Delivery device, manufacturing system and process of manufacturing
A delivery device, manufacturing system, and process of manufacturing are disclosed. The delivery device includes a feed tube and a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from decomposition of dimethylsilane. The manufacturing system includes the delivery device and a chamber in selective fluid communication with the delivery device. The process of manufacturing uses the manufacturing system to produce an article.
1. A delivery device, comprising:
a feed tube; and
a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C.
2. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 10 psia.
3. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied under conditions of between 400° C. and 500° C.
4. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied for between 10 minutes and 24 hours.
5. The delivery device of claim 1 , wherein the chemical vapor deposition coating is applied for between 4 hours and 6 hours.
6. The delivery device of claim 1 , wherein the delivery device is positioned within an organic light emitting diode manufacturing system.
7. The delivery device of claim 1 , further comprising a processing material contained within the feed tube.
8. The delivery device of claim 7 , wherein the delivery device is arranged and disposed to direct the processing material towards a substrate to be coated.
9. The delivery device of claim 7 , wherein the processing material is an organic material.
10. The delivery device of claim 1 , wherein the chemical vapor deposition coating is oxidized.
11. The delivery device of claim 1 , wherein the chemical vapor deposition coating is functionalized.
12. The delivery device of claim 1 , wherein the chemical vapor deposition coating is treated with trimethylsilane.
13. The delivery device of claim 1 , wherein the inner surface is a pure or substantially pure metal surface.
14. The delivery device of claim 1 , wherein the inner surface is a metal alloy surface.
15. The delivery device of claim 1 , wherein the inner surface is an impure metal surface.
16. The manufacturing system of claim 1 , further comprising additional feed tubes.
17. A manufacturing system, comprising:
a delivery device having a feed tube, a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen; and
a chamber in selective fluid communication with the delivery device;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C. and the chemical vapor deposition coating is oxidized.
18. A delivery device, comprising:
a feed tube; and
a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from thermal decomposition of dimethylsilane, the inner surface being a metal alloy surface, the chemical vapor deposition coating includes amorphous carbosilanes having carbon, silicon, and hydrogen; and
a processing material contained within the feed tube, the processing material being an organic material;
wherein the delivery device is arranged and disposed to direct the processing material towards a substrate to be coated;
wherein the chemical vapor deposition coating is applied under conditions of between 1.0 psia and 200 psia and between 200° C. and 600° C. and the chemical vapor deposition coating is oxidized.