Sputtering target for producing metallic glass membrane and manufacturing method thereof
View Patent ↗A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50 μm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.
1. A method of manufacturing a sputtering target for producing a metallic glass membrane, comprising the steps of sintering atomized powder having an average grain size of 50 μm or less and having a metallic glass composition of a ternary or more alloy system with one or more metal elements selected from a group consisting of Pd, Zr, Fe, Co, Cu and Ni as its main constituent element or elements, the main constituent element or elements including a main component that is a component of greatest atomic % of the composition and the ternary or more alloy system being selected from the group consisting of Zr—Al—Ni—Cu, Pd—Cu—Si, Cu—Zr—Ti, Co—Al—B, Fe—Zr—B, Pd—Cu—Si, Ni—Nb—Zr, and Ni—Ta—Zr, said sintering step being conducted at a temperature between a glass transition point temperature and a crystallization temperature of the composition, and producing a sputtering target from the sintered body of atomized powder such that the sputtering target has an amorphous structure characterized by containing dispersed crystallites having an average size as measured by XRD (X-ray diffraction) of 10 Å to 200 Å.
2. A method of manufacturing a sputtering target for producing a metallic glass membrane, comprising the steps of:
producing atomized alloy powder having an average grain size of 50 μm or less and having a metallic glass composition of a ternary or more alloy system, the metallic glass composition including at least one metal element selected from a group consisting of Pd, Zr, Fe, Co, Cu and Ni as its main constituent element or elements, one of which is a main component of greatest atomic % of the composition; and
sintering the atomized alloy powder of the metallic glass composition at a sintering temperature between a glass transition point temperature and a crystallization temperature of the metallic glass composition to produce a sintered body sputtering target of a glass state having an ultra-fine nano-size uniform structure of crystallites with an average size as measured by XRD (X-ray diffraction) of 10 Å to 200 Å (1 to 20 nm);
wherein the alloy system is selected from the group consisting of Zr—Al—Ni—Cu, Pd—Cu—Si, Cu—Zr—Ti, Co—Al—B, Fe—Zr—B, Pd—Cu—Si, Ni—Nb—Zr, and Ni—Ta—Zr.
3. A method according to claim 2 , wherein said atomized alloy powder has an average grain size of 42 μm or less.
4. A method according to claim 2 , wherein said atomized alloy powder has an average grain size of 34 to 42 μm.