Semiconductor Device and Method of Forming TIM Within Recesses of MUF Material
A semiconductor device has a semiconductor die mounted to a substrate. The semiconductor die and substrate are disposed within a mold chase with a releasing layer disposed over the semiconductor die. A MUF material is deposited around the semiconductor die, releasing layer, and substrate through an opening in the mold chase. The opening in the mold chase is located in an upper mold support of the mold chase. A recess is formed in the MUF material by removing the releasing layer. A TIM is formed in the recess of the MUF material. The TIM is substantially coplanar with the MUF material. A heat spreader is formed over the TIM material. The heat spreader can be formed within the recess of the MUF material over the TIM. A plurality of bumps is formed over a surface of the substrate opposite the semiconductor die.
1 . A method of making a semiconductor device, comprising:
providing a substrate;
mounting a semiconductor die to the substrate;
disposing a releasing layer over the semiconductor die;
depositing a mold underfill material around the semiconductor die, releasing layer, and substrate;
forming a recess in the mold underfill material by removing the releasing layer;
forming a thermal interface material in the recess of the mold underfill material; and
forming a heat spreader over the thermal interface material.
2 . The method of claim 1 , further including forming a plurality of bumps over a surface of the substrate opposite the semiconductor die.
3 . The method of claim 1 , wherein the thermal interface material is substantially coplanar with the mold underfill material.
4 . The method of claim 1 , further including forming the heat spreader within the recess of the mold underfill material over the thermal interface material.
5 . The method of claim 1 , further including:
providing a mold chase;
disposing the semiconductor die and substrate within the mold chase; and
depositing the mold underfill material through an opening in the mold chase around the semiconductor die, releasing layer, and substrate.
6 . The method of claim 5 , wherein the opening in the mold chase is located in an upper mold support of the mold chase.
7 . A method of making a semiconductor device, comprising:
providing a substrate;
mounting a semiconductor die to the substrate;
depositing an encapsulant around the semiconductor die and substrate while blocking formation of the encapsulant over the semiconductor die to form a recess in the encapsulant over the semiconductor die;
forming a thermal interface material in the recess of the encapsulant; and
forming a heat spreader over the thermal interface material.
8 . The method of claim 7 , further including:
disposing a releasing layer over the semiconductor die prior to depositing the encapsulant; and
removing the releasing layer to form the recess in the encapsulant.
9 . The method of claim 7 , further including:
providing a mold chase;
disposing the semiconductor die and substrate within the mold chase; and
depositing the encapsulant through an opening in the mold chase around the semiconductor die and substrate.
10 . The method of claim 9 , wherein the opening in the mold chase is located in an upper mold support of the mold chase.
11 . The method of claim 7 , further including forming an interconnect structure over a surface of the substrate opposite the semiconductor die.
12 . The method of claim 7 , wherein the thermal interface material is substantially coplanar with the encapsulant.
13 . The method of claim 7 , further including forming the heat spreader within the recess of the encapsulant over the thermal interface material.
14 . A method of making a semiconductor device, comprising:
providing a substrate;
mounting a semiconductor die to the substrate;
depositing an encapsulant around the semiconductor die and substrate;
forming a recess in the encapsulant over the semiconductor die;
forming a thermal interface material in the recess of the encapsulant; and
forming a heat spreader over the thermal interface material.
15 . The method of claim 14 , further including:
disposing a releasing layer over the semiconductor die prior to depositing the encapsulant; and
removing the releasing layer to form the recess in the encapsulant.
16 . The method of claim 14 , further including:
providing a mold chase;
disposing the semiconductor die and substrate within the mold chase; and
depositing the encapsulant through an opening in the mold chase around the semiconductor die and substrate.
17 . The method of claim 16 , wherein the opening in the mold chase is located in an upper mold support of the mold chase.
18 . The method of claim 14 , further including forming an interconnect structure over a surface of the substrate opposite the semiconductor die.
19 . The method of claim 14 , wherein the thermal interface material is substantially coplanar with the encapsulant.
20 . The method of claim 14 , further including forming the heat spreader within the recess of the encapsulant over the thermal interface material.
21 . A semiconductor device, comprising:
a substrate;
a semiconductor die mounted to the substrate;
an encapsulant deposited around the semiconductor die and substrate with a recess formed in the encapsulant over the semiconductor die;
a thermal interface material formed in the recess of the encapsulant; and
a heat spreader formed over the thermal interface material.
22 . The semiconductor device of claim 21 , further including a releasing layer disposed over the semiconductor die.
23 . The semiconductor device of claim 21 , further including an interconnect structure formed over a surface of the substrate opposite the semiconductor die.
24 . The semiconductor device of claim 21 , wherein the thermal interface material is substantially coplanar with the encapsulant.
25 . The semiconductor device of claim 21 , wherein the heat spreader is formed within the recess of the encapsulant over the thermal interface material.