IP Library Granted Patent US 8,894,835
Granted Patent B2
US 8,894,835 · App. 13/127,507 · Granted Nov 25, 2014

Method of inspecting a metal coating and a method for analytical control of a deposition electrolyte serving to deposit said metal coating

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Quick Facts
Patent No.
US 8,894,835
App. No.
13/127,507
Granted
Nov 25, 2014
Kind
B2
Abstract

For fast and secure determination of the quality of a metal coating as well as of an electrolyte for depositing a metal, in particular for electrolytic deposition of nickel such as of semi-gloss nickel and bright nickel and for analytical control of the deposition electrolyte, a method of inspecting a metal coating is provided, which involves the following method steps: a) depositing the metal coating from a deposition electrolyte onto a working electrode; b) electrolytically dissolving the metal coating through anodic polarization of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode; c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during a dissolution of the metal coating; and d) determining a time-averaged vale of the dissolution potential.

Claims (17)

1. A method of analytically monitoring a deposition electrolyte serving for depositing a metal coating, comprising the steps of:

a) depositing the metal coating from the deposition electrolyte onto a working electrode;

b) electrolytically dissolving the metal coating through anodic polarisation of the working electrode with respect to a counter electrode, which is in electrolytic contact with the working electrode;

c) recording an electrical dissolution potential at the working electrode over time, said potential occurring during dissolution of the metal coating;

d) determining a time-averaged value of the dissolution potential;

e) determining a difference between the time-averaged value of the dissolution potential and a reference value; and

f) allocating said difference to a difference between the concentration of a component of the deposition electrolyte determining the dissolution potential and a reference concentration.

2. The method of analytically monitoring a deposition electrolyte as set forth in claim 1 , wherein the metal coating is a constituent part of a multilayered metal coating system.

3. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein, prior to performing method step b), the method further comprises:

b1) transferring the working electrode provided with the metal coating into an electrolysis cell containing a dissolution electrolyte and comprising the counter electrode.

4. The method of analytically monitoring a deposition electrolyte as set forth in claim 3 , wherein the dissolution electrolyte contains ions of the metal to be deposited as well as at least one acid.

5. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein the electrolytic dissolution of the metal coating takes place under galvanostatic conditions.

6. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein the working electrode is a rotating platinum electrode.

7. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein the metal coating is an electrolytically deposited nickel coating.

8. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein the metal coating is an electrolytically deposited semi-gloss nickel coating or an electrolytically deposited bright nickel coating.

9. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein values of the dissolution potential at the working electrode are determined within an imposed time interval and that the values obtained are averaged in order to determine the time-averaged value of the dissolution potential.

10. The method of analytically monitoring a deposition electrolyte as set forth in any one of the previous claims 1 - 2 , wherein the deposition electrolyte originates from a coating tank and is transferred continuously to the working electrode.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2011
From: HARTMANN, PHILIP; JONAT, MICHAEL; WUENSCHE, MATHIAS
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 026230/0426 →