IP Library Granted Patent US 8,642,958
Granted Patent B2
US 8,642,958 · App. 13/065,237 · Granted Feb 4, 2014

Composite charged particle beam apparatus and sample processing and observing method

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Quick Facts
Patent No.
US 8,642,958
App. No.
13/065,237
Granted
Feb 4, 2014
Kind
B2
Abstract

There is provided a composite charged particle beam apparatus, in which a first rotation axis of a rotatable stage intersects a beam irradiation axis of a FIB column and a beam irradiation axis of an SEM so as to be substantially perpendicular thereto, respectively, at a sample observing position, the rotatable stage is provided with a supporting member which can be rotated with respect to the first rotation axis, and the supporting member is connected to a movement mechanism which can dispose the sample at the sample observing position.

Claims (26)

1. A composite charged particle beam apparatus comprising:

a focused ion beam column;

a scanning electron microscope; and

a rotatable stage,

wherein a beam irradiation axis of the focused ion beam column and a beam irradiation axis of the scanning electron microscope intersect each other so as to be substantially perpendicular to each other,

wherein the rotatable stage is provided with a supporting member having a rotation axis which intersects the beam irradiation axis of the focused ion beam column and the beam irradiation axis of the scanning electron microscope so as to be substantially perpendicular thereto, respectively, at a sample observing position, and

wherein the supporting member is connected to a movement mechanism configured to move the sample relative to the supporting member to the sample observing position.

2. The composite charged particle beam apparatus according to claim 1 , wherein the movement mechanism has three driving axes which are substantially perpendicular to each other, and

wherein one of the driving axes is disposed in a direction which is substantially parallel to the beam irradiation axis of the focused ion beam column by rotation of the supporting member.

3. The composite charged particle beam apparatus according to claim 2 , wherein the movement mechanism includes a sample rotation mechanism having a rotation axis substantially perpendicular to the rotation axis of the rotatable stage.

4. The composite charged particle beam apparatus according to claim 3 , further comprising a tilt stage that is connected to the sample rotation mechanism and configured to tilt a surface of the sample to a disposition where the surface of the sample is substantially perpendicular to the beam irradiation axis of the scanning electron microscope and to a disposition where the surface of the sample is substantially perpendicular to the beam irradiation axis of the focused ion beam column.

5. The composite charged particle beam apparatus according to claim 4 , wherein the tilt stage has a tilt mechanism which tilts the tilt stage inside the apparatus.

6. The composite charged particle beam apparatus according to claim 5 , further comprising a tilt rod connected to the tilt mechanism for rotating the tilt mechanism to tilt the tilt stage.

7. The composite charged particle beam apparatus according to claim 3 , further comprising a tilt stage that is connected to the sample rotation mechanism for tilting a surface of the sample so as to be substantially perpendicular to the beam irradiation axis of the focused ion beam column and the beam irradiation axis of the scanning electron microscope, respectively.

8. The composite charged particle beam apparatus according to claim 7 , wherein the sample rotation mechanism rotates the surface of the sample fixed to the tilt stage so as to be substantially perpendicular to the beam irradiation axis of the focused ion beam column and the beam irradiation axis of the scanning electron microscope, respectively.

9. The composite charged particle beam apparatus according to claim 1 , further comprising a transmitted electron detector which detects transmitted electrons while the scanning electron microscope irradiates the sample with an electron beam.

10. A composite charged particle beam apparatus comprising:

a focused ion beam column;

a scanning electron microscope; and

a rotatable stage,

wherein the rotatable stage is provided with a supporting member having a rotation axis which intersects the beam irradiation axis of the focused ion beam column and the beam irradiation axis of the scanning electron microscope so as to be substantially perpendicular thereto, respectively, at a sample observing position,

wherein the supporting member is connected to a movement mechanism which disposes the sample at the sample observing position,

wherein the movement mechanism includes a sample rotation mechanism having a rotation axis substantially perpendicular to the rotation axis of the rotatable stage,

wherein the sample rotation mechanism is connected to a tilt stage which tilts a surface of the sample so as to be substantially perpendicular to the beam irradiation axis of the scanning electron microscope, and

wherein the tilt stage is connected to a tilt mechanism configured to tilt the tilt stage.

11. The composite charged particle beam apparatus according to claim 10 , further comprising a tilt rod connected to the tilt mechanism for rotating the tilt mechanism to tilt the tilt stage.

Assignments (4)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →
CHANGE OF NAME Recorded Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2011
From: TAKAHASHI, HARUO; HASUDA, MASAKATSU
To: SII NANOTECHNOLOGY INC.
Reel/Frame 026305/0542 →