Efficiency in antireflective coating layers for solar cells
View Patent ↗A method for fabricating a cell structure includes doping a substrate to form a N-region and a P-region, disposing a first anti-reflective layer on the substrate, disposing a metallic contact paste on the first anti-reflective layer, drying the metallic contact paste to form contacts, disposing a second anti-reflective layer on the first anti-reflective layer and the metallic contacts, and heating the cell structure, wherein heating the cell structure results in metallic contact material penetrating the first anti-reflective layer and contacting the substrate.
1. A method for fabricating a cell structure comprising:
doping a substrate to form a N-region and a P-region;
disposing a first anti-reflective layer on the substrate;
disposing a metallic contact paste on the first anti-reflective layer;
drying the metallic contact paste to form metallic contacts;
disposing a second anti-reflective layer on the first anti-reflective layer and the metallic contacts; and
heating the cell structure, to cause material of the metallic contacts to penetrate the first anti-reflective layer and contact the substrate, and diffuse material of the metallic contacts into a region of the second anti-reflective layer.
2. The method of claim 1 , wherein the heating the cell structure further results in the first and second anti-reflective layers in forming a single resultant anti-reflective layer.
3. The method of claim 2 , wherein the single resultant anti-reflective layer has a thickness x of between 50 and 100 nanometers.
4. The method of claim 3 , wherein the first anti-reflective layer has a thickness of ½x.
5. The method of claim 3 , wherein the second anti-reflective layer has a thickness of ½x.
6. The method of claim 1 , wherein the first anti-reflective layer is made of a dielectric material.
7. The method of claim 1 , wherein the second anti-reflective layer is made of a dielectric material.
8. The method of claim 1 , wherein the metallic contact paste is a silver (Ag) paste.
9. A method for fabricating a cell structure comprising:
doping a substrate to form a N-region and a P-region;
disposing a first anti-reflective layer on the substrate;
disposing a metallic contact paste on the first anti-reflective layer;
drying the metallic contact paste to form metallic contacts;
disposing a second anti-reflective layer on the first anti-reflective layer and the metallic contacts; and
heating the cell structure, following the disposing the second anti-reflective layer, to cause material of the metallic contacts to penetrate the first anti-reflective layer and contact the substrate.
10. The method of claim 9 , wherein the heating the cell structure further results in diffusing material of the metallic contacts into a region of the second anti-reflective layer.
11. The method of claim 9 , wherein the heating the cell structure further results in the first and second anti-reflective layers in forming a single resultant anti-reflective layer.
12. The method of claim 11 , wherein the single resultant anti-reflective layer has a thickness x of between 50 and 100 nanometers.
13. The method of claim 12 , wherein the first anti-reflective layer has a thickness of ½x.
14. The method of claim 12 , wherein the second anti-reflective layer has a thickness of ½x.
15. The method of claim 9 , wherein the first anti-reflective layer is made of a dielectric material.
16. The method of claim 9 , wherein the second anti-reflective layer is made of a dielectric material.
17. The method of claim 9 , wherein the metallic contact paste is a silver (Ag) paste.