Triple patterning NAND flash memory with SOC

1. A method of forming a hard mask layer comprising:

forming a plurality of portions of material that have a lateral dimension D which is defined by a photolithographic process and which are separated by spaces having a lateral dimension equal to D;

subsequently forming sidewall spacers along sides of the plurality of portions of material, gaps between neighboring sidewall spacers having a lateral dimension approximately equal to D/3;

subsequently removing the plurality of portions of material to leave the sidewall spacers;

subsequently transferring a pattern formed by the sidewall spacers to form a plurality of patterned portions of a transfer material;

subsequently depositing a hard mask material on the plurality of patterned portions of transfer material;

subsequently etching back the hard mask material to leave first hard mask portions filling gaps between patterned portions of transfer material and second hard mask portions that extend along patterned portions of transfer material on one side and are exposed on another side; and

subsequently removing the plurality of patterned portions of transfer material.

2. The method of claim 1 wherein the material is photoresist and the transfer material is Spin-On Carbon (SOC).

3. The method of claim 2 wherein the plurality of portions of SOC are removed by dry etching.

4. The method of claim 1 wherein the sidewall spacers are formed of Silicon Dioxide that is deposited at a low temperature.

5. The method of claim 1 wherein the hard mask material is silicon dioxide.

6. The method of claim 1 wherein both the first and second hard mask portions have lateral dimensions of approximately D/3 and spacing of approximately D/3.

7. The method of claim 1 wherein the plurality of patterned portions of the first material are formed having a lateral dimension determined by photolithography and wherein the portions of the hard mask material have a lateral dimension that is approximately one third of the lateral dimension determined by photolithography.

8. A method of forming an integrated circuit comprising:

forming a plurality of patterned portions of a first material;

subsequently forming sidewall spacers along sidewalls of the plurality of patterned portions of the first material;

subsequently removing the plurality of patterned portions of the first material;

subsequently transferring a pattern formed by the sidewall spacers to form a plurality of patterned portions of a transfer material;

subsequently forming a layer of hard mask material overlying the plurality of patterned portions of transfer material;

subsequently etching back the layer of hard mask material to leave portions of the hard mask material between patterned portions of transfer material including first portions of the hard mask material that are in contact with patterned portions of transfer material on both sides and second portions of the hard mask material that are in contact with patterned portions of transfer material on only one side;

subsequently removing the patterned portions of transfer material; and

subsequently using the portions of the hard mask material to pattern one or more layers on a substrate.

9. The method of claim 8 wherein the first material is photoresist.

10. The method of claim 9 wherein the sidewall spacers are formed of Silicon Dioxide that is deposited at a low temperature.

11. The method of claim 9 wherein the hard mask material is silicon dioxide.

12. A method of forming an integrated circuit comprising:

forming a plurality of patterned portions of photoresist;

subsequently forming sidewall spacers along sidewalls of the plurality of patterned portions of photoresist;

subsequently removing the plurality of patterned portions of photoresist;

subsequently transferring a pattern formed by the sidewall spacers to form a plurality of patterned portions of a transfer material;

subsequently forming a layer of hard mask material overlying the patterned portions of the transfer material;

subsequently etching back the layer of hard mask material to leave hard mask portions between the patterned portions of the transfer material, the hard mask portions including first hard mask portions that are in contact with portions of transfer material on both sides and second hard mask portions that are in contact with portions of transfer material on only one side;

subsequently removing patterned portions of the transfer material; and

subsequently using the hard mask portions to pattern one or more layers on a substrate.

13. The method of claim 12 wherein the plurality of patterned portions of photoresist have a lateral dimension of approximately D and are spaced apart a distance approximately equal to D, and the hard mask portions have a lateral dimension approximately equal to D/3 and are spaced apart a distance approximately equal to D/3.

14. The method of claim 12 wherein the sidewall spacers are formed of Silicon Dioxide.

15. The method of claim 12 wherein the transfer material is Spin On Carbon (SOC).