Method and structure for gate height scaling with high-k/metal gate technology

1. A method of forming a semiconductor structure, comprising:

forming a dummy gate and at least one polysilicon feature, all of which are formed from a same polysilicon layer and wherein the dummy gate is formed over a gate metal layer associated with a transistor;

selectively removing the dummy gate while protecting the at least one polysilicon feature; and

forming a gate contact on the gate metal layer to thereby form a metal gate having a height that is less than half a height of the at least one polysilicon feature.

2. The method of claim 1 , wherein the at least one polysilicon feature comprises a first polysilicon feature associated with a resistor and a second polysilicon feature associated with an e-fuse.

3. The method of claim 2 , wherein:

the first polysilicon feature and the second polysilicon feature are formed over an isolation region of a substrate;

the dummy gate is formed over an active region of the substrate; and

the active region is adjacent to the isolation region.

4. The method of claim 1 , further comprising:

forming a high-k dielectric layer on a substrate;

forming the gate metal layer on the high-k dielectric layer;

forming a silicon layer on the gate metal layer;

forming an etch-stop layer on the silicon layer; and

forming the polysilicon layer on the etch-stop layer.

5. The method of claim 4 , further comprising:

forming a barrier layer on the substrate, over the dummy gate, and over the at least one polysilicon feature;

forming a dielectric layer on the barrier layer; and

removing a portion of the barrier layer over the dummy gate.

6. The method of claim 5 , further comprising masking the barrier layer over the at least one polysilicon feature during the removing the portion of the barrier layer over the dummy gate.

7. The method of claim 5 , further comprising removing the etch-stop layer after removing the dummy gate.

8. The method of claim 7 , wherein:

the removing the etch-stop layer exposes the silicon layer; and

the forming the gate contact comprises forming a silicide using the silicon layer.

9. The method of claim 1 , wherein:

the metal gate has a height of about 10 nm to about 30 nm; and

the at least one polysilicon feature has a height of about 50 nm to about 80 nm.

10. A method of forming a semiconductor device, comprising:

forming a high-k dielectric layer on a substrate;

forming a metal layer on the high-k dielectric layer;

forming a silicon layer on the metal layer;

forming an etch-stop layer on the silicon layer;

forming a polysilicon layer on the etch-stop layer;

patterning the polysilicon layer into a dummy gate associated with a transistor and at least one polysilicon feature associated with at least one other device;

forming a barrier layer over the substrate, the dummy gate, and the at least one polysilicon feature;

removing a portion of the barrier layer from over the dummy gate while masking the barrier layer over the at least one polysilicon feature;

selectively removing the dummy gate to expose a portion of the etch-stop layer;

removing the exposed portion of the etch-stop layer to expose a portion of the silicon layer; and

forming a silicide gate contact from the exposed silicon layer.

11. The method of claim 10 , wherein a metal gate of the transistor comprising a portion of the metal layer and the silicide gate contact has a gate height that is less than half a height of the at least one polysilicon feature.

12. The method of claim 11 , wherein:

the metal gate has a height of about 10 nm to about 30 nm; and

the at least one polysilicon feature has a height of about 50 nm to about 80 nm.

13. The method of claim 10 , wherein the at least one polysilicon feature comprises a first polysilicon feature associated with a resistor and a second polysilicon feature associated with an e-fuse.

14. The method of claim 13 , wherein:

the first polysilicon feature and the second polysilicon feature are formed over an isolation region of a substrate;

the dummy gate is formed over an active region of the substrate; and

the active region is adjacent to the isolation region.

15. The method of claim 13 , further comprising forming a silicide contact on the second polysilicon feature.

16. The method of claim 10 , wherein the removing the portion of the barrier layer from over the dummy gate exposes a silicide portion on the dummy gate, and further comprising removing the silicide portion prior to removing the dummy gate.