IP Library Granted Patent US 8,263,953
Granted Patent B2
US 8,263,953 · App. 13/075,500 · Granted Sep 11, 2012

Systems and methods for target material delivery protection in a laser produced plasma EUV light source

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Quick Facts
Patent No.
US 8,263,953
App. No.
13/075,500
Granted
Sep 11, 2012
Kind
B2
Abstract

A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.

Claims (35)

1. A device comprising:

a chamber;

a source providing a stream of target material delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region;

a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the stream;

a system producing a laser beam irradiating target material at the irradiation region to generate a plasma producing EUV radiation; and

a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding the stream from said flow and an opposed open portion.

2. A device as recited in claim 1 wherein said shroud has a partial ring-shaped cross-section in a plane normal to said path.

3. A device as recited in claim 2 wherein said ring has at least one flat surface.

4. A device as recited in claim 1 wherein the shroud is elongated in a direction parallel to said path.

5. A device as recited in claim 1 wherein said shroud comprises a tube formed with at least one hole.

6. A device as recited in claim 1 further comprising a droplet catch tube positioned along said stream between said shroud and said target material release point.

7. A device as recited in claim 6 wherein said path is non-vertical and said droplet catch tube is a shield protecting the reflective optic from target material straying from the non-vertical path.

8. A device comprising:

a chamber;

a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between the irradiation region and a target material release point;

a gas flow in the chamber;

a laser producing a beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation; and

a shroud positioned along a portion of said stream, said shroud partially enveloping said stream in a plane normal to said path to increase droplet positional stability.

9. A device as recited in claim 8 wherein said shroud has a partial ring-shaped cross-section in a plane normal to said path.

10. A device as recited in claim 9 wherein said ring has at least one flat surface.

11. A device as recited in claim 8 wherein the shroud is elongated in a direction parallel to said path.

12. A device as recited in claim 8 wherein said shroud comprises a tube formed with at least one hole.

13. A device as recited in claim 8 further comprising a droplet catch tube positioned along said stream between said shroud and said target material release point.

14. A device as recited in claim 13 wherein said path is non-vertical and said droplet catch tube is a shield protecting the reflective optic from target material straying from the non-vertical path.

15. A method comprising the steps of:

providing a stream of target material droplets delivering target material to an irradiation region in a chamber along a path between a target material release point and the irradiation region;

flowing a gas in a direction toward the droplet stream;

irradiating droplets with a laser beam at the irradiation region to generate a plasma producing EUV radiation; and

positioning a shroud along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.

16. A method as recited in claim 15 wherein said flowing and irradiating steps occur simultaneously.

17. A method as recited in claim 15 wherein said shroud has a partial ring shaped cross section in a plane normal to said path.

18. A method as recited in claim 15 wherein said ring has at least one flat surface.

19. A method as recited in claim 15 wherein the shroud is elongated in a direction parallel to said path.

20. A method as recited in claim 15 further comprising the step of positioning a droplet catch tube along said stream between said shroud and said target material release point.

21. A device as recited in claim 1 wherein at least a portion of said stream is a droplet stream.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032892/0177 →
MERGER Recorded Mar 14, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032445/0022 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2011
From: FOMENKOV, IGOR V.; PARTLO, WILLIAM N.
To: CYMER, INC.
Reel/Frame 026050/0291 →