Semiconductor device and method of forming protective structure around semiconductor die for localized planarization of insulating layer
View Patent ↗A semiconductor wafer contains a plurality of semiconductor die separated by a saw street. A contact pad is formed over an active surface of the semiconductor die. A protective pattern is formed over the active surface of the semiconductor die between the contact pad and saw street of the semiconductor die. The protective pattern includes a segmented metal layer or plurality of parallel segmented metal layers. An insulating layer is formed over the active surface, contact pad, and protective pattern. A portion of the insulating layer is removed to expose the contact pad. The protective pattern reduces erosion of the insulating layer between the contact pad and saw street of the semiconductor die. The protective pattern can be angled at corners of the semiconductor die or follow a contour of the contact pad. The protective pattern can be formed at corners of the semiconductor die.
1. A method of making a semiconductor device, comprising:
providing a semiconductor wafer with a plurality of semiconductor die separated by a saw street;
forming a contact pad over a surface of each of the semiconductor die;
forming a protective pattern over the surface of the semiconductor die between the contact pad and saw street of the semiconductor die;
forming a first insulating layer over the surface, contact pad, and protective pattern; and
removing a portion of the first insulating layer to expose the contact pad, wherein the protective pattern reduces erosion of the first insulating layer between the contact pad and saw street of the semiconductor die.
2. The method of claim 1 , wherein the protective pattern includes a metal layer.
3. The method of claim 1 , wherein the protective pattern is segmented.
4. The method of claim 1 , further including forming a second insulating layer over the surface of the semiconductor die with an opening to the contact pad.
5. The method of claim 1 , wherein the protective pattern follows a contour of the contact pad.
6. The method of claim 1 , wherein the protective pattern includes a plurality of parallel segments.
7. The method of claim 1 , further including forming the protective pattern at corners of the semiconductor die.
8. A method of making a semiconductor device, comprising:
providing a semiconductor wafer;
forming a conductive layer over a surface of the semiconductor wafer;
forming a protective pattern over the surface of the semiconductor wafer between the conductive layer and an edge of the semiconductor wafer, wherein the protective pattern includes a metal layer; and
forming an insulating layer over the surface of the semiconductor wafer, conductive layer, and protective pattern, wherein the protective pattern maintains the insulating layer between the conductive layer and edge of the semiconductor wafer.
9. The method of claim 8 , wherein the protective pattern is segmented.
10. The method of claim 8 , wherein the protective pattern follows a contour of the conductive layer.
11. The method of claim 8 , wherein the protective pattern includes a plurality of parallel segments.
12. The method of claim 8 , further including forming the protective pattern at corners of the semiconductor wafer.
13. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a conductive layer over a surface of the semiconductor die;
forming a protective pattern over the surface of the semiconductor die separated from the conductive layer; and
forming a first insulating layer in contact with the surface of the semiconductor die, conductive layer, and protective pattern, wherein the protective pattern maintains the first insulating layer adjacent to the conductive layer.
14. The method of claim 13 , further including removing a portion of the first insulating layer to expose a portion of the conductive layer, wherein the protective pattern reduces erosion of the first insulating layer adjacent to the conductive layer.
15. The method of claim 13 , wherein the protective pattern includes a metal layer.
16. The method of claim 13 , wherein the protective pattern is segmented.
17. The method of claim 13 , further including forming an encapsulant over the semiconductor die.
18. The method of claim 13 , further including forming a second insulating layer over the surface of the semiconductor die with an opening to the conductive layer.
19. The method of claim 13 , further including forming the protective pattern at corners of the semiconductor die.
20. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a conductive layer over a surface of the semiconductor die;
forming a protective pattern over the surface of the semiconductor die separated from the conductive layer; and
forming a first insulating layer over the surface of the semiconductor die, conductive layer, and protective pattern, wherein the protective pattern maintains the first insulating layer between the conductive layer and protective pattern.
21. The method of claim 20 , further including removing a portion of the first insulating layer to expose a portion of the conductive layer, wherein the protective pattern reduces erosion of the first insulating layer adjacent to the conductive layer.
22. The method of claim 20 , wherein the protective pattern includes a metal layer.
23. The method of claim 20 , wherein the protective pattern is segmented.
24. The method of claim 20 , further including forming an encapsulant over the semiconductor die.
25. The method of claim 20 , further including forming a second insulating layer over the surface of the semiconductor die with an opening to the conductive layer.
26. The method of claim 20 , further including forming the protective pattern at corners of the semiconductor die.