Atomic layer deposition of metal oxides for memory applications
View Patent ↗Embodiments of the invention generally relate to nonvolatile memory devices and methods for manufacturing such memory devices. The methods for forming improved memory devices, such as a ReRAM cells, provide optimized, atomic layer deposition (ALD) processes for forming a metal oxide film stack which contains at least one hard metal oxide film (e.g., metal is completely oxidized or substantially oxidized) and at least one soft metal oxide film (e.g., metal is less oxidized than hard metal oxide). The soft metal oxide film is less electrically resistive than the hard metal oxide film since the soft metal oxide film is less oxidized or more metallic than the hard metal oxide film. In one example, the hard metal oxide film is formed by an ALD process utilizing ozone as the oxidizing agent while the soft metal oxide film is formed by another ALD process utilizing water vapor as the oxidizing agent.
1. A semiconductor device comprising:
a first electrode;
a metal oxide film stack disposed on the first electrode,
wherein the metal oxide film stack comprises a first metal oxide film and a second metal oxide film,
wherein the first metal oxide film comprises a stoichiometric oxide of a metal,
wherein the second metal oxide film comprises a non-stoichiometric oxide of the metal,
wherein the metal is one of hafnium, zirconium, or titanium, and
wherein a stoichiometric ratio of oxygen to the metal in the non-stoichiometric oxide is between about 1.70 and 1.90;
a second electrode disposed on the metal oxide film stack such that the metal oxide film stack is disposed between the first electrode and the second electrode; and
a coupling layer disposed between the first electrode and the metal oxide film stack.
2. The semiconductor device of claim 1 , wherein the metal is hafnium.
3. The semiconductor device of claim 1 , wherein the metal is zirconium.
4. The semiconductor device of claim 1 , wherein the metal is titanium.
5. The semiconductor device of claim 1 , wherein the metal oxide film stack has a thickness of between about 20 Angstroms and 200 Angstroms.
6. The semiconductor device of claim 1 , wherein the metal oxide film stack has a thickness of between about 40 Angstroms and 100 Angstroms.
7. The semiconductor device of claim 1 , wherein a stoichiometric ratio of oxygen to the metal in the non-stoichiometric oxide is between about 1.75 and 1.85.
8. The semiconductor device of claim 1 , wherein a stoichiometric ratio of oxygen to the metal in the non-stoichiometric oxide is about 1.8.
9. The semiconductor device of claim 1 , wherein the coupling layer comprises one of aluminum oxide, metallic titanium, or titanium nitride.
10. The semiconductor device of claim 1 , wherein the coupling layer comprises aluminum oxide.
11. The semiconductor device of claim 1 , wherein the coupling layer comprises metallic titanium.
12. The semiconductor device of claim 1 , wherein the coupling layer is thinner than the metal oxide film stack.
13. The semiconductor device of claim 1 , wherein a thickness of the coupling layer is less than 25% of a thickness of the metal oxide film stack.
14. The semiconductor device of claim 1 , wherein a thickness of the coupling layer is less than 10% of a thickness of the metal oxide film stack.
15. The semiconductor device of claim 1 , wherein the first metal oxide film directly interfaces the second metal oxide film.
16. The semiconductor device of claim 1 , further comprising forming an additional layer disposed between the first metal oxide film and the second metal oxide film.
17. The semiconductor device of claim 16 , wherein the additional layer comprises one of a metal oxide, a metal nitride, or a metal oxynitride.
18. The semiconductor device of claim 16 , wherein the additional layer comprises one of aluminum oxide, tantalum oxide, lanthanum oxide, or yttrium oxide.
19. The semiconductor device of claim 16 , wherein the additional layer comprises one of aluminum nitride, titanium nitride, hafnium nitride, zirconium nitride, tantalum nitride, lanthanum nitride, or yttrium nitride.