Magnetic tunnel junction with non-metallic layer adjacent to free layer

1. A spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack made of layers to which when electric current is applied cause switching of the direction of magnetization of at least one of the layer comprising:

a reference layer (RL) with a direction of magnetization that is fixed upon manufacturing of the STTMRAM MTJ stack;

a junction layer (JL) formed on top of the RL;

a free layer (FL) formed on top of the JL, the FL having a direction of magnetization that is switchable relative to that of the RL upon the flow of electric current through the spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack;

a spin confinement layer (SCL) formed on top of the FL, the SCL made of conductive dielectric layer with a thickness of 0.6 nano meters (nm) to 5 nm.

2. The STTMRAM MTJ stack of claim 1 , wherein the RL comprises a stack of anti-ferromagnetic layer, magnetic pinned layer, exchange coupling layer and magnetic reference layer.

3. The STTMRAM MTJ stack of claim 1 , wherein further including a second free layer 2 on top of the SCL layer.

4. The STTMRAM MTJ stack of claim 1 , wherein the RL comprises a stack of magnetic pinned layer, exchange coupling layer and magnetic reference layer.

5. The STTMRAM MTJ stack of claim 1 , wherein further including a magnetic pinned layer formed on top of the SCL layer.

6. The STTMRAM MTJ stack of claim 1 , wherein the SCL comprises oxide doped with metallic elements.

7. The STTMRAM MTJ stack of claim 1 , wherein the SCL is made by co-sputtering Mg and Ru with subsequent oxygen where the atomic ratio of Ru/Mg is less than 50%.

8. The STTMRAM MTJ stack of claim 1 , further including a bottom electrode (BL) on top of which is formed the RL.

9. The STTMRAM MTJ stack of claim 1 , further including a top electrode (TL) formed as the top capping layer of the stack.

10. The STTMRAM MTJ stack of claim 1 , wherein all the magnetic layers within the stack is made of a material comprising any of: cobolt (Co), iron (Fe), nickel (N), in combination with any of boron (B), tantalum (Ta), titanium (Ti), nitride (Ni), platinum (Pt), palladium (Pd), chromium (Cr), copper (Cu), magnesium (Mg), oxide (O), hafnium (Hf), manganese (Mn), zirconium (Zr), iridium (Ir), or silicon (Si).

11. The STTMRAM MTJ stack of claim 1 , wherein the FL is multi-layered with a structure that comprises more than one layer that are interlaced.

12. The STTMRAM MTJ stack of claim 1 , wherein the FL is made of magnetic and non-magnetic layers with at least one of the magnetic layers of the FL comprises: Co, Fe, or Ni, in combination with any of B, Ta, Ti, Pt, Pd, Cr, Cu, Mg, O, Hf, N, Mn, Zr, Ir, or Si.

13. The STTMRAM MTJ stack of claim 6 , wherein at least one of the non-magnetic layers of the FL comprises: Pt, Pd, Ru, Ta, Ti, Cr, Cu, Mg, Hf, Cr, Mn, Zr, Ir, Si, C, or Ru; or an oxide made of any of the following materials: Mg, Al, Zn, Ta, Ti, Cu, Cr, or Ru.

14. The STTMRAM MTJ stack of claim 1 , wherein the JL is an oxide layer comprising: Mg, Al, Zn, Ta, Ti, Cu, Cr.

15. The STTMRAM MTJ stack of claim 1 , wherein the JL is a metal layer and comprises: Cu, Au, or silver (Ag).

16. The STTMRAM MTJ stack of claim 1 , wherein the JL is formed of metal pillars in an oxide matrix.

17. The STTMRAM MTJ stack of claim 1 , wherein the SCL is composed of conductive oxide layer with the oxide being any one of or a mixture of, without limitation, the following materials: Zn, Ru, Ti, Ir, V, Cr, Molybdenum (Mo), Lithium-Molybdenum (LiMn), Tin (Sn), Fe or Co.

18. The STTMRAM MTJ stack of claim 1 , wherein the SCL is composed of conductive nitride layer with the nitride made of the following material, without limitation: Ta, Ti, W, Cu, Nb, Zr, Cr, or V.

19. The STTMRAM MTJ stack of claim 1 , wherein the SCL is composed of conductive carbide layer with the carbide made of the following material, without limitation: Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, or Tungsten (W).

20. The STTMRAM MTJ stack of claim 6 , wherein the oxide in the doped oxide layer can be an oxide of any one of or a mixture of, the following materials, without limitation: Mg, Al, Zn, Ta, Ti, Cu, Cr, Zn, Ru, Ti, Ir, V, Cr, Mo, Li, Mn, Sn, Fe, or Co.

