Gas storage and dispensing system with monolithic carbon adsorbent
View Patent ↗A pyrolyzed monolith carbon physical adsorbent that is characterized by at least one of the following characteristics: (a) a fill density measured for arsine gas at 25° C. and pressure of 650 torr that is greater than 400 grams arsine per liter of adsorbent; (b) at least 30% of overall porosity of the adsorbent including slit-shaped pores having a size in a range of from about 0.3 to about 0.72 nanometer, and at least 20% of the overall porosity including micropores of diameter <2 nanometers; and (c) having a bulk density of from about 0.80 to about 2.0 grams per cubic centimeter, preferably from 0.9 to 2.0 grams per cubic centimeter.
1. A gas package, comprising a vessel, a dispensing assembly coupled to the vessel for discharging gas therefrom, and monolithic carbon adsorbent in the vessel, wherein the monolithic carbon adsorbent has a bulk density of from 0.9 to 2.0 g/cm 3 , a fill density measured for arsine gas at 25° C. and pressure of 650 torr that is greater than 400 g arsine per liter of adsorbent, and porosity at least 20% of which comprises pores of diameter below 2 nm.
2. The gas package of claim 1 , wherein the vessel is of cylindrical form.
3. The gas package of claim 1 , wherein the dispensing assembly comprises a valve head.
4. The gas package of claim 3 , wherein the dispensing assembly comprises a pneumatically actuated valve.
5. The gas package of claim 1 , wherein the monolithic carbon adsorbent comprises a pyrolyzate of a PVDC-based polymer.
6. The gas package of claim 1 , comprising gas therein.
7. The gas package of claim 6 , wherein said gas comprises a fluorine-containing compound.
8. The gas package of claim 6 , wherein said gas comprises an organometallic compound.
9. The gas package of claim 6 , wherein said gas comprises a hydride compound.
10. The gas package of claim 6 , wherein said gas comprises a gas species selected from the group consisting of hydrides, arsine, phosphine, germane, silane, mono-, di-, and tri-substituted silanes, alkyl silanes of such types, halides, boron trifluoride, boron trichloride, halogen-substituted silanes, organometallic gases, phosgene, diborane, ammonia, stibine, hydrogen sulfide, hydrogen selenide, hydrogen telluride, nitrous oxide, hydrogen cyanide, ethylene oxide, deuterated hydrides, halide (chlorine, bromine, fluorine, and iodine) compounds, F2, SiF4, Cl2, ClF3, GeF4, SiF4, boron halides, organoaluminum compounds, organobarium compounds, organostrontium compounds, organogallium compounds, organoindium compounds, organotungsten compounds, organoantimony compounds, organosilver compounds, organogold compounds, organopalladium compounds, and organogadolinium compounds.
11. The gas package of claim 1 , wherein the monolithic carbon adsorbent comprises a plurality of disk-shaped carbon adsorbent articles in a vertically extending stacked arrangement in the vessel.
12. The gas package of claim 6 , wherein the gas is at subatmospheric pressure.
13. A method of supplying gas for use in a fluid-utilizing process, said method comprising packaging said gas in a gas package according to claim 1 for delivery to said fluid-utilizing process.
14. The method of claim 13 , wherein said fluid-utilizing process comprises a semiconductor manufacturing process.
15. The method of claim 13 , wherein said fluid-utilizing process comprises an ion implantation process.
16. The method of claim 13 , wherein said gas comprises a fluorine-containing compound.
17. The method of claim 13 , wherein said gas comprises an organometallic compound.
18. The method of claim 13 , wherein said gas comprises a hydride compound.
19. The method of claim 13 , wherein said gas comprises a gas species selected from the group consisting of hydrides, arsine, phosphine, germane, silane, mono-, di-, and tri-substituted silanes, alkyl silanes of such types, halides, boron trifluoride, boron trichloride, halogen-substituted silanes, organometallic gases, phosgene, diborane, ammonia, stibine, hydrogen sulfide, hydrogen selenide, hydrogen telluride, nitrous oxide, hydrogen cyanide, ethylene oxide, deuterated hydrides, halide (chlorine, bromine, fluorine, and iodine) compounds, F2, SiF4, Cl2, ClF3, GeF4, SiF4, boron halides, organoaluminum compounds, organobarium compounds, organostrontium compounds, organogallium compounds, organoindium compounds, organotungsten compounds, organoantimony compounds, organosilver compounds, organogold compounds, organopalladium compounds, and organogadolinium compounds.
20. The method of claim 13 , wherein the monolithic carbon adsorbent comprises a pyrolyzate of a PVDC-based polymer.