Semiconductor device with reduced thickness
View Patent ↗A semiconductor device with reduced thickness is disclosed and may include forming a back end of line (BEOL) comprising a redistribution layer on a dummy substrate. A first semiconductor die may be bonded to a first surface of the BEOL and a second semiconductor die may be bonded to the first semiconductor die. The first and second semiconductor dies may be electrically coupled to the BEOL. The first and second semiconductor dies and the BEOL may be encapsulated utilizing a first encapsulant. The dummy substrate may be removed thereby exposing a second surface of the BEOL opposite to the first surface. A solder ball may be placed on the exposed second surface of the BEOL. The second semiconductor may be stacked stepwise on the first semiconductor and may be flip-chip bonded. The semiconductor dies may be electrically coupled to the BEOL utilizing a lateral plating layer or conductive wires.
1. A method for manufacturing a semiconductor device, the method comprising:
bonding a first semiconductor die to a first surface of a back end of line (BEOL) layer that comprises a redistribution layer on a dummy substrate;
bonding a second semiconductor die to the first semiconductor die;
covering a portion of top and side surfaces of the first and second semiconductor die utilizing an insulating layer;
electrically coupling the first and second semiconductor dies to the BEOL utilizing a lateral plating layer on the insulating layer and the BEOL layer;
encapsulating the first and second semiconductor dies, the lateral plating layer, and a portion of the BEOL layer utilizing a first encapsulant;
removing the dummy substrate thereby exposing a second surface of the BEOL layer opposite to the first surface; and
forming a conductive interconnection structure on the exposed second surface of the BEOL layer.
2. The method according to claim 1 , wherein the second semiconductor die is stacked stepwise on the first semiconductor die.
3. The method according to claim 1 , comprising flip-chip bonding the second semiconductor die to the first semiconductor die.
4. The method according to claim 1 , comprising electrically coupling the first and second semiconductor dies to each other utilizing the lateral plating layer.
5. The method according to claim 4 , wherein the insulating layer electrically isolates the lateral plating layer from portions of the first and second semiconductor dies.
6. The method according to claim 1 , wherein the dummy substrate comprises silicon, glass, silicon carbide, sapphire, quartz, ceramic, metal oxide, and/or a metal.
7. The method according to claim 1 , comprising encapsulating the second surface of the BEOL layer and a portion of the conductive interconnection structure utilizing a second encapsulant.
8. The method according to claim 1 , wherein a pitch of the redistribution layer is between 20 nm and 1000 nm.
9. A semiconductor device, the device comprising:
a back end of line (BEOL) layer comprising a redistribution layer;
a first semiconductor die bonded to a first surface of the BEOL layer;
a second semiconductor die bonded to the first semiconductor die;
an insulating layer that covers a portion of top and side surfaces of the first and second semiconductor die;
a lateral plating layer on the insulating layer and the BEOL layer that electrically couples the first and second semiconductor dies to the BEOL layer;
encapsulant encapsulating the first and second semiconductor dies, the lateral plating layer, and the BEOL layer; and
a conductive interconnection structure on a second surface opposite to the first surface of the BEOL layer.
10. The device according to claim 9 , wherein the second semiconductor is stacked stepwise on the first semiconductor die.
11. The device according to claim 9 , wherein the second semiconductor die is flip-chip bonded to the first semiconductor die.
12. The device according to claim 9 , wherein the first and second semiconductor dies are electrically coupled to the each other utilizing the lateral plating layer.
13. The device according to claim 12 , wherein the insulating layer electrically isolates the lateral plating layer from portions of the first and second semiconductor dies.
14. The device according to claim 9 , wherein the conductive interconnection structure on the second surface of the BEOL layer is bonded to a bond pad.
15. The device according to claim 9 , wherein a second encapsulant encapsulates the second surface of the BEOL layer and a portion of the conductive interconnection structure.
16. The device according to claim 9 , wherein a pitch of the redistribution layer is between 20 nm and 1000 nm.
17. A method for forming a semiconductor device, the method comprising:
bonding a first surface of a first semiconductor die to a first surface of a back end of line (BEOL) layer comprising a redistribution layer on a dummy substrate;
bonding a second semiconductor die to a second surface of the first semiconductor die that is opposite to the first surface of the first semiconductor die;
covering a portion of top and side surfaces of the first and second semiconductor die utilizing an insulating layer;
electrically coupling the first and second semiconductor dies to the BEOL layer utilizing a lateral plating layer on the insulating layer and the BEOL layer;
encapsulating the first and second semiconductor dies, the lateral plating layer, and the BEOL layer utilizing a first encapsulant; and
removing the dummy substrate thereby exposing a second surface of the BEOL layer opposite to the first surface for making electrical contact to the second surface of the BEOL layer.