IP Library Granted Patent US 9,752,244
Granted Patent B2
US 9,752,244 · App. 14/421,568 · Granted Sep 5, 2017

Galvanic nickel electroplating bath for depositing a semi-bright nickel

Inventors: Klaus-Dieter Schulz (Falkensee, DE); Philip Hartmann (Berlin, DE); Philipp Wachter (Berlin, DE); Mike Briese (Berlin, DE); Heiko Brunner (Berlin, DE); Richard Richter (Berlin, DE); Lars Kohlmann (Berlin, DE)
Assignee: Atotech Deutschland GmbH
C25D3/562C25D3/18
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Quick Facts
Patent No.
US 9,752,244
App. No.
14/421,568
Granted
Sep 5, 2017
Kind
B2
Abstract

The present invention is related to a galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy coating characterized in that the electroplating bath comprises at least one compound having the general formula (I) wherein R 1 =C 1 -C 18 hydrocarbon moiety substituted with a SO 3 − group, C 1 -C 18 hydrocarbon moiety substituted with a carboxylic group or C 1 -C 18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group; R 2 =NR 3 R 4 moiety, OR 5 moiety, or cyclic NR 6 moiety, wherein R 3 , R 4 , R 5 =hydrogen or C 1 -C 18 hydrocarbon moiety or C 1 -C 18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R 3 , R 4 and R 5 are identical or different; R 6 =C 3 -C 8 hydrocarbon moiety or C 3 -C 8 hydrocarbon moiety, wherein at least one carbon atom is substituted by a heteroatom; and n=1-3.

Claims (45)

1. Galvanic nickel electroplating bath for depositing a semi-bright nickel coating characterized in that the electroplating bath comprises at least one compound having the general formula (I)

wherein

R 1 =C 1 -C 18 hydrocarbon moiety substituted with a SO 3 − group or C 1 -C 4 hydrocarbon moiety substituted with a carboxylic group, or a salt thereof;

R 2 =NR 3 R 4 moiety, OR 5 moiety, or cyclic NR 6 moiety, wherein R 3 , R 4 , R 5 =hydrogen or C 1 -C 18 hydrocarbon moiety or C 1 -C 18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R 3 , R 4 and R 5 are identical or different;

R 6 =C 3 -C 8 hydrocarbon moiety or C 3 -C 8 hydrocarbon moiety, wherein at least one carbon atom is substituted by a heteroatom; and

n=1-3, and

wherein the pH-value of the electroplating bath ranges from 2 to 6.

2. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath further comprises an alkali metal or ammonium benzoate at a concentration ranging from 0.005 to 5 g/l.

3. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath comprises at least one compound having the general formula (I), wherein

R 1 =C 1 -C 8 hydrocarbon moiety substituted with a SO 3 − group or C 1 -C 4 hydrocarbon moiety substituted with a carboxylic group;

R 2 =NR 3 R 4 moiety, OR 5 moiety, or cyclic NR 6 moiety, wherein R 3 , R 4 , R 5 =hydrogen or C 1 -C 18 hydrocarbon moiety or C 1 -C 18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R 3 , R 4 and R 5 are identical or different;

R 6 =C 4 -C 8 hydrocarbon moiety or C 3 -C 8 hydrocarbon moiety, wherein at least one carbon atom is substituted by a heteroatom; and

n=1 or 2.

4. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath comprises at least one compound having the general formula (I), wherein

R 1 =C 1 -C 8 hydrocarbon moiety substituted with a SO 3 − group or C 1 -C 4 hydrocarbon moiety substituted with a carboxylic group;

R 2 =NR 3 R 4 moiety, OR 5 moiety, or cyclic NR 6 moiety, wherein R 3 , R 4 , R 5 =hydrogen or C 1 -C 8 , hydrocarbon moiety or C 1 -C 8 , hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R 3 , R 4 and R 5 are identical or different;

R 6 =C 4 or C 5 hydrocarbon moiety or C 4 -C 5 hydrocarbon moiety, wherein at least one carbon atom is substituted by a sulfur or oxygen atom; and

n=1.

5. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath comprises at least one compound having the general formula (I), wherein

R 1 =n-ethyl-SO 3 − , n-propyl-SO 3 − , n-butyl-SO 3 − , CH 2 —COOH or a salt thereof, moiety;

R 2 =NH 2 , N(ethyl) 2 , O(ethyl), OH moiety, or cyclic NR 6 moiety, wherein R 6 =C 4 or C 5 hydrocarbon moiety or C 4 -C 5 hydrocarbon moiety, wherein at least one carbon atom is substituted by a sulfur or an oxygen atom; and

n=1.

6. Galvanic nickel electroplating bath according to claim 1 characterized in that the working temperature ranges from 40° C. to 70° C.

7. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath comprises the at least one compound having the general formula (I) at a concentration ranging from 0.005 to 10 g/l.

8. Galvanic nickel electroplating bath according to claim 1 characterized in that the at least one moiety C(O)R 2 is in ortho, meta and/or para position at the aromatic ring.

9. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath further comprises chloral hydrate at a concentration ranging from 0.005 to 5 g/l.

10. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath further comprises at least one compound selected from brighteners, leveling agents, internal stress reducers, and wetting agents, at a concentration ranging from 0.001 to 8 g/l.

11. Galvanic nickel electroplating bath according to claim 1 characterized in that the electroplating bath comprises additionally at least one bright nickel additive which is, if used without at least one compound having the general formula (I), unsuitable for depositing semi-bright nickel deposits.

12. Galvanic nickel electroplating bath according to claim 1 characterized in that R 1 =CH 2 —COOH or a salt thereof.

13. Galvanic nickel electroplating bath according to claim 1 characterized in that R 1 =C 1 -C 4 hydrocarbon moiety substituted with a SO 3 − group.

14. Method for depositing a semi-bright nickel coating on an electrically conductive work piece comprising the following method steps:

i) bringing the work piece into contact with the galvanic nickel electroplating bath according to claim 1 ;

ii) bringing at least one anode into contact with the galvanic nickel electroplating bath;

iii) applying a voltage across the work piece and the at least one anode; and

iv) electrodepositing a semi-bright nickel coating on the work piece.

15. A process for depositing a bright nickel coating, comprising the following method steps:

i) bringing the work piece into contact with the galvanic nickel electroplating bath according to claim 1 , wherein additionally a primary brightener is added to the galvanic nickel electroplating bath;

ii) bringing at least one anode into contact with the galvanic nickel electroplating bath;

iii) applying a voltage across the work piece and the at least one anode; and

iv) electrodepositing a bright nickel coating on the work piece.

16. Galvanic nickel electroplating bath for depositing a semi-bright nickel coating characterized in that the electroplating bath comprises at least one compound having the general formula (I)

wherein R 1 =C 1 -C 4 hydrocarbon moiety substituted with a SO 3 − group or CH 2 —COOH or a salt thereof;

R 2 =NR 3 R 4 moiety, OR 5 moiety, or cyclic NR 6 moiety, wherein R 3 , R 4 , R 5 =hydrogen or C 1 -C 18 hydrocarbon moiety or C 1 -C 18 hydrocarbon moiety substituted with at least an aromatic and/or a heteroaromatic group, wherein R 3 , R 4 and R 5 are identical or different;

R 6 =C 3 -C 8 hydrocarbon moiety or C 3 -C 8 hydrocarbon moiety, wherein at least one carbon atom is substituted by a heteroatom; and

n=1-3.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2015
From: SCHULZ, KLAUS-DIETER; HARTMANN, PHILIP; WACHTER, PHILIPP; BRIESE, MIKE; BRUNNER, HEIKO; RICHTER, RICHARD; KOHLMANN, LARS
To: ATOTECH DEUTSCHLAND GMBH
Reel/Frame 034959/0422 →
Priority Claims (1)
EP 13167074 · May 8, 2013 · regional
Continuity (1)
Related Publication 20160053395A1 · Feb 25, 2016