Magnetic tunnel junction with perpendicular enhancement layer and thin reference layer
View Patent ↗The present invention is directed to a spin transfer torque (STT) MRAM device having a perpendicular magnetic tunnel junction (MTJ) memory element. The memory element includes a perpendicular MTJ structure in between a non-magnetic seed layer and a non-magnetic cap layer. The MTJ structure comprises a magnetic free layer structure and a magnetic reference layer structure with an insulating tunnel junction layer interposed therebetween, an anti-ferromagnetic coupling layer formed adjacent to the magnetic reference layer structure, and a magnetic fixed layer formed adjacent to the anti-ferromagnetic coupling layer. At least one of the magnetic free and reference layer structures includes a non-magnetic perpendicular enhancement layer, which improves the perpendicular anisotropy of magnetic layers adjacent thereto.
1. A magnetic random access memory device comprising a plurality of magnetic tunnel junction (MTJ) memory elements, each of said memory elements comprising:
a magnetic reference layer structure including a first and a second magnetic reference layers with a tantalum perpendicular enhancement layer interposed therebetween, said first magnetic reference layer comprising cobalt, iron, and boron, said first and said second magnetic reference layers having a first fixed magnetization direction substantially perpendicular to layer planes thereof;
an insulating tunnel junction layer formed adjacent to said first magnetic reference layer opposite said tantalum perpendicular enhancement layer;
an anti-ferromagnetic coupling layer formed adjacent to said second magnetic reference layer opposite said tantalum perpendicular enhancement layer;
a magnetic fixed layer formed immediately adjacent to said anti-ferromagnetic coupling layer opposite said second magnetic reference layer, said magnetic fixed layer having a second fixed magnetization direction that is substantially perpendicular to a layer plane thereof and is substantially opposite to said first fixed magnetization direction; and
a magnetic free layer structure formed adjacent to said insulating tunnel junction layer opposite said first magnetic reference layer, said magnetic free layer structure including a first and a second magnetic free layers with a second tantalum perpendicular enhancement layer interposed therebetween, said first and second magnetic free layers having respectively a first and a second variable magnetization directions that are substantially perpendicular to layer planes thereof and are parallel to each other.
2. The magnetic random access memory device according to claim 1 , wherein said second magnetic reference layer comprises cobalt, iron, and boron.
3. The magnetic random access memory device according to claim 1 , wherein said second magnetic reference layer comprises cobalt and iron.
4. The magnetic random access memory device according to claim 1 , wherein said second magnetic reference layer has a superlattice structure formed by interleaving two different types of materials with at least one of said two different types being magnetic.
5. The magnetic random access memory device according to claim 1 , wherein said magnetic fixed layer has a superlattice structure formed by interleaving two different types of materials with at least one of the two different types being magnetic.
6. The magnetic random access memory device according to claim 1 , wherein said each memory element further comprises:
a non-magnetic tuning layer formed adjacent to said magnetic free layer structure opposite said insulating tunnel junction layer; and
a magnetic compensation layer formed adjacent to said non-magnetic tuning layer opposite said magnetic free layer structure, said magnetic compensation layer having a third fixed magnetization direction that is substantially perpendicular to a layer plane thereof and is substantially opposite to said first fixed magnetization direction.