21. The STTMRAM MTJ stack of claim 6 , wherein the dopant is a mixture comprising: Mg, Ru, Fe, Li, Al, B, F, Cu, Co, Ni, Si, P, S, K, Sc, Ti, Cu or Rb.

22. The STTMRAM MTJ stack of claim 1 , wherein further including an integer number of repeat of alternating additional magnetic free layers and additional SCL layer on top of the SCL layer.

23. A spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack made of layers to which when electric current is applied cause switching of the direction of magnetization of at least one of the layer comprising:

a reference layer (RL) with a direction of magnetization that is fixed upon manufacturing of the STTMRAM MTJ stack;

a junction layer (JL) formed on top of the RL;

a free layer (FL) formed on top of the JL, the FL having a direction of magnetization that is switchable relative to that of the RL upon the flow of electric current through the spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack;

a spin confinement layer (SCL) formed on top of the FL, the SCL being a nitride layer with the thickness of the SCL being 0.6 nano meters (nm)-5 nm.

24. The STTMRAM MTJ stack of claim 23 , wherein the SCL comprises nitride composed of any of the following material, without limitation: Co, Fe, Ni, Mg, Al, Ta, Ti, Pt, Pd, Ru, Cu, Hf, Mn, Ir, Si, or C.

25. A spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack made of layers to which when electric current is applied cause switching of the direction of magnetization of at least one of the layer comprising:

a reference layer (RL) with a direction of magnetization that is fixed upon manufacturing of the STTMRAM MTJ stack;

a junction layer (JL) formed on top of the RL;

a free layer (FL) formed on top of the JL, the FL having a direction of magnetization that is switchable relative to that of the RL upon the flow of electric current through the spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack;

a spin confinement layer (SCL) formed on top of the FL, the SCL being a carbide layer with the thickness of the SCL being 0.6 nano meters (nm)-5 nm.

26. The STTMRAM MTJ stack of claim 25 , wherein the SCL is a carbide composed of any of the following material, without limitation: Co, Fe, Ni, Mg, Al, Pt, Pd, Ru, Cu, Mn, Ir, or Si.

27. A spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack made of layers to which when electric current is applied cause switching of the direction of magnetization of at least one of the layer comprising:

a reference layer (RL) with a direction of magnetization that is fixed upon manufacturing of the STTMRAM MTJ stack;

a junction layer (JL) formed on top of the RL;

a free layer (FL) formed on top of the JL, the FL having a direction of magnetization that is switchable relative to that of the RL upon the flow of electric current through the spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack;

a spin confinement layer (SCL) formed on top of the FL, the SCL being a layer made of non-metallic conductive layer composed of at least one metal element and at least one non-metal element with the thickness of the SCL being 0.6 nano meters (nm)-5 nm.

28. The STTMRAM MTJ stack of claim 27 , wherein the SCL is made of manganese arsenide (MnAs).

29. The STTMRAM MTJ stack of claim 27 , wherein the SCL comprises:

metal atoms implanted in non-metallic insulating layer by plasma;

metal mixture with an oxide layer by co-sputtering from a metal target and an non-metallic insulating layer target; and

metal and oxide deposited in super-lattice structure with interlacing sub-nanometer thickness metal layer and sub-nanometer non-metallic insulating layer, wherein the metal layer can be any one or an alloy of the following, without limitation: Mg, Al, Zn, Ta, Ti, Cu, Cr, Ag, Au, Cu, Fe, Co, Pt, Cr, Zr, Hf, Ir, Zn, V, Mo, Li, or Ru and the non-metallic insulating layer is an oxide/nitride/carbide, which can be made of oxide/nitride/carbide of any of the following material without limitation: to, Co, Fe, Ni, Mg, Al, Ta, Ti, Pt, Pd, Ru, Cr, Cu, Hf, Mn, Zr, Ir, or Si.

30. A spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack made of layers to which when electric current is applied cause switching of the direction of magnetization of at least one of the layer comprising:

a reference layer (RL) with a direction of magnetization that is fixed upon manufacturing of the STTMRAM MTJ stack;

a junction layer (JL) formed on top of the RL;

a free layer (FL) formed on top of the JL, the FL having a direction of magnetization that is switchable relative to that of the RL upon the flow of electric current through the spin transfer torque magnetic random access memory (STTMRAM) magnetic tunnel junction (MTJ) stack;

a spin confinement layer (SCL) formed on top of the FL, the SCL being a layer made of composed of metallic atom or crystals dispersed in non-metallic insulating layer with the thickness of the SCL being 0.6 nano meters (nm)-5 nm.