the first semiconductor component;
removing a portion of the encapsulant to create a second cavity within the encapsulant over the first surface of the first semiconductor component; and
mounting a second semiconductor component to the first surface of the first semiconductor component with a surface of the second semiconductor die disposed within the second cavity, the second semiconductor component being electrically connected to the conductive TSV.
8. The method of claim 7 , further including mounting a third semiconductor component over a second surface of the first semiconductor component opposite the first surface of the first semiconductor component.
9. The method of claim 7 , further including:
forming a first conductive layer on the substrate; and
forming a bond wire between the first conductive layer and conductive TSV.
10. The method of claim 7 , further including disposing an interposer between the first semiconductor component and second semiconductor component.
11. The method of claim 7 , further including disposing a third semiconductor component having conductive vias between the first semiconductor component and second semiconductor component.
12. The method of claim 7 , wherein the first semiconductor component extends above the first cavity.
13. The method of claim 7 , wherein the first semiconductor component is a semiconductor die, integrated passive device, or interposer.
14. A method of manufacturing a semiconductor device, comprising:
providing a substrate;
forming first a cavity through the substrate;
providing a first semiconductor component;
forming a conductive through silicon via (TSV) through the first semiconductor component;
mounting the first semiconductor component in the cavity;
depositing an encapsulant over the substrate and a first surface of the first semiconductor component;
removing a portion of the encapsulant over the first semiconductor component to create a second cavity within the encapsulant; and
mounting a second semiconductor component over the first surface of the first semiconductor component with a portion of the second semiconductor die disposed within the second cavity.
15. The method of claim 14 , further including forming bumps between the first semiconductor component and second semiconductor component.
16. The method of claim 14 , further including disposing an interposer between the first semiconductor component and second semiconductor component.
17. The method of claim 14 , further including disposing a fourth semiconductor component having conductive TSV between the first semiconductor component and second semiconductor component.
18. The method of claim 14 , wherein the first semiconductor component is a semiconductor die, integrated passive device, or interposer.
19. The method of claim 14 , further including:
forming a first conductive layer on the substrate;
forming a bond wire between the first conductive layer and conductive TSV; and
depositing wire-in-film material over the bond wire.
20. The method of claim 14 , further including mounting a third semiconductor component over a second surface of the first semiconductor component opposite the first surface of the first semiconductor component such that the third semiconductor component is electrically connected to the second semiconductor component through the conductive via in the first semiconductor component.