Slurry for chemical-mechanical polishing of metals and use thereof
View Patent ↗A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
1. A slurry composition, comprising:
between about 0.5% by weight and about 6% by weight abrasive particles;
between about 1 gm/liter and about 50 gm/liter of ferric nitrate;
between about 0.1 ml/liter and about 100 ml/liter of surfactant anion;
between about 0.003 ml/liter and about 3.05 ml/liter of octanol; and
water as a diluent.
2. The slurry composition of claim 1 , wherein said surfactant anion is octyl sulfate.
3. The slurry composition of claim 1 , further comprising:
between about 0.001 gm/liter and about 5 gm/liter of a chloride ion source; and
between about 0.001 gm/liter and about 20 gm/liter of a sulfate ion source.
4. The slurry composition of claim 1 , further comprising:
between about 0.1 gm/liter and about 5 gm/liter of a copper corrosion inhibitor.
5. The slurry composition of claim 1 , wherein there is less than 1% by weight in total of one or more of sodium citrate, sodium nitrate, Na 2 HPO 4 , sodium oxalate, and NaSiF 6 in said slurry composition.
6. The slurry composition of claim 1 , wherein there is less than 1% by weight of organic amine or ammonium ion (NH 4 +) in said slurry composition.
7. A slurry composition, consisting essentially of:
between about 0.5% by weight and about 6% by weight abrasive particles;
between about 1 gm/liter and about 50 gm/liter of ferric nitrate;
between about 0.1 ml/liter and about 100 ml/liter of surfactant anion;
between about 0.003 ml/liter and about 3.05 ml/liter of octanol; and
water as a diluent.
8. The slurry composition of claim 7 , wherein said surfactant anion is octyl sulfate.
9. The slurry composition of claim 7 , wherein there is less than 1% by weight in total of one or more of sodium citrate, sodium nitrate, Na 2 HPO 4 , sodium oxalate, and NaSiF 6 in said slurry composition.
10. The slurry composition of claim 7 , wherein there is less than 1% by weight of organic amine or ammonium ion (NH 4 +) in said slurry composition.
11. The slurry composition of claim 7 , further comprising:
between about 0.1 gm/liter and about 5 gm/liter of a copper corrosion inhibitor.
12. The slurry composition of claim 7 , further comprising:
between about 0.001 gm/liter and about 5 gm/liter of a chloride ion source; and
between about 0.001 gm/liter and about 20 gm/liter of a sulfate ion source.
13. A slurry composition, comprising:
abrasive particles;
ferric nitrate;
a surfactant anion;
octanol; and
water as a diluent.
14. The slurry composition of claim 13 , wherein said surfactant anion is octyl sulfate.
15. The slurry composition of claim 13 , further comprising:
a chloride ion source; and
a sulfate ion source.
16. The slurry composition of claim 13 , further comprising:
a copper corrosion inhibitor.