Selective word line erase in 3D non-volatile memory
View Patent ↗An erase process for a 3D stacked memory device allows a portion of a block of memory cells to be erased. In one approach, in a U-shaped NAND string configuration, memory cells in the drain- or source-side columns are erased. In another approach, such as in a U-shaped or a straight NAND string configuration, memory cells in a portion of a column of memory cells are erased, and a dummy memory cell is provided between the erased and non-erased memory cells. A dummy memory cell can be on either side (e.g., above and below) of an erase memory cell, or on either side of a non-erased memory cell. A dummy memory cell is ineligible to store user data, but prevents a downshift in the threshold voltage of an erased memory cell from changing the threshold voltage of a non-erased memory cell, due to capacitive coupling.
1. A 3D stacked non-volatile memory device, comprising:
a substrate;
a stacked non-volatile memory cell array carried by the substrate, the stacked non-volatile memory cell array comprising: (a) a plurality of U-shaped NAND strings, each U-shaped NAND string comprising, connected by a back gate, a selected column of memory cells and an unselected column of memory cells, (b) word line layers alternating with dielectric layers, each word line layer comprising a selected word line layer portion in communication with memory cells in the selected columns of memory cells, but not with memory cells in the unselected columns of memory cells, and an unselected word line layer portion in communication with the memory cells in the unselected columns of memory cells, but not with the memory cells in the selected columns of memory cells, (c) select gates for the selected columns and (d) select gates for the unselected columns; and
circuitry in communication with the stacked non-volatile memory cell array, the circuitry provides a voltage to the selected word line layer portions, a voltage to an end of each selected column of memory cells and a voltage to each of the select gates for the selected columns to perform an erase operation which erases at least one memory cell in each selected column of memory cells, and provides a voltage to the unselected word line layer portions and a voltage to an end of each unselected column of memory cells and a voltage to each of the select gates for the unselected columns to not erase any memory cells in each unselected column of memory cells during the erase operation, the voltage applied to the select gates for the selected columns and the voltage applied to the end of each selected column place the select gates for the selected columns in a conductive state, and the voltage applied to the select gates for the unselected columns and the voltage applied to the end of each unselected column place the select gates for the unselected columns in a non-conductive state.
2. The 3D stacked non-volatile memory device of claim 1 , wherein:
the stacked non-volatile memory cell array comprises at least one block which is selected in the erase operation and at least one block which is unselected in the erase operation, the plurality of U-shaped NAND strings are arranged in the at least one block which is selected in the erase operation, the at least one block which is selected in the erase operation comprises sub-block, each sub-block comprising a row of the U-shaped NAND strings.
3. The 3D stacked non-volatile memory device of claim 1 , wherein:
the at least one memory cell which is erased comprises each memory cell in each selected column of memory cells.
4. The 3D stacked non-volatile memory device of claim 1 , wherein, in each selected column of memory cells:
a dummy memory cell which is ineligible to store user data is between the at least one memory cell which is erased and at least one memory cell which is not erased and which is eligible to store user data.
5. The 3D stacked non-volatile memory device of claim 1 , wherein, in each selected column of memory cells:
the at least one memory cell which is erased comprises at least one memory cell which is eligible to store user data and which is above a dummy memory cell, and at least one memory cell which is eligible to store user data and which is below another dummy memory cell, the dummy memory cells are ineligible to store user data.
6. The 3D stacked non-volatile memory device of claim 1 , wherein, in each selected column of memory cells:
at least one memory cell which is not erased during the erase operation is above the at least one memory cell which is erased;
at least one memory cell which is not erased during the erase operation is below the at least one memory cell which is erased;
a dummy memory cell which is ineligible to store user data is between: (v) the at least one memory cell which is not erased during the erase operation and which is above the at least one memory cell which is erased and (vi) the at least one memory cell which is erased; and
a dummy memory cell which is ineligible to store user data is between: (vii) the at least one memory cell which is not erased during the erase operation and which is below the at least one memory cell which is erased and (viii) the at least one memory cell which is erased.
7. The 3D stacked non-volatile memory device of claim 1 , wherein, for each U-shaped NAND string:
the selected column of memory cells is at a drain side of the U-shaped NAND string; and
the unselected column of memory cells is at a source side of the U-shaped NAND string.
8. The 3D stacked non-volatile memory device of claim 1 , wherein, for each U-shaped NAND string:
the unselected column of memory cells is at a drain side of the U-shaped NAND string; and
the selected column of memory cells is at a source side of the U-shaped NAND string.
9. The 3D stacked non-volatile memory device of claim 1 , wherein:
the voltage applied to the select gates for the selected columns and the voltage applied to the end of each selected column allow the select gates for the selected columns to generate a gate-induced drain leakage (GIDL) current in each selected column; and
the voltage applied to the select gates for the unselected columns and the voltage applied to the end of each unselected column prevent the select gates for the unselected columns from generating a gate-induced drain leakage (GIDL) current in each unselected column.
10. The 3D stacked non-volatile memory device of claim 1 , wherein:
the voltage applied to the select gates for the selected columns is a positive voltage; and
the voltage applied to the select gates for the unselected columns is ground voltage.
11. The 3D stacked non-volatile memory device of claim 1 , wherein:
the stacked non-volatile memory cell array is a three-dimensional memory cell array.
12. The 3D stacked non-volatile memory device of claim 1 , wherein:
the selected and unselected columns of memory cells are formed above the substrate in one or more physical levels of memory cells in a three-dimensional non-volatile memory.
13. The 3D stacked non-volatile memory device of claim 1 , wherein:
the selected and unselected columns of memory cells comprise active areas which are formed above the substrate in one or more physical levels of memory cells in a three-dimensional non-volatile memory, the active areas comprise channels of the selected and unselected columns of memory cells.
14. The method of claim 1 , wherein:
the circuitry is within the substrate.
15. The method of claim 1 , wherein:
the circuitry is above the substrate.