Semiconductor device and method to manufacture thereof

1. A semiconductor device comprising:

a semiconductor substrate;

a connection electrode connected to an integrated circuit on the semiconductor substrate;

a through electrode which penetrates the semiconductor substrate and the connection electrode; and

an insulation portion interposed between the semiconductor substrate and the through electrode, wherein

the through electrode is connected to the connection electrode in a region where the through electrode penetrates the connection electrode.

2. The semiconductor device according to claim 1 , wherein:

the semiconductor substrate includes a first through hole which penetrates the semiconductor substrate, and a second through hole which vertically penetrates the insulation portion inside the first through hole;

the insulation portion is disposed inside the first through hole; and

the through electrode is disposed inside the second through hole.

3. The semiconductor device according to claim 2 , wherein:

the first through hole is tapered in a direction from the upper surface to a lower surface of the semiconductor substrate;

the insulation portion is formed to fill the first through hole; and

the second through hole is tapered from the lower surface to the upper surface of the semiconductor substrate.

4. A method of manufacturing a semiconductor device comprising:

bonding a first support member formed of a support base material and a support adhesive agent on an upper surface of a semiconductor substrate provided with a connection electrode by directing the support adhesive agent downward;

forming a first through hole which penetrates the semiconductor substrate;

forming an insulation portion inside the first through hole;

forming a second through hole which vertically penetrates the insulation portion and the connection electrode, and further penetrates the support adhesive agent inside the first through hole; and

forming a through electrode in a region corresponding to the semiconductor substrate, the connection electrode and the support adhesive agent inside the second through hole.

5. The method of manufacturing the semiconductor device according to claim 4 , wherein:

the first support member is provided with a stopper layer interposed between the support base material and the support adhesive agent; and

forming the second through hole includes forming the second through hole which penetrates the insulation portion, the connection electrode and the support adhesive agent from a lower surface of the semiconductor substrate to reach the stopper layer.

6. The method for manufacturing the semiconductor device according to claim 4 , further comprising a first bonding pump in a region corresponding to the support adhesive agent inside the second through hole.

7. The method for manufacturing the semiconductor device according to claim 4 , further comprising:

bonding a second support member to a lower surface of the semiconductor substrate; and forming a second bonding bump to a lower surface of the through electrode using the second support member as a mask after eliminating the support adhesive agent and the support base material, wherein:

forming the second through hole includes forming the second through hole which penetrates the second support member, the insulation portion, the connection electrode, and the support adhesive agent inside the first through hole; and

forming the electrode includes forming the through electrode using the second support member as the mask.

8. The method for manufacturing the semiconductor device according to claim 4 , wherein:

forming the first through hole includes eliminating the semiconductor substrate in a direction from an upper surface to a lower surface thereof; and

forming the second through hole includes eliminating the insulation portion, the connection electrode and the support adhesive agent in the direction from the lower surface to the upper surface of the semiconductor substrate.

9. The semiconductor device according to claim 1 , wherein:

the connection electrode is disposed on an upper surface of the semiconductor substrate.

10. The semiconductor device according to claim 1 , wherein: the through electrode is integrally formed.

11. The semiconductor device according to claim 1 , wherein:

the through electrode protrudes outward from an upper surface of the semiconductor substrate and the connection electrode.

12. The method of manufacturing the semiconductor device according to claim 4 , further comprising:

forming the through electrode integrally.

13. The semiconductor device according to claim 3 wherein:

the insulation portion may be formed as a film applied to the inner surface of the first through hole.

14. The semiconductor device according to claim 11 , further comprising at least one of a first bonding bump formed on an upper surface of the through electrode and a second bonding bump formed on a lower surface of the through electrode.

15. A semiconductor device wherein:

a plurality of the semiconductor devices according to claim 11 are stacked; and

vertically stacked semiconductor devices among the plurality of the semiconductor devices are connected with each other via the through electrode.

16. A semiconductor device wherein:

a plurality of the semiconductor devices according to claim 14 are stacked; and

the through electrode of vertically stacked semiconductor devices among the plurality of the semiconductor devices are connected with each other via the bonding bump.