IP Library Granted Patent US 8,422,286
Granted Patent B2
US 8,422,286 · App. 13/437,908 · Granted Apr 16, 2013

Low-crystallization temperature MTJ for spin-transfer torque magnetic random access memory (STTMRAM)

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Quick Facts
Patent No.
US 8,422,286
App. No.
13/437,908
Granted
Apr 16, 2013
Kind
B2
Abstract

A spin-torque transfer memory random access memory (STTMRAM) element is disclosed and has a fixed layer, a barrier layer formed upon the fixed layer, and a free layer comprised of a low-crystallization temperature alloy of CoFeB—Z where Z is below 25 atomic percent of one or more of titanium, (Ti), yittrium (Y), zirconium (Zr), and vanadium (V), wherein during a write operation, a bidirectional electric current is applied across the STTMRAM element to switch the magnetization of the free layer between parallel and anti-parallel states relative to the magnetization of the fixed layer.

Claims (31)

1. A spin-torque transfer memory random access memory (STTMRAM) element, employed in a STTMRAM array, where the STTMRAM element received electric current for storage of digital information, the STTMRAM element comprising:

a magnetic tunnel junction (MTJ) including,

an anti-ferromagnetic (AF) layer;

a fixed layer having a magnetization that is substantially fixed in one direction and that comprises a first magnetic layer, an AF coupling layer and a second magnetic layer;

a barrier layer formed upon the fixed layer;

a free layer comprised of a low-crystallization temperature magnetization layer made of an alloy of CoFeB—Z where Z is made of one or more of titanium, (Ti), yittrium (Y), zirconium (Zr), and vanadium (V), the free layer having a magnetization that is switchable;

wherein during a write operation, a bidirectional electric current is applied across the STTMRAM element to switch the magnetization of the free layer between parallel and anti-parallel states relative to the magnetization of the fixed layer.

2. The STTMRAM element, as recited in claim 1 , further including a cap layer formed on top of the free layer of the MTJ.

3. The STTMRAM element, as recited in claim 2 , further including an underlayer on top of which is formed the an anti-ferromagnetic (AF) coupling layer.

4. The STTMRAM element, as recited in claim 3 , wherein the underlayer is made of tantalum (Ta).

5. The STTMRAM element, as recited in claim 3 , wherein the AF coupling layer is made of platinum manganese (PtMn), iridium manganese (IrMn), nickel manganese (NiMn) or iron manganese (FeMn).

6. The STTMRAM element, as recited in claim 1 , wherein the first and second magnetic layers of the fixed layer each have ferromagnetic characteristic and an anti-parallel magnetization orientation relative to each other.

7. The STTMRAM element, as recited in claim 1 , wherein the first and second magnetic layers of the fixed layer are each ferromagnetic and separated from each other by ruthenium (Ru).

8. The STTMRAM element, as recited in claim 1 , wherein the free layer further includes a third magnetic layer formed between the low-crystallization temperature magnetization layer and the barrier layer.

9. The STTMRAM element, as recited in claim 8 , wherein the third magnetic layer is made of the alloy cobolt iron boron (CoFeB) and the low-crystallization temperature magnetization layer is made of titanium (Ti).

10. The STTMRAM element, as recited in claim 8 , wherein the third magnetic layer and the low-crystallization temperature magnetization layer are made of the Co30Fe40B20Ti10.

11. The STTMRAM element, as recited in claim 8 , wherein the low-crystallization temperature magnetization layer is made of Ti, Zr, V or Y.

12. The STTMRAM element, as recited in claim 8 , wherein the fixed layer is synthetic.

13. The STTMRAM element, as recited in claim 12 , wherein the fixed layer is made of cobolt iron/ruthenium/cobolt iron boron (CoFe/Ru/CoFeB) alloy.

14. The STTMRAM element, as recited in claim 1 , wherein the barrier layer is made of one or more of the materials: magnesium oxide, ruthenium oxide, strontium oxide, zinc oxide, aluminum oxide, and titanium oxide.

15. A system including a spin-torque transfer memory random access memory (STTMRAM) element, the STTMRAM element employed in a STTMRAM array, where the STTMRAM element received electric current for storage of digital information, the STTMRAM element comprising:

a magnetic tunnel junction (MTJ) including,

an anti-ferromagnetic (AF) layer;

a fixed layer having a magnetization that is substantially fixed in one direction and that comprises a first magnetic layer, an AF coupling layer and a second magnetic layer;

a barrier layer formed upon the fixed layer;

a free layer comprised of a low-crystallization temperature magnetization layer made of an alloy of CoFeB—Z where Z is made of one or more of titanium, (Ti), yittrium (Y), zirconium (Zr), and vanadium (V), the free layer having a magnetization that is switchable;

wherein during a write operation, a bidirectional electric current is applied across the STTMRAM element to switch the magnetization of the free layer between parallel and anti-parallel states relative to the magnetization of the fixed layer.

16. The system, as recited in claim 15 , wherein the system is a hand-held consumer device.

17. The system, as recited in claim 15 , wherein the system is a laptop.

18. The system, as recited in claim 15 , wherein the system is a set-top-box.

19. The system, as recited in claim 15 , wherein the system is a microprocessor.

Assignments (6)
SECURITY INTEREST Recorded Mar 18, 2022
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 059436/0203 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057213/0050 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057217/0674 →
SECURITY INTEREST Recorded Jul 8, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: SILICON VALLEY BANK
Reel/Frame 053156/0223 →
SECURITY INTEREST Recorded Feb 13, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 051930/0396 →
SECURITY INTEREST Recorded Apr 18, 2017
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 042273/0813 →