IP Library Granted Patent US 9,394,622
Granted Patent B2
US 9,394,622 · App. 14/427,226 · Granted Jul 19, 2016

Device and method for the treatment of flat material to be treated

Inventors: Ferdinand Wiener (Burgthann, DE); Christian Thomas (Erlangen, DE); Olaf Lorenz (Altdorf, DE)
Assignee: Atotech Deutschland GmbH
C25D7/0621B08B3/041B08B3/08C23C18/1619C23C18/1628C23C18/1669C23C18/1675C25D5/08C25D17/00C25D17/02C25D17/08C25D21/10C25D21/12H05K3/241
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Quick Facts
Patent No.
US 9,394,622
App. No.
14/427,226
Granted
Jul 19, 2016
Kind
B2
Abstract

The device 1 according to the invention is suggested for gentle treatment of a flat material B to be treated with a treatment liquid F. The device 1 has the following components: at least one treatment chamber 20 , in which the treatment liquid F can be accumulated up to a bath level M, at least one supply device 7 for the supply of the treatment liquid F into the at least one treatment chamber 20 , at least one transport device 30 , with which the material B to be treated can be transported in the horizontal position in a transport plane E below the bath level M through the at least one treatment chamber 20 , at least one reception area 4 for the treatment liquid F, and at least one discharge device 40 with, respectively, at least one discharge opening 41 for the treatment liquid F for conveying it from the at least one treatment chamber 20 with a respective discharge rate into the at least one reception area 4 . The at least one discharge device 40 respectively has at least one regulating system 43 , with which the discharge rate of the treatment liquid F is adjustable through the at least one discharge opening 41.

Claims (47)

1. A device ( 1 ) for the chemical or electrolytic treatment of flat material to be treated (B) with a treatment liquid (F), having

at least one treatment chamber ( 20 ), in which the treatment liquid (F) can be accumulated up to a bath level (M);

at least one supply device ( 7 ) for the supply of treatment liquid (F) into the at least one treatment chamber ( 20 );

at least one transport device ( 30 ) position in a transport configured to transport the flat material in a horizontal plane (E) below the bath level (M) through the at least one treatment chamber ( 20 ) while the treatment liquid (F) is accumulated in the at least one treatment chamber up to the bath level (M);

at least one reception area ( 4 ) for the treatment liquid (F); and

at least one discharge device ( 40 ) with, respectively, at least one discharge opening ( 41 ) for the treatment liquid (F) for conveying the treatment liquid (F) from the at least one treatment chamber ( 20 ) with a respective discharge rate into the at least one reception area ( 4 );

wherein the at least one discharge device ( 40 ) respectively has at least one regulating system ( 43 ), with which the discharge rate of the treatment liquid (F) through the at least one discharge opening ( 41 ) is adjustable,

wherein at least one screen device ( 60 ), respectively, is arranged between the at least one treatment chamber ( 20 ) and the at least one discharge device ( 40 ) and a respective discharge chamber ( 61 ) is formed between the at least one screen device ( 60 ) and the at least one discharge opening ( 41 );

characterized in that the at least one screen device is selected from the group consisting of:

(a) screen devices having respectively, at least one passage opening ( 62 ) for the passage of the treatment liquid (F) into the at least one discharge chamber ( 61 ), which is arranged at the height level of the transport plane (E) for the material (B) to be treated, and

(b) screen devices forming respectively, at least partially a bottom of the treatment chamber ( 20 ) and essentially extends parallel to a lower wall of the discharge chamber ( 61 ) and is spaced from the latter, so that a passage distance is formed between the lower wall of the discharge chamber ( 61 ) and the screen device ( 60 ), the screen device ( 60 ) forming a passage opening ( 62 ).

2. The device ( 1 ) for the chemical or electrolytic treatment according to claim 1 , wherein the bath level (M) is adjustable by means of the regulating system ( 43 ).

3. The device ( 1 ) for the chemical or electrolytic treatment according to claim 1 , characterized in that the at least one discharge device ( 40 ) has at least one discharge duct ( 47 ), respectively.

