Microstructure including microstructural waveguide elements and/or IC chips that are mechanically interconnected to each other
View Patent ↗Structures and methods for interconnects and associated alignment and assembly mechanisms for and between chips, components, and 3D systems.
1. A three-dimensional microstructure, comprising:
a first microstructural coaxial waveguide element comprising one or more layers of material, the first microstructural waveguide element comprising an outer conductor, a center conductor, and a plurality of non-conductive supports configured to support the center conductor within the outer conductor and comprising a mating end at which the center conductor extends beyond the length of the outer conductor, wherein one or more of the outer conductor, center conductor, and non-conductive supports comprises a plurality of the layers of material; and
a second microstructural coaxial waveguide element comprising one or more layers of material, the second microstructural coaxial waveguide element comprising an outer conductor, a center conductor and comprising a mating end complementary to the mating end of the first microstructural coaxial waveguide element and configured to receive the mating end of the first microstructural coaxial waveguide element and configured to electrically couple the respective center conductors of the first and second microstructural coaxial waveguide elements and configured to electrically couple the respective outer conductors of the first and second microstructural coaxial waveguide elements, wherein one or more of the outer conductor, center conductor, and non-conductive supports of the second microstructural coaxial waveguide element comprises a plurality of the layers of material.
2. The three-dimensional microstructure according to claim 1 , wherein the mating ends of the center conductors of the first and second coaxial waveguide elements are configured to deflect with a cantilever motion upon contact therebetween.
3. The three-dimensional microstructure according to claim 1 , wherein the mating end of the second microstructural coaxial waveguide element comprises an annular shape for receiving the center conductor of the first microstructural coaxial waveguide element complementarily.
4. The three-dimensional microstructure according to claim 1 , wherein the second microstructural coaxial waveguide element comprises a plurality of non-conductive supports configured to support the center conductor of the second microstructural coaxial waveguide element within the outer conductor of the second microstructural coaxial waveguide element.
5. A three-dimensional microstructure, comprising:
A first microstructural coaxial waveguide element comprising one or more layers of material, the first microstructural coaxial waveguide element comprising an outer conductor, a center conductor, and a plurality of non-conductive supports configured to support the center conductor within the outer conductor and comprising a mating end at which the center conductor extends beyond the length of the outer conductor, wherein one or more of the outer conductor, center conductor, and non-conductive supports comprises a plurality of the layers of material; and;
a second microstructural coaxial waveguide element comprising one or more layers of material, the second microstructural coaxial waveguide element comprising an outer conductor, a center conductor, and comprising a mating end configured to receive the mating end of the first microstructural coaxial waveguide element and configured to electrically couple the respective center conductors of the first and second microstructural coaxial elements and configured to electrically couple the respective outer conductors of the first and second microstructural coaxial waveguide elements, wherein one or more of the outer conductor, the center conductor, and non-conductive supports of the second microstructural coaxial waveguide element comprises a plurality of the layers of material;
wherein the mating ends of the first and second microstructural coaxial waveguide elements are configured to permit the first and second microstructural coaxial waveguide elements to be orthogonally connected.
6. A method of forming a three-dimensional microstructure by a sequential build process, comprising:
depositing a plurality of layers over a substrate having a planar region, wherein the plurality of layers comprise one or more of a metal material, and a dielectric material, thereby forming a structure above the substrate, comprising
a first microstructural coaxial waveguide element, the first microstructural coaxial waveguide element comprising an outer conductor, a center conductor, and a plurality of non-conductive supports configured to support the center conductor within the outer conductor and comprising a mating end at which the center conductor extends beyond the length of the outer conductor;
a second microstructural coaxial waveguide element, the second microstructural coaxial waveguide element comprising an outer conductor, a center conductor and comprising a mating end complementary to the mating end of the first microstructural coaxial waveguide element and configured to receive the mating end of the first microstructural coaxial waveguide element and configured to electrically couple the respective center conductors of the first and second microstructural coaxial waveguide elements and configured to electrically couple the respective outer conductors of the first and second microstructural coaxial waveguide elements.
7. The method according to claim 6 , wherein the plurality of layers comprises a sacrificial material, and wherein the method includes the step of removing the sacrificial material.
8. The method according to claim 6 , wherein the mating ends of the center conductors of the first and second coaxial waveguide elements are configured to deflect with a cantilever motion upon contact therebetween.
9. The method according to claim 6 , wherein the mating end of the second microstructural coaxial waveguide element comprises an annular shape for receiving the center conductor of the first microstructural coaxial waveguide element complementarily.
10. The method according to claim 6 , wherein the second microstructural coaxial waveguide element comprises a plurality of non-conductive supports configured to support the center conductor of the second microstructural coaxial waveguide element within the outer conductor of the second microstructural coaxial waveguide element.
11. A method of forming a three dimensional microstructure by a sequential build process, comprising:
depositing a plurality of layers over a substrate having a planar region, wherein the layers comprise one or more of a metal material, and a dielectric material, thereby forming a structure above the substrate, comprising
a first microstructural coaxial waveguide element, the first microstructural coaxial element comprising an outer conductor, a center conductor, and a plurality of non-conductive supports configured to support the center conductor within the outer conductor and comprising a mating end at which the center conductor extends beyond the length of the outer conductor;
a second microstructural coaxial waveguide element, the second microstructural coaxial waveguide element comprising an outer conductor, a center conductor and comprising a mating end configured to receive the mating end of the first microstructural coaxial waveguide element and configured to electrically couple the respective center conductors of the first and second microstructural coaxial waveguide elements and configured to electrically couple the respective outer conductors of the first and second microstructural coaxial waveguides,
wherein the mating ends of the first and second microstructural coaxial waveguide elements are configured to permit the first and second microstructural coaxial waveguide elements to be orthogonally connected.
12. A three-dimensional microstructure, comprising:
a microstructural base element comprising one or more layers of material including a chip socket disposed therein for receiving a chip and including one or more base registration features; and
a microstructural lid element comprising one or more layers of material, the lid element configured to mate to the base element, the lid element including one or more lid registration features for registration with the base registration features and including a plurality of biasing members disposed at a location relative to the lid registration features so as be located in opposition to the chip socket upon registration of the base and lid elements, whereby a chip disposed in the chip socket may be electrically and/or mechanically interconnected to the base and lid elements by the biasing members.
13. The three-dimensional microstructure according to claim 12 , wherein the biasing members comprise cantilevered fingers.
14. A method of forming a three-dimensional microstructure by a sequential build process, comprising:
depositing a plurality of layers over a substrate having a planar region, wherein the plurality of layers comprise one or more of a metal material, and a dielectric material, thereby forming a structure above the substrate, comprising
a microstructural base element including a chip socket disposed therein for receiving a chip and including one or more base registration features;
a microstructural lid element configured to mate to the base element, the lid element including one or more lid registration features for registration with the base registration features and including a plurality of biasing members disposed at a location relative to the lid registration features so as be located in opposition to the chip socket upon registration of the base and lid elements, whereby a chip disposed in the chip socket may be electrically and/or mechanically interconnected to the base and lid elements by the biasing members.
15. The method according to claim 14 , wherein the plurality of layers comprises a sacrificial material, and wherein the method includes the step of removing the sacrificial material.
16. The method according to claim 14 , wherein the biasing members comprise cantilevered fingers.