IP Library Granted Patent US 9,504,161
Granted Patent B2
US 9,504,161 · App. 13/884,711 · Granted Nov 22, 2016

Solution and process for the pre-treatment of copper surfaces using an N-alkoxylated adhesion-promoting compound

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Quick Facts
Patent No.
US 9,504,161
App. No.
13/884,711
Granted
Nov 22, 2016
Kind
B2
Abstract

The invention concerns a solution for pretreating copper surfaces, and a method for pre-treating copper surfaces allowing the formation of a tight bond to plastic substrates. The solution comprises: a) hydrogen peroxide, b) at least one acid, and c) at least one nitrogen-containing, five-membered, heterocyclic compound, and d) additionally at least one nitrogen containing, adhesion-promoting compound, said compound comprising, or consisting of, lactams, non-quaternary fatty amines, amides and polyamides, connected at one or more of its nitrogen atoms with at least one residue of formula (I).

Claims (52)

1. A solution, comprising:

a) hydrogen peroxide;

b) an acid;

c) a nitrogen-containing, five-membered, heterocyclic compound; and

d) a lactam or a polyamide, which is connected at one or more of its nitrogen atoms with at least one residue of formula (I):

wherein:

n is an integer from 1 to 100;

R 1 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

R 2 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms; and

each R 1 and R 2 in a —(CHR 1 —CHR 2 —O)— moiety is selected independently of each R 1 and R 2 in another —(CHR 1 —CHR 2 —O)— moiety;

with the proviso that the compound of c) is not connected at any of its nitrogen atoms with a residue of formula (I).

2. The solution of claim 1 , wherein the compound of d) is a lactam of formula (II);

wherein:

n is an integer from 1 to 100;

R 1 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

R 2 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

each R 1 and R 2 in a —(CHR 1 —CHR 2 —O)— moiety is selected independently of each R 1 and R 2 in another —(CHR 1 —CHR 2 —O)— moiety; and

R 3 is a hydrocarbon residue with 1 to 20 carbon atoms.

3. The solution of claim 1 , wherein the compound of d) is a polyamide of formula (III):

wherein:

n is an integer from 1 to 100;

R 1 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

R 2 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

each R 1 and R 2 in a —(CHR 1 —CHR 2 —O)— moiety is selected independently of each R 1 and R 2 in another —(CHR 1 —CHR 2 —O)— moiety;

R 3 is a hydrocarbon residue with 1 to 20 carbon atoms, each R 3 in a —(N—R 3 —CO)— moiety is selected independently of each R 3 in another —(N—R 3 —CO)— moiety; and

each n in a —(CHR 1 —CHR 2 —O) n — moiety or chain is selected independently of each n in another —(CHR 1 —CHR 2 —O) n — moiety or chain.

4. The solution of claim 2 , wherein R 3 is an alkylene residue with the formula —(CH 2 ) y —, and wherein y is an integer from 2 to 12.

5. The solution of claim 1 , wherein the solution comprises a sulphur, selenium or tellurium-containing adhesion-promoting compound, said compound being a sulphinic acid, selenic acid, telluric acid, heterocyclic compound that comprises at least one sulphur, selenium and/or tellurium atom in the heterocycle, sulphonium salt, selenonium salt or telluronium salt, wherein the sulphonium salt, selenonium salt or telluronium salt has a general formula (VIII);

wherein:

A is S, Se or Te;

R 9 , R 10 and R 11 are independently alkyl, substituted alkyl, alkenyl, phenyl, substituted phenyl, benzyl, cycloalkyl, or substituted cycloalkyl; and

Z − is an anion of an inorganic or organic acid or hydroxide;

with the proviso that the acid of b) is not identical to the sulphinic, selenic or telluric acids selected for the sulphur, selenium or tellurium containing adhesion-promoting compound, and that the compound of c) contains no sulphur atom, selenium atom or tellurium atom in the heterocycle.

6. A method for pre-treating a copper surface for the subsequent formation of a firmly adhesive bond between the copper surface and a plastic material substrate, the method comprising contacting the copper surface with a solution comprising:

a) hydrogen peroxide;

b) an acid;

c) a nitrogen-containing, five-membered, heterocyclic compound; and

d) a lactam or a polyamide, which is connected at one or more of its nitrogen atoms with at least one residue of formula (I)

wherein

n is an integer from 1 to 100;

R 1 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

R 2 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms; and

each R 1 and R 2 in a —(CHR 1 —CHR 2 —O)— moiety is selected independently of each R 1 and R 2 in another —(CHR 1 —CHR 2 —O)— moiety;

with the proviso that the compound of c) is not connected at any of its nitrogen atoms with a residue of formula (I).

7. The method of claim 6 , wherein the copper surface is brought into contact with the solution.

8. A method of pre-treating a printed circuit board inner layer which has a copper layer, the method comprising contacting the printed circuit inner layer or a synthetic resin layer with the solution of claim 1 , and forming a firmly adhesive bond between the printed circuit inner layer and the synthetic resin layer.

9. The method of claim 8 , wherein the solution comprises a lactam or a polyamide, which is connected at one or more of its nitrogen atoms with at least one residue of formula (I):

wherein:

n is an integer from 1 to 100;

R 1 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms;

R 2 is hydrogen or a hydrocarbon residue with 1 to 6 carbon atoms; and

each R 1 and R 2 in a —(CHR 1 —CHR 2 —O)— moiety is selected independently of each R 1 and R 2 in another —(CHR 1 —CHR 2 —O)— moiety.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2013
From: SPARING, CHRISTIAN; HUELSMANN, THOMAS; CLICQUE, ARNO; BROOKS, PATRICK; ZEE, ADRIAN; BRUNNER, HEIKO
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 031778/0496 →