4. The device ( 1 ) for the chemical or electrolytic treatment according to claim 3 , characterized in that the at least one regulating system ( 43 ) is arranged on and in the at least one discharge duct ( 47 ).

5. The device ( 1 ) for the chemical or electrolytic treatment according to claim 3 , characterized in that the at least one regulating system ( 43 ) has at least one regulating element ( 44 ), selected from a group comprising a pump and an element changing the cross-section of the at least one discharge duct ( 47 ).

6. The device ( 1 ) for the chemical or electrolytic treatment according to claim 5 , characterized in that the at least one element ( 44 ) changing the cross-section of the at least one discharge duct ( 47 ) is selected from a group comprising a valve, a flap and a vane.

7. The device ( 1 ) for the chemical or electrolytic treatment according to claim 3 , characterized in that at least two discharge ducts ( 47 ) are provided for and in that the discharge rates are adjustable jointly via the at least two discharge ducts ( 47 ) by means of at least one regulating system ( 43 ).

8. The device ( 1 ) for the chemical or electrolytic treatment according to claim 3 , characterized in that the at least one discharge duct ( 47 ) ends below a liquid level (N) in the at least one reception area ( 4 ).

9. The device ( 1 ) for the chemical or electrolytic treatment according to claim 3 , characterized in that the at least one discharge device ( 40 ) has at least one discharge line ( 46 ), respectively, which defines the respective discharge duct ( 47 ).

10. The device ( 1 ) for the chemical or electrolytic treatment according to claim 1 , characterized in that the at least one regulating system ( 43 ) has a respective drive ( 45 ), which is arranged spatially separated from the at least one regulating element ( 44 ).

11. The device ( 1 ) for the chemical or electrolytic treatment according to claim 1 , characterized in that the at least one screen device ( 60 ) is formed by a drain plate ( 63 ), respectively, and in that the at least one drain plate ( 63 ) is formed with at least one guide element ( 64 ) facing towards the lower wall of the respective discharge chamber ( 61 ), respectively, so that a reduced 15 passage distance is formed between the lower wall of the discharge chamber ( 61 ) and the at least one guide element ( 64 ), said passage distance forming a passage opening ( 62 ).

12. The device ( 1 ) for the chemical or electrolytic treatment according to claim 11 , characterized in that the passage distance is, at locations of the at least one guide element ( 64 ), which are adjacent to a discharge opening ( 41 ), smaller than at other locations of the at least one guide element ( 64 ), which are further away from the discharge opening ( 41 ).

13. A method for the chemical or electrolytic treatment of flat material (B) to be treated in a treatment chamber ( 20 ) with a treatment liquid (F), in particular using the device ( 1 ) for the chemical or electrolytic treatment according to claim 1 , comprising the following method steps:

supplying the treatment liquid (F) via at least one supply device ( 7 ) to the treatment chamber ( 20 );

discharging the treatment liquid (F) with a respective discharge rate through, respectively, at least one discharge opening ( 41 ) of a discharge device ( 40 ) from the treatment chamber ( 20 ) into at least one reception area ( 4 );

transporting the material (B) to be treated by means of at least one transport device ( 30 ) in a horizontal position in a transport plane (E) through the treatment chamber ( 20 ), wherein the material (B) to be treated is transported below a bath level (M) of the treatment liquid (F) in the treatment chamber ( 20 ) while the treatment fluid is accumulated in the treatment chamber up to the bath level (M); and

adjusting the respective discharge rate of the treatment liquid (F) from the treatment chamber ( 20 ) by means of a regulating system ( 43 ).

14. A device ( 1 ) for the chemical or electrolytic treatment of flat material to be treated (B) with a treatment liquid (F), having

at least one treatment chamber ( 20 ), in which the treatment liquid (F) can be accumulated up to a bath level (M);

at least one supply device ( 7 ) for the supply of treatment liquid (F) into the at least one treatment chamber ( 20 );

at least one transport device ( 30 ), with which the flat material (B) to be treated can be transported in a horizontal position in a transport plane (E) below the bath level (M) through the at least one treatment chamber ( 20 );

at least one reception area ( 4 ) for the treatment liquid (F); and

at least one discharge device ( 40 ) with, respectively, at least one discharge opening ( 41 ) for the treatment liquid (F) for conveying the treatment liquid (F) from the at least one treatment chamber ( 20 ) with a respective discharge rate into the at least one reception area ( 4 );

wherein the at least one discharge device ( 40 ) respectively has at least one regulating system ( 43 ), with which the discharge rate of the treatment liquid (F) through the at least one discharge opening ( 41 ) is adjustable,

wherein at least one screen device ( 60 ), respectively, is arranged between the at least one treatment chamber ( 20 ) and the at least one discharge device ( 40 ) and a respective discharge chamber ( 61 ) is formed between the at least one screen device ( 60 ) and the at least one discharge opening ( 41 );

characterized in that

the at least one screen device ( 60 ) has, respectively, at least one passage opening ( 62 ) for the passage of the treatment liquid (F) into the at least one discharge chamber ( 61 ), which is arranged at the height level of the transport plane (E) for the material (B) to be treated.

15. A device ( 1 ) for the chemical or electrolytic treatment of flat material to be treated (B) with a treatment liquid (F), having

at least one treatment chamber ( 20 ), in which the treatment liquid (F) can be accumulated up to a bath level (M);

at least one supply device ( 7 ) for the supply of treatment liquid (F) into the at least one treatment chamber ( 20 );

at least one transport device ( 30 configured to transport the flat material in a horizontal plane below the bath level (M) through the at least one treatment chamber ( 20 ) while the treatment liquid (F) is accumulated in the at least one treatment chamber up to the bath level (M);

at least one reception area ( 4 ) for the treatment liquid (F); and

at least one discharge device ( 40 ) with, respectively, at least one discharge opening ( 41 ) for the treatment liquid (F) for conveying the treatment liquid (F) from the at least one treatment chamber ( 20 ) with a respective discharge rate into the at least one reception area ( 4 );

wherein the at least one discharge device ( 40 ) respectively has at least one regulating system ( 43 ), with which the discharge rate of the treatment liquid (F) through the at least one discharge opening ( 41 ) is adjustable,

wherein at least one screen device ( 60 ), respectively, is arranged between the at least one treatment chamber ( 20 ) and the at least one discharge device ( 40 ) and a respective discharge chamber ( 61 ) is formed between the at least one screen device ( 60 ) and the at least one discharge opening ( 41 );

characterized in that

the at least one screen device ( 60 ) forms, respectively, at least partially a bottom of the treatment chamber ( 20 ) and essentially extends parallel to a lower wall of the discharge chamber ( 61 ) and is spaced from the latter, so that a passage distance is formed between the lower wall of the discharge chamber ( 61 ) and the screen device ( 60 ), the screen device ( 60 ) forming a passage opening ( 62 ).

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Aug 18, 2022
From: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH); ATOTECH USA, LLC
Reel/Frame 061521/0103 →
RELEASE OF SECURITY INTEREST Recorded Mar 18, 2021
From: BARCLAYS BANK PLC, AS COLLATERAL AGENT
To: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
Reel/Frame 055653/0714 →
SECURITY INTEREST Recorded Mar 18, 2021
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 055650/0093 →
SECURITY INTEREST Recorded Feb 1, 2017
From: ATOTECH DEUTSCHLAND GMBH; ATOTECH USA INC
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 041590/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 11, 2015
From: WIENER, FERDINAND; THOMAS, CHRISTIAN; LORENZ, OLAF
To: ATOTECH DEUTCHLAND GMBH
Reel/Frame 035606/0061 →
Priority Claims (1)
DE 10 2012 221 012 · Nov 16, 2012 · national
Continuity (1)
Related Publication 20150252488A1 · Sep 10, 2015