Method of making a circuitized substrate
View Patent ↗A circuitized substrate which includes a conductive paste for providing electrical connections. The paste, in one embodiment, includes a metallic component including nano-particles and may include additional elements such as solder or other metal micro-particles, as well as a conducting polymer and organic. The particles of the paste composition sinter and, depending on what additional elements are added, melt as a result of lamination to thereby form effective contiguous circuit paths through the paste. A method of making such a substrate is also provided, as is an electrical assembly utilizing the substrate and including an electronic component such as a semiconductor chip coupled thereto.
1. A method of making a circuitized substrate, said method comprising:
providing a first electrically conductive layer;
providing at least one organic dielectric layer including first and second opposing surfaces;
providing a second electrically conductive layer and positioning said second electrically conductive layer such that said at least one organic dielectric layer is located substantially between said first and second electrically conductive layers;
forming at least one opening within said at least one organic dielectric layer and extending from said first electrically conductive layer to said second electrically conductive layer; and
positioning a quantity of conductive paste within said at least one opening, said quantity of electrically conductive paste electrically coupling said first and second electrically conductive layers, said quantity of conductive paste including:
a plurality of micro-particles having an average size of from about one micron to about fifty microns of at least one metallic component selected from the group: copper, silver, gold, silver-coated copper, gold-coated copper, and alloys thereof;
a plurality of nano-particles having an average size of from about 0.01 microns to about one micron of said at least one metallic component selected from the group: copper, silver, gold, silver-coated copper, gold-coated copper, and alloys thereof; and
a plurality of micro-particles particles having an average size of from about one micron to about fifty microns of at least one low melting point metallurgy selected from the group: tin-lead, bismuth-tin, bismuth-tin-iron, tin, tin-silver, tin-gold, tin-silver-zinc, tin-silver-zinc-copper, tin-bismuth-silver, tin-copper, tin-copper-silver, tin-indium-silver, tin-antimony, tin-zinc, tin-zinc-indium, copper-based solders, and alloys thereof.
2. The method of claim 1 wherein said forming of said at least one opening within, said at least one organic dielectric layer is accomplished using laser or mechanical drilling.
3. The method of claim 1 wherein said positioning of said conductive paste within said at least one opening is accomplished using printing or needle dispensing.
4. The method of claim 1 wherein said providing of said first and second electrically conductive layers is accomplished using photolithographic processing.
5. The method of claim 1 further including heating said circuitized substrate to a temperature sufficiently high enough to cause sintering of said plurality of micro-particles of at least one metallic component and said nano-particles of at least one metallic component.
6. The method of claim 5 wherein said heating of said circuitized substrate is also sufficiently high enough to cause melting of micro-particles having an average size of from about one micron to about fifty microns of at least one low melting point metallurgy during or after said sintering of said plurality of nano-particles of said at least one metallic component and said micro-particles of said at least one metallic component.
7. The method of claim 6 wherein said heating of said circuitized substrate is accomplished by laminating said circuitized substrate.
8. The method of claim 1 further including positioning an electronic component on said circuitized substrate and electrically coupling said electronic component to said circuitized substrate to form an electrical assembly.
9. The method of claim 1 wherein said nano-particles of said at least one metallic component have been deposited directly and uniformly from solution onto the surface of said micro-particles of said at least one metallic